Kyoichi Miyazaki

Person

Utsunomiya-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Exposure apparatus and method of manufacturing device
- Patent number 8,456,612
- Issue date Jun 4, 2013
- Canon Kabushiki Kaisha
- Kyoichi Miyazaki
- G02 - OPTICS
Information Patent Grant
Exposure apparatus and device manufacturing method
- Patent number 7,804,578
- Issue date Sep 28, 2010
- Canon Kabushiki Kaisha
- Kyoichi Miyazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position sensor having a reflective projecting system and device fa...
- Patent number 6,124,601
- Issue date Sep 26, 2000
- Canon Kabushiki Kaisha
- Minoru Yoshii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface position detecting system and exposure apparatus using the...
- Patent number 5,969,820
- Issue date Oct 19, 1999
- Canon Kabushiki Kaisha
- Minoru Yoshii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical inspection method and apparatus including intensity modulat...
- Patent number 5,861,952
- Issue date Jan 19, 1999
- Canon Kabushiki Kaisha
- Toshihiko Tsuji
- G01 - MEASURING TESTING
Information Patent Grant
Surface position detecting system and projection exposure apparatus...
- Patent number 5,834,767
- Issue date Nov 10, 1998
- Canon Kabushiki Kaisha
- Masanobu Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure state detecting system and exposure apparatus using the same
- Patent number 5,777,744
- Issue date Jul 7, 1998
- Canon Kabushiki Kaisha
- Minoru Yoshii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection system and device manufacturing method using the same
- Patent number 5,767,962
- Issue date Jun 16, 1998
- Canon Kabushiki Kaisha
- Masayuki Suzuki
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for detecting foreign matter on a substrate, and an expos...
- Patent number 5,742,386
- Issue date Apr 21, 1998
- Canon Kabushiki Kaisha
- Noriyuki Nose
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system for original with pellicle
- Patent number 5,652,657
- Issue date Jul 29, 1997
- Canon Kabushiki Kaisha
- Minoru Yoshii
- G01 - MEASURING TESTING
Information Patent Grant
Displacement detecting system, an expose apparatus, and a device ma...
- Patent number 5,610,715
- Issue date Mar 11, 1997
- Canon Kabushiki Kaisha
- Minoru Yoshii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Foreign particle inspecting system
- Patent number 5,585,918
- Issue date Dec 17, 1996
- Canon Kabushiki Kaisha
- Seiji Takeuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and apparatus for inspecting a particle, if any,...
- Patent number 5,486,919
- Issue date Jan 23, 1996
- Canon Kabushiki Kaisha
- Toshihiko Tsuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus for detecting foreign matter on a surface to b...
- Patent number 5,461,474
- Issue date Oct 24, 1995
- Canon Kabushiki Kaisha
- Minoru Yoshii
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE
- Publication number 20100302517
- Publication date Dec 2, 2010
- Canon Kabushiki Kaisha
- Kyoichi MIYAZAKI
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20070115444
- Publication date May 24, 2007
- Canon Kabushiki Kaisha
- Kyoichi Miyazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kyoichi Miyazaki

Person

Patents Grantslast 30 patents

Exposure apparatus and method of manufacturing device

Exposure apparatus and device manufacturing method

Position sensor having a reflective projecting system and device fa...

Surface position detecting system and exposure apparatus using the...

Optical inspection method and apparatus including intensity modulat...

Surface position detecting system and projection exposure apparatus...

Exposure state detecting system and exposure apparatus using the same

Inspection system and device manufacturing method using the same

Apparatus for detecting foreign matter on a substrate, and an expos...

Inspection system for original with pellicle

Displacement detecting system, an expose apparatus, and a device ma...

Foreign particle inspecting system

Inspection method and apparatus for inspecting a particle, if any,...

Inspection apparatus for detecting foreign matter on a surface to b...

Patents Applicationslast 30 patents

EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD