Kyoko SOGA

Person

Annaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Siloxane polymer containing isocyanuric acid and polyether skeleton...
- Patent number 11,548,985
- Issue date Jan 10, 2023
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polysiloxane skeleton polymer, photosensitive resin composition, pa...
- Patent number 11,119,409
- Issue date Sep 14, 2021
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Laminate and pattern forming method
- Patent number 10,948,823
- Issue date Mar 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Asai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for manufacturing semiconductor apparatus, method for manufa...
- Patent number 10,416,557
- Issue date Sep 17, 2019
- Shin-Etsu Chemical Co., Ltd.
- Kyoko Soga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Film material and pattern forming process
- Patent number 10,416,559
- Issue date Sep 17, 2019
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Asai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Semiconductor apparatus, stacked semiconductor apparatus, encapsula...
- Patent number 10,319,653
- Issue date Jun 11, 2019
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor apparatus, stacked semiconductor apparatus and encaps...
- Patent number 10,141,272
- Issue date Nov 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photo-curable resin composition and photo-curable dry film using th...
- Patent number 9,971,242
- Issue date May 15, 2018
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Asai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicone adhesive composition and solid-state imaging device
- Patent number 9,796,892
- Issue date Oct 24, 2017
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor apparatus, stacked semiconductor apparatus, encapsula...
- Patent number 9,620,429
- Issue date Apr 11, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kyoko Soga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified negative resist composition, photo-curable dry...
- Patent number 9,494,863
- Issue date Nov 15, 2016
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Asai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo-curable resin composition, photo-curable dry film, patterning...
- Patent number 9,012,111
- Issue date Apr 21, 2015
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Asai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adhesive composition and adhesive dry film
- Patent number 8,889,810
- Issue date Nov 18, 2014
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photocurable resin composition, dry film thereof, pattern forming m...
- Patent number 8,697,333
- Issue date Apr 15, 2014
- Shin-Etsu Chemical Co., Ltd.
- Kyoko Soga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition
- Patent number 6,773,858
- Issue date Aug 10, 2004
- Shin-Etsu Chemical Co., Ltd.
- Hideto Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, LAYERED...
- Publication number 20220236644
- Publication date Jul 28, 2022
- Shin-Etsu Chemical Co., Ltd.
- Kumiko Hayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYSILOXANE SKELETON POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PA...
- Publication number 20200165456
- Publication date May 28, 2020
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILOXANE POLYMER CONTAINING ISOCYANURIC ACID AND POLYETHER SKELETON...
- Publication number 20200165394
- Publication date May 28, 2020
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
LAMINATE AND PATTERN FORMING METHOD
- Publication number 20180107116
- Publication date Apr 19, 2018
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Asai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FILM MATERIAL AND PATTERN FORMING PROCESS
- Publication number 20180107115
- Publication date Apr 19, 2018
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Asai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR MANUFA...
- Publication number 20170250162
- Publication date Aug 31, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kyoko SOGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR APPARATUS, STACKED SEMICONDUCTOR APPARATUS, ENCAPSULA...
- Publication number 20170103932
- Publication date Apr 13, 2017
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SEMICONDUCTOR APPARATUS, STACKED SEMICONDUCTOR APPARATUS, ENCAPSULA...
- Publication number 20170077043
- Publication date Mar 16, 2017
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SEMICONDUCTOR APPARATUS, STACKED SEMICONDUCTOR APPARATUS, ENCAPSULA...
- Publication number 20160358833
- Publication date Dec 8, 2016
- Shin-Etsu Chemical Co., Ltd.
- Kyoko SOGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTO-CURABLE RESIN COMPOSITION AND PHOTO-CURABLE DRY FILM USING TH...
- Publication number 20160357105
- Publication date Dec 8, 2016
- Shin-Etsu Chemical Co., Ltd.
- Satoshi ASAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICONE ADHESIVE COMPOSITION AND SOLID-STATE IMAGING DEVICE
- Publication number 20160289519
- Publication date Oct 6, 2016
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki YASUDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY...
- Publication number 20160097974
- Publication date Apr 7, 2016
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Asai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO-CURABLE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING...
- Publication number 20130323631
- Publication date Dec 5, 2013
- Satoshi ASAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADHESIVE COMPOSITION AND ADHESIVE DRY FILM
- Publication number 20120213993
- Publication date Aug 23, 2012
- Takanobu TAKEDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOCURABLE RESIN COMPOSITION, DRY FILM THEREOF, PATTERN FORMING M...
- Publication number 20120094222
- Publication date Apr 19, 2012
- Kyoko SOGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition
- Publication number 20040029032
- Publication date Feb 12, 2004
- Hideto Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Siloxane polymer containing isocyanuric acid and polyether skeleton...

Polysiloxane skeleton polymer, photosensitive resin composition, pa...

Laminate and pattern forming method

Method for manufacturing semiconductor apparatus, method for manufa...

Film material and pattern forming process

Semiconductor apparatus, stacked semiconductor apparatus, encapsula...

Semiconductor apparatus, stacked semiconductor apparatus and encaps...

Photo-curable resin composition and photo-curable dry film using th...

Silicone adhesive composition and solid-state imaging device

Semiconductor apparatus, stacked semiconductor apparatus, encapsula...

Chemically amplified negative resist composition, photo-curable dry...

Photo-curable resin composition, photo-curable dry film, patterning...

Adhesive composition and adhesive dry film

Photocurable resin composition, dry film thereof, pattern forming m...

Positive photoresist composition

Patents Applicationslast 30 patents

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, LAYERED...

POLYSILOXANE SKELETON POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PA...

SILOXANE POLYMER CONTAINING ISOCYANURIC ACID AND POLYETHER SKELETON...

LAMINATE AND PATTERN FORMING METHOD

FILM MATERIAL AND PATTERN FORMING PROCESS

METHOD FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR MANUFA...

SEMICONDUCTOR APPARATUS, STACKED SEMICONDUCTOR APPARATUS, ENCAPSULA...

SEMICONDUCTOR APPARATUS, STACKED SEMICONDUCTOR APPARATUS, ENCAPSULA...

SEMICONDUCTOR APPARATUS, STACKED SEMICONDUCTOR APPARATUS, ENCAPSULA...

PHOTO-CURABLE RESIN COMPOSITION AND PHOTO-CURABLE DRY FILM USING TH...

SILICONE ADHESIVE COMPOSITION AND SOLID-STATE IMAGING DEVICE

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY...

PHOTO-CURABLE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING...

ADHESIVE COMPOSITION AND ADHESIVE DRY FILM

PHOTOCURABLE RESIN COMPOSITION, DRY FILM THEREOF, PATTERN FORMING M...

Positive photoresist composition