Kyoko IKEDA

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate cleaning method, processing container cleaning method, an...
- Patent number 11,865,590
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Kyoko Ikeda
- B08 - CLEANING
Information Patent Grant
Substrate cleaning apparatus
- Patent number 11,761,075
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Yukimasa Saito
- B08 - CLEANING
Information Patent Grant
Cleaning method and substrate processing apparatus
- Patent number 11,517,943
- Issue date Dec 6, 2022
- Tokyo Electron Limited
- Kyoko Ikeda
- B08 - CLEANING
Information Patent Grant
Substrate cleaning method, processing container cleaning method, an...
- Patent number 11,504,751
- Issue date Nov 22, 2022
- Tokyo Electron Limited
- Kyoko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate stage and substrate processing apparatus
- Patent number 11,281,116
- Issue date Mar 22, 2022
- Tokyo Electron Limited
- Einosuke Tsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gas supply member and gas processing apparatus
- Patent number 10,870,916
- Issue date Dec 22, 2020
- Tokyo Electron Limited
- Kyoko Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for cleaning chamber of substrate processing apparatus
- Patent number 10,786,837
- Issue date Sep 29, 2020
- Tokyo Electron Limited
- Yukimasa Saito
- B08 - CLEANING
Information Patent Grant
Substrate transfer system and heat treatment apparatus using same
- Patent number 9,939,200
- Issue date Apr 10, 2018
- Tokyo Electron Limited
- Koyu Hasegawa
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Vaporizing unit, film forming apparatus, film forming method, compu...
- Patent number 9,343,295
- Issue date May 17, 2016
- Tokyo Electron Limited
- Ikuo Sawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle-measuring system and particle-measuring method
- Patent number 8,100,147
- Issue date Jan 24, 2012
- Tokyo Electron Limited
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method
- Patent number 7,931,945
- Issue date Apr 26, 2011
- Tokyo Electron Limited
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation processing apparatus and method for determining an e...
- Patent number 7,894,059
- Issue date Feb 22, 2011
- Tokyo Electron Limited
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle-measuring system and particle-measuring method
- Patent number 7,667,840
- Issue date Feb 23, 2010
- Tokyo Electron Limited
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle-measuring system and particle-measuring method
- Patent number 7,515,264
- Issue date Apr 7, 2009
- Tokyo Electron Limited
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle-measuring system and particle-measuring method
- Patent number 7,511,814
- Issue date Mar 31, 2009
- Tokyo Electron Limited
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle-measuring system and particle-measuring method
- Patent number 6,532,069
- Issue date Mar 11, 2003
- Tokyo Electron Limited
- Hayashi Otsuki
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE CLEANING METHOD, PROCESSING CONTAINER CLEANING METHOD, AN...
- Publication number 20230063907
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Kyoko IKEDA
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING METHOD, PROCESSING CONTAINER CLEANING METHOD, AN...
- Publication number 20220001426
- Publication date Jan 6, 2022
- TOKYO ELECTRON LIMITED
- Kyoko IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE STAGE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210302846
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Einosuke TSUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210268556
- Publication date Sep 2, 2021
- TOKYO ELECTRON LIMITED
- Kyoko IKEDA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20200126818
- Publication date Apr 23, 2020
- TOKYO ELECTRON LIMITED
- Yosuke KAWABUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING CHAMBER OF SUBSTRATE PROCESSING APPARATUS
- Publication number 20180369881
- Publication date Dec 27, 2018
- TOKYO ELECTRON LIMITED
- Yukimasa SAITO
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING APPARATUS
- Publication number 20180355465
- Publication date Dec 13, 2018
- TOKYO ELECTRON LIMITED
- Yukimasa SAITO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY MEMBER AND GAS PROCESSING APPARATUS
- Publication number 20180274094
- Publication date Sep 27, 2018
- TOKYO ELECTRON LIMITED
- Kyoko IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE CONCENTRATION MECHANISM, PARTICLE MEASURING DEVICE, AND SU...
- Publication number 20170153172
- Publication date Jun 1, 2017
- TOKYO ELECTRON LIMITED
- Kyoko IKEDA
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Application
Substrate Transfer System and Heat Treatment Apparatus Using Same
- Publication number 20160146539
- Publication date May 26, 2016
- TOKYO ELECTRON LIMITED
- Koyu HASEGAWA
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...
- Publication number 20140256157
- Publication date Sep 11, 2014
- TOKYO ELECTRON LIMITED
- Ikuo SAWADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...
- Publication number 20100297346
- Publication date Nov 25, 2010
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PARTICLE-MEASURING SYSTEM AND PARTICLE-MEASURING METHOD
- Publication number 20100139565
- Publication date Jun 10, 2010
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PARTICLE-MEASURING SYSTEM AND PARTICLE-MEASURING METHOD
- Publication number 20080264338
- Publication date Oct 30, 2008
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PARTICLE-MEASURING SYSTEM AND PARTICLE-MEASURING METHOD
- Publication number 20080069671
- Publication date Mar 20, 2008
- TOKYO ELECTRON LIMITED
- Hayashi OTSUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PARTICLE-MEASURING SYSTEM AND PARTICLE-MEASURING METHOD
- Publication number 20080065340
- Publication date Mar 13, 2008
- TOKYO ELECTRON LIMITED
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PARTICLE-MEASURING SYSTEM AND PARTICLE-MEASURING METHOD
- Publication number 20070264444
- Publication date Nov 15, 2007
- TOKYO ELECTRON LIMITED
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PARTICLE-MEASURING SYSTEM AND PARTICLE-MEASURING METHOD
- Publication number 20070261740
- Publication date Nov 15, 2007
- TOKYO ELECTRON LIMITED
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PARTICLE-MEASURING SYSTEM AND PARTICLE-MEASURING METHOD
- Publication number 20070263217
- Publication date Nov 15, 2007
- TOKYO ELECTRON LIMITED
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas treatment device and heat readiting method
- Publication number 20070022954
- Publication date Feb 1, 2007
- TOKYO ELECTRON LIMITED
- Hachishiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Particle-measuring system and particle-measuring method
- Publication number 20030147075
- Publication date Aug 7, 2003
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kyoko IKEDA

Person

Patents Grantslast 30 patents

Substrate cleaning method, processing container cleaning method, an...

Substrate cleaning apparatus

Cleaning method and substrate processing apparatus

Substrate cleaning method, processing container cleaning method, an...

Substrate stage and substrate processing apparatus

Gas supply member and gas processing apparatus

Method for cleaning chamber of substrate processing apparatus

Substrate transfer system and heat treatment apparatus using same

Vaporizing unit, film forming apparatus, film forming method, compu...

Particle-measuring system and particle-measuring method

Film forming method

Film formation processing apparatus and method for determining an e...

Particle-measuring system and particle-measuring method

Particle-measuring system and particle-measuring method

Particle-measuring system and particle-measuring method

Particle-measuring system and particle-measuring method

Patents Applicationslast 30 patents

SUBSTRATE CLEANING METHOD, PROCESSING CONTAINER CLEANING METHOD, AN...

SUBSTRATE CLEANING METHOD, PROCESSING CONTAINER CLEANING METHOD, AN...

SUBSTRATE STAGE AND SUBSTRATE PROCESSING APPARATUS

CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

METHOD FOR CLEANING CHAMBER OF SUBSTRATE PROCESSING APPARATUS

SUBSTRATE CLEANING APPARATUS

GAS SUPPLY MEMBER AND GAS PROCESSING APPARATUS

PARTICLE CONCENTRATION MECHANISM, PARTICLE MEASURING DEVICE, AND SU...

Substrate Transfer System and Heat Treatment Apparatus Using Same

VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...

VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...

PARTICLE-MEASURING SYSTEM AND PARTICLE-MEASURING METHOD

PARTICLE-MEASURING SYSTEM AND PARTICLE-MEASURING METHOD

PARTICLE-MEASURING SYSTEM AND PARTICLE-MEASURING METHOD

PARTICLE-MEASURING SYSTEM AND PARTICLE-MEASURING METHOD

PARTICLE-MEASURING SYSTEM AND PARTICLE-MEASURING METHOD

PARTICLE-MEASURING SYSTEM AND PARTICLE-MEASURING METHOD

PARTICLE-MEASURING SYSTEM AND PARTICLE-MEASURING METHOD

Gas treatment device and heat readiting method

Particle-measuring system and particle-measuring method