Kyohyeok KIM

Person

Seoul, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for plasma etching
- Patent number 12,211,672
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma etching
- Patent number 11,984,304
- Issue date May 14, 2024
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus
- Patent number 11,515,193
- Issue date Nov 29, 2022
- Samsung Electronics Co., Ltd.
- Kuihyun Yoon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method of manufacturing semiconduct...
- Patent number 11,348,760
- Issue date May 31, 2022
- Samsung Electronics Co., Ltd.
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and me...
- Patent number 10,892,145
- Issue date Jan 12, 2021
- Samsung Electronics Co., Ltd.
- Sejin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming fine pattern of semiconductor device
- Patent number 9,812,335
- Issue date Nov 7, 2017
- Samsung Electronics Co., Ltd.
- Je-Woo Han
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR PLASMA ETCHING
- Publication number 20240258084
- Publication date Aug 1, 2024
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA ETCHING
- Publication number 20220328291
- Publication date Oct 13, 2022
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20210142985
- Publication date May 13, 2021
- Samsung Electronics Co., Ltd.
- AKIRA KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS
- Publication number 20210111056
- Publication date Apr 15, 2021
- Samsung Electronics Co., Ltd.
- Kuihyun Yoon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...
- Publication number 20200168443
- Publication date May 28, 2020
- Samsung Electronics Co., Ltd.
- SEJIN OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING PATTERN USING CYCLIC PROCESSING
- Publication number 20160314981
- Publication date Oct 27, 2016
- Samsung Electronics Co., Ltd.
- Junho YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING FINE PATTERN OF SEMICONDUCTOR DEVICE
- Publication number 20160293445
- Publication date Oct 6, 2016
- Samsung Electronics Co., Ltd.
- Je-Woo HAN
- H01 - BASIC ELECTRIC ELEMENTS

Kyohyeok KIM

Person

Patents Grantslast 30 patents

Apparatus and method for plasma etching

Apparatus and method for plasma etching

Etching apparatus

Plasma processing apparatus and method of manufacturing semiconduct...

Substrate processing apparatus, substrate processing method, and me...

Method of forming fine pattern of semiconductor device

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR PLASMA ETCHING

APPARATUS AND METHOD FOR PLASMA ETCHING

PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...

ETCHING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...

METHODS FOR FORMING PATTERN USING CYCLIC PROCESSING

METHOD OF FORMING FINE PATTERN OF SEMICONDUCTOR DEVICE