Kwok Manus Wong

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate support having fluid channel
- Patent number 8,279,577
- Issue date Oct 2, 2012
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support having heat transfer system
- Patent number 7,768,765
- Issue date Aug 3, 2010
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support having heat transfer system
- Patent number 7,221,553
- Issue date May 22, 2007
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heated catalytic treatment of an effluent gas from a substrate fabr...
- Patent number 6,824,748
- Issue date Nov 30, 2004
- Applied Materials, Inc.
- Tony S. Kaushal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for heating a semiconductor wafer plasma react...
- Patent number 6,759,624
- Issue date Jul 6, 2004
- Ananda H. Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF power delivery for plasma processing using modulated power signal
- Patent number 6,726,804
- Issue date Apr 27, 2004
- Liang-Guo Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Treatment of hazardous gases in effluent
- Patent number 6,673,323
- Issue date Jan 6, 2004
- Applied Materials, Inc.
- Ashish Bhatnagar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for improving exhaust gas consumption in an ex...
- Patent number 6,642,489
- Issue date Nov 4, 2003
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma chamber support with coupled electrode
- Patent number 6,494,958
- Issue date Dec 17, 2002
- Applied Materials Inc.
- Shamouil Shamouilian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma chamber support having dual electrodes
- Patent number 6,478,924
- Issue date Nov 12, 2002
- Applied Materials, Inc.
- Shamouil Shamouilian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Erosion resistant gas energizer
- Patent number 6,391,146
- Issue date May 21, 2002
- Applied Materials, Inc.
- Ashish Bhatnagar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Porous ceramic liner for a plasma source
- Patent number 6,367,412
- Issue date Apr 9, 2002
- Applied Materials, Inc.
- Kartik Ramaswamy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT HAVING FLUID CHANNEL
- Publication number 20110024047
- Publication date Feb 3, 2011
- Applied Materials, Inc.
- Andrew NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT HAVING HEAT TRANSFER SYSTEM
- Publication number 20070165356
- Publication date Jul 19, 2007
- APPLIED MATERIALS, INC.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate support having heat transfer system
- Publication number 20040212947
- Publication date Oct 28, 2004
- APPLIED MATERIALS, INC.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for heating a semiconductor wafer plasma react...
- Publication number 20030209526
- Publication date Nov 13, 2003
- APPLIED MATERIALS, INC.
- Ananda H. Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing chamber having magnetic assembly and method
- Publication number 20030192646
- Publication date Oct 16, 2003
- APPLIED MATERIALS, INC.
- Robert W. Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heated catalytic treatment of an effluent gas from a substrate fabr...
- Publication number 20020182131
- Publication date Dec 5, 2002
- APPLIED MATERIALS, INC.
- Tony S. Kaushal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF power delivery for plasma processing using modulated power signal
- Publication number 20020096257
- Publication date Jul 25, 2002
- APPLIED MATERIALS, INC.
- Liang-Guo Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for improving exhaust gas consumption in an ex...
- Publication number 20020088797
- Publication date Jul 11, 2002
- APPLIED MATERIALS, INC.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS

Kwok Manus Wong

Person

Patents Grantslast 30 patents

Substrate support having fluid channel

Substrate support having heat transfer system

Substrate support having heat transfer system

Heated catalytic treatment of an effluent gas from a substrate fabr...

Method and apparatus for heating a semiconductor wafer plasma react...

RF power delivery for plasma processing using modulated power signal

Treatment of hazardous gases in effluent

Method and apparatus for improving exhaust gas consumption in an ex...

Plasma chamber support with coupled electrode

Plasma chamber support having dual electrodes

Erosion resistant gas energizer

Porous ceramic liner for a plasma source

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT HAVING FLUID CHANNEL

SUBSTRATE SUPPORT HAVING HEAT TRANSFER SYSTEM

Substrate support having heat transfer system

Method and apparatus for heating a semiconductor wafer plasma react...

Plasma processing chamber having magnetic assembly and method

Heated catalytic treatment of an effluent gas from a substrate fabr...

RF power delivery for plasma processing using modulated power signal

Method and apparatus for improving exhaust gas consumption in an ex...