Kyoko IZUHA

Person

Atsugi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for correcting a mask pattern design
- Patent number 8,078,996
- Issue date Dec 13, 2011
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining photo mask, method of manufacturing semicondu...
- Patent number 7,925,090
- Issue date Apr 12, 2011
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern data correction method, pattern checking method, pattern ch...
- Patent number 7,788,626
- Issue date Aug 31, 2010
- Kabushiki Kaisha Toshiba
- Shigeki Nojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor circuit pattern design method for manufacturing semic...
- Patent number 7,784,020
- Issue date Aug 24, 2010
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Calculating method, verification method, verification program and v...
- Patent number 7,631,287
- Issue date Dec 8, 2009
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for correcting a mask pattern design
- Patent number 7,571,417
- Issue date Aug 4, 2009
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, manufacturing method for mask, and manufacturing method for s...
- Patent number 7,541,136
- Issue date Jun 2, 2009
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing mask for focus monitoring, and method for...
- Patent number 7,371,483
- Issue date May 13, 2008
- Kabushiki Kaisha Toshiba
- Shingo Kanamitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus monitor method and mask
- Patent number 7,250,235
- Issue date Jul 31, 2007
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calculating method, verification method, verification program and v...
- Patent number 7,200,833
- Issue date Apr 3, 2007
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Design layout preparing method
- Patent number 7,194,704
- Issue date Mar 20, 2007
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask having a focus monitor pattern
- Patent number 7,108,945
- Issue date Sep 19, 2006
- Kabushiki Kaisha Toshiba
- Takumichi Sutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, manufacturing method for mask, and manufacturing method for s...
- Patent number 7,094,504
- Issue date Aug 22, 2006
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, exposure system and recording medium
- Patent number 6,741,334
- Issue date May 25, 2004
- Kabushiki Kaisha Toshiba
- Masafumi Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 6,667,139
- Issue date Dec 23, 2003
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method for focus monitoring
- Patent number 6,440,616
- Issue date Aug 27, 2002
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Pattern Verification Method, Pattern Verification System, Mask Manu...
- Publication number 20120054695
- Publication date Mar 1, 2012
- KABUBHSIKI KAISHA TOSHIBA
- Kyoko IZUHA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor circuit pattern design method for manufacturing semic...
- Publication number 20110041104
- Publication date Feb 17, 2011
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR DEVICE PATTERN VERIFICATION METHOD, SEMICONDUCTOR DEV...
- Publication number 20090291512
- Publication date Nov 26, 2009
- Kyoko IZUHA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and system for correcting a mask pattern design
- Publication number 20090265680
- Publication date Oct 22, 2009
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calculating method, verification method, verification program and v...
- Publication number 20070226676
- Publication date Sep 27, 2007
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of determining photo mask, method of manufacturing semicondu...
- Publication number 20070130560
- Publication date Jun 7, 2007
- Toshiya Kotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor circuit pattern design method for manufacturing semic...
- Publication number 20060271907
- Publication date Nov 30, 2006
- Kyoko Izuha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Mask, manufacturing method for mask, and manufacturing method for s...
- Publication number 20060240341
- Publication date Oct 26, 2006
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern data correction method, pattern checking method, pattern ch...
- Publication number 20050273754
- Publication date Dec 8, 2005
- Shigeki Nojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design layout preparing method
- Publication number 20050204322
- Publication date Sep 15, 2005
- Toshiya Kotani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Pattern verification method, pattern verification system, mask manu...
- Publication number 20050153217
- Publication date Jul 14, 2005
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for manufacturing mask for focus monitoring, and method for...
- Publication number 20040265709
- Publication date Dec 30, 2004
- Shingo Kanamitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calculating method, verification method, verification program and v...
- Publication number 20040230939
- Publication date Nov 18, 2004
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Focus monitor method and mask
- Publication number 20040224242
- Publication date Nov 11, 2004
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask, manufacturing method for mask, and manufacturing method for s...
- Publication number 20040131951
- Publication date Jul 8, 2004
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask having a focus monitor pattern
- Publication number 20030219655
- Publication date Nov 27, 2003
- Takumichi Sutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20020182521
- Publication date Dec 5, 2002
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, exposure system and recording medium
- Publication number 20020087943
- Publication date Jul 4, 2002
- Kabushiki Kaisha Toshiba
- Masafumi Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kyoko IZUHA

Person

Patents Grantslast 30 patents

Method and system for correcting a mask pattern design

Method of determining photo mask, method of manufacturing semicondu...

Pattern data correction method, pattern checking method, pattern ch...

Semiconductor circuit pattern design method for manufacturing semic...

Calculating method, verification method, verification program and v...

Method and system for correcting a mask pattern design

Mask, manufacturing method for mask, and manufacturing method for s...

Method for manufacturing mask for focus monitoring, and method for...

Focus monitor method and mask

Calculating method, verification method, verification program and v...

Design layout preparing method

Photomask having a focus monitor pattern

Mask, manufacturing method for mask, and manufacturing method for s...

Exposure method, exposure system and recording medium

Method of manufacturing semiconductor device

Mask and method for focus monitoring

Patents Applicationslast 30 patents

Pattern Verification Method, Pattern Verification System, Mask Manu...

Semiconductor circuit pattern design method for manufacturing semic...

SEMICONDUCTOR DEVICE PATTERN VERIFICATION METHOD, SEMICONDUCTOR DEV...

Method and system for correcting a mask pattern design

Calculating method, verification method, verification program and v...

Method of determining photo mask, method of manufacturing semicondu...

Semiconductor circuit pattern design method for manufacturing semic...

Mask, manufacturing method for mask, and manufacturing method for s...

Pattern data correction method, pattern checking method, pattern ch...

Design layout preparing method

Pattern verification method, pattern verification system, mask manu...

Method for manufacturing mask for focus monitoring, and method for...

Calculating method, verification method, verification program and v...

Focus monitor method and mask

Mask, manufacturing method for mask, and manufacturing method for s...

Photomask having a focus monitor pattern

Method of manufacturing semiconductor device

Exposure method, exposure system and recording medium