Kyoichi Suwa

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Optical system, optical apparatus, imaging apparatus, and method fo...
- Patent number 12,019,225
- Issue date Jun 25, 2024
- Nikon Corporation
- Toru Iwane
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Mask, exposure method, line width measuring method, and method for...
- Patent number 6,855,997
- Issue date Feb 15, 2005
- Nikon Corporation
- Kyoichi Suwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for preforming measurement of a dimension of a test mark...
- Patent number 6,750,952
- Issue date Jun 15, 2004
- Nikon Precision, Inc.
- Ilya Grodnensky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method
- Patent number 6,610,460
- Issue date Aug 26, 2003
- Nikon Corporation
- Masaya Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for use of a critical dimensional test structure
- Patent number 6,449,031
- Issue date Sep 10, 2002
- Nikon Corporation
- Ilya Grodnensky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus and method with workpiece area detection
- Patent number 6,191,429
- Issue date Feb 20, 2001
- Nikon Precision Inc.
- Kyoichi Suwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a critical dimension test structure and its use
- Patent number 6,094,256
- Issue date Jul 25, 2000
- Nikon Precision Inc.
- Ilya Grodnensky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Precision stage interferometer system with local single air duct
- Patent number 5,870,197
- Issue date Feb 9, 1999
- Nikon Corporation
- Michael R. Sogard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining performance characteristics in...
- Patent number 5,835,227
- Issue date Nov 10, 1998
- Nikon Precision Inc.
- Ilya Grodnensky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focusing and tilting adjustment system for lithography aligner, man...
- Patent number 5,825,043
- Issue date Oct 20, 1998
- Nikon Precision Inc.
- Kyoichi Suwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer inspection method and apparatus using diffracted light
- Patent number 5,777,729
- Issue date Jul 7, 1998
- Nikon Corporation
- Arun A. Aiyer
- G01 - MEASURING TESTING
Information Patent Grant
Measuring method and exposure apparatus
- Patent number 5,666,205
- Issue date Sep 9, 1997
- Nikon Corporation
- Hiroki Tateno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging characteristic and asymetric abrerration measurement of pro...
- Patent number 5,615,006
- Issue date Mar 25, 1997
- Nikon Corporation
- Shigeru Hirukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure condition measurement method
- Patent number 5,434,026
- Issue date Jul 18, 1995
- Nikon Corporation
- Norihiko Takatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Distortion inspecting method for projection optical system
- Patent number 5,402,224
- Issue date Mar 28, 1995
- Nikon Corporation
- Shigeru Hirukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus
- Patent number 4,965,630
- Issue date Oct 23, 1990
- Nikon Corporation
- Kinya Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus
- Patent number 4,931,830
- Issue date Jun 5, 1990
- Nikon Corporation
- Kyoichi Suwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of dimension measurement for a pattern formed by exposure ap...
- Patent number 4,908,656
- Issue date Mar 13, 1990
- Nikon Corporation
- Kyoichi Suwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection-exposing apparatus
- Patent number 4,806,987
- Issue date Feb 21, 1989
- Nikon Corporation
- Takashi Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus for production of integrated circuit
- Patent number RE32795
- Issue date Dec 6, 1988
- Nikon Corporation
- Toshio Matsuura
- 356 - Optics: measuring and testing
Information Patent Grant
Apparatus for detecting position of an object such as a semiconduct...
- Patent number 4,770,533
- Issue date Sep 13, 1988
- Nippon Kogaku K.K.
- Kyoichi Suwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus
- Patent number 4,748,478
- Issue date May 31, 1988
- Nippon Kogaku K.K.
- Kyoichi Suwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for detecting diversion
- Patent number 4,741,622
- Issue date May 3, 1988
- Nippon Kogaku K.K.
- Kyoichi Suwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method and system for photolithography
- Patent number 4,734,746
- Issue date Mar 29, 1988
- Nippon Kogaku K.K.
- Kazuo Ushida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical apparatus
- Patent number 4,704,020
- Issue date Nov 3, 1987
- Nippon Kogaku K.K.
- Masaichi Murakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process of transfer of mask pattern onto substrate and apparatus fo...
- Patent number 4,699,515
- Issue date Oct 13, 1987
- Nippon Kogaku K.K.
- Akikazu Tanimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of aligning a semiconductor substrate and a photomask
- Patent number 4,679,942
- Issue date Jul 14, 1987
- Nippon Kogaku K.K.
- Kyoichi Suwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment apparatus
- Patent number 4,677,301
- Issue date Jun 30, 1987
- Nippon Kogaku K.K.
- Akikazu Tanimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automatic magnification correcting system in a projection optical a...
- Patent number 4,666,273
- Issue date May 19, 1987
- Nippon Kogaku K.K.
- Hisayuki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and exposure apparatus using the same
- Patent number 4,657,379
- Issue date Apr 14, 1987
- Nippon Kogaku K.K.
- Kyoichi Suwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL SYSTEM, OPTICAL APPARATUS, IMAGING APPARATUS, AND METHOD FO...
- Publication number 20220099949
- Publication date Mar 31, 2022
- Nikon Corporation
- Toru IWANE
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Mask, exposure method, line width measuring method, and method for...
- Publication number 20050106480
- Publication date May 19, 2005
- Nikon Corporation
- Kyoichi Suwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination optical apparatus, exposure apparatus and method of ex...
- Publication number 20040174512
- Publication date Sep 9, 2004
- Nikon Corporation
- Mitsunori Toyoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination optical apparatus, exposure apparatus and method of ex...
- Publication number 20030038931
- Publication date Feb 27, 2003
- Nikon Corporation
- Mitsunori Toyoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for preforming measurement of a dimension of a test mark...
- Publication number 20020180948
- Publication date Dec 5, 2002
- Ilya Grodnensky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method
- Publication number 20020177076
- Publication date Nov 28, 2002
- Nikon Corporation
- Masaya Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask, exposure method, line width measuring method, and method for...
- Publication number 20010021546
- Publication date Sep 13, 2001
- Kyoichi Suwa
- H01 - BASIC ELECTRIC ELEMENTS

Kyoichi Suwa

Person

Patents Grantslast 30 patents

Optical system, optical apparatus, imaging apparatus, and method fo...

Mask, exposure method, line width measuring method, and method for...

Apparatus for preforming measurement of a dimension of a test mark...

Exposure method

Method for use of a critical dimensional test structure

Projection exposure apparatus and method with workpiece area detection

Method for forming a critical dimension test structure and its use

Precision stage interferometer system with local single air duct

Method and apparatus for determining performance characteristics in...

Focusing and tilting adjustment system for lithography aligner, man...

Wafer inspection method and apparatus using diffracted light

Measuring method and exposure apparatus

Imaging characteristic and asymetric abrerration measurement of pro...

Exposure condition measurement method

Distortion inspecting method for projection optical system

Projection exposure apparatus

Projection exposure apparatus

Method of dimension measurement for a pattern formed by exposure ap...

Projection-exposing apparatus

Exposure apparatus for production of integrated circuit

Apparatus for detecting position of an object such as a semiconduct...

Projection exposure apparatus

Method and apparatus for detecting diversion

Exposure method and system for photolithography

Projection optical apparatus

Process of transfer of mask pattern onto substrate and apparatus fo...

Method of aligning a semiconductor substrate and a photomask

Alignment apparatus

Automatic magnification correcting system in a projection optical a...

Photomask and exposure apparatus using the same

Patents Applicationslast 30 patents

OPTICAL SYSTEM, OPTICAL APPARATUS, IMAGING APPARATUS, AND METHOD FO...

Mask, exposure method, line width measuring method, and method for...

Illumination optical apparatus, exposure apparatus and method of ex...

Illumination optical apparatus, exposure apparatus and method of ex...

Apparatus for preforming measurement of a dimension of a test mark...

Exposure method

Mask, exposure method, line width measuring method, and method for...