Kyeong-Koo Chi

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Sulfur and fluorine containing etch chemistry for improvement of di...
- Patent number 9,484,215
- Issue date Nov 1, 2016
- Lam Research Corporation
- Sanghyuk Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-high aspect ratio dielectric etch
- Patent number 8,906,194
- Issue date Dec 9, 2014
- Lam Research Corporation
- Kyeong-Koo Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Profile control in dielectric etch
- Patent number 8,501,627
- Issue date Aug 6, 2013
- Lam Research Corporation
- Kyeong-Koo Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CD bias loading control with ARC layer open
- Patent number 8,470,715
- Issue date Jun 25, 2013
- Lam Research Corporation
- Kyeong-Koo Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line width roughness control with arc layer open
- Patent number 8,158,524
- Issue date Apr 17, 2012
- Lam Research Corporation
- Kyeong-Koo Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-high aspect ratio dielectric etch
- Patent number 7,682,986
- Issue date Mar 23, 2010
- Lam Research Corporation
- Kyeong-Koo Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed ultra-high aspect ratio dielectric etch
- Patent number 7,547,636
- Issue date Jun 16, 2009
- Lam Research Corporation
- Kyeong-Koo Chi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SULFUR AND FLUORINE CONTAINING ETCH CHEMISTRY FOR IMPROVEMENT OF DI...
- Publication number 20160293430
- Publication date Oct 6, 2016
- LAM RESEARCH CORPORATION
- Sanghyuk CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROFILE CONTROL IN DIELECTRIC ETCH
- Publication number 20110053379
- Publication date Mar 3, 2011
- LAM RESEARCH CORPORATION
- Kyeong-Koo Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CD BIAS LOADING CONTROL WITH ARC LAYER OPEN
- Publication number 20100323525
- Publication date Dec 23, 2010
- LAM RESEARCH CORPORATION
- Kyeong-Koo Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-HIGH ASPECT RATIO DIELECTRIC ETCH
- Publication number 20100132889
- Publication date Jun 3, 2010
- LAM RESEARCH CORPORATION
- Kyeong-Koo CHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE WIDTH ROUGHNESS CONTROL WITH ARC LAYER OPEN
- Publication number 20090087996
- Publication date Apr 2, 2009
- LAM RESEARCH CORPORATION
- Kyeong-Koo Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-HIGH ASPECT RATIO DIELECTRIC ETCH
- Publication number 20080188081
- Publication date Aug 7, 2008
- Lam Research Corporation
- Kyeong-Koo Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED ULTRA-HIGH ASPECT RATIO DIELECTRIC ETCH
- Publication number 20080188082
- Publication date Aug 7, 2008
- Lam Research Corporation
- Kyeong-Koo Chi
- H01 - BASIC ELECTRIC ELEMENTS

Kyeong-Koo Chi

Person

Patents Grantslast 30 patents

Sulfur and fluorine containing etch chemistry for improvement of di...

Ultra-high aspect ratio dielectric etch

Profile control in dielectric etch

CD bias loading control with ARC layer open

Line width roughness control with arc layer open

Ultra-high aspect ratio dielectric etch

Pulsed ultra-high aspect ratio dielectric etch

Patents Applicationslast 30 patents

SULFUR AND FLUORINE CONTAINING ETCH CHEMISTRY FOR IMPROVEMENT OF DI...

PROFILE CONTROL IN DIELECTRIC ETCH

CD BIAS LOADING CONTROL WITH ARC LAYER OPEN

ULTRA-HIGH ASPECT RATIO DIELECTRIC ETCH

LINE WIDTH ROUGHNESS CONTROL WITH ARC LAYER OPEN

ULTRA-HIGH ASPECT RATIO DIELECTRIC ETCH

PULSED ULTRA-HIGH ASPECT RATIO DIELECTRIC ETCH