Lakmal C. Kalutarage

Person

Detroit, MI, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for depositing blocking layers on metal surfaces
- Patent number 12,131,900
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor phase photoresists deposition
- Patent number 12,084,764
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,068,170
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reducing agents for atomic layer deposition
- Patent number 12,031,209
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,033,866
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gap-fill with aluminum-containing films
- Patent number 12,018,363
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Mark Saly
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for selective dry etching gallium oxide
- Patent number 11,942,330
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Feng Q. Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of semiconductor integration films
- Patent number 11,886,120
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing blocking layers on conductive surfaces
- Patent number 11,702,733
- Issue date Jul 18, 2023
- Applied Materials, Inc.
- Lakmal C. Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 11,621,172
- Issue date Apr 4, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of semiconductor integration films
- Patent number 11,562,904
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of flowable silicon-containing films
- Patent number 11,515,149
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Lakmal C. Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing blocking layers on metal surfaces
- Patent number 11,417,515
- Issue date Aug 16, 2022
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for selective dry etching gallium oxide
- Patent number 11,398,388
- Issue date Jul 26, 2022
- Applied Materials, Inc.
- Feng Q. Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-k dielectric films
- Patent number 11,393,678
- Issue date Jul 19, 2022
- Applied Materials, Inc.
- William J. Durand
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for selective deposition of dielectric on silicon oxide
- Patent number 11,371,136
- Issue date Jun 28, 2022
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition and etch processes of chromium-containing thin films for...
- Patent number 11,289,328
- Issue date Mar 29, 2022
- Applied Materials Inc.
- Thomas Knisley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sequential deposition and high frequency plasma treatment of deposi...
- Patent number 11,217,443
- Issue date Jan 4, 2022
- Applied Materials, Inc.
- Vinayak Veer Vats
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing silicon nitride
- Patent number 11,107,674
- Issue date Aug 31, 2021
- Applied Materials, Inc.
- Lakmal C. Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods to deposit flowable (gap-fill) carbon containing films usin...
- Patent number 10,985,009
- Issue date Apr 20, 2021
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for depositing yttrium-containing films
- Patent number 10,760,159
- Issue date Sep 1, 2020
- Applied Materials, Inc.
- Lakmal C. Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature molecular layer deposition of SiCON
- Patent number 10,354,861
- Issue date Jul 16, 2019
- Applied Materials, Inc.
- Mark Saly
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature molecular layer deposition of SiCON
- Patent number 9,812,318
- Issue date Nov 7, 2017
- Applied Materials, Inc.
- Mark Saly
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Synthesis and characterization of first row transition metal comple...
- Patent number 9,758,866
- Issue date Sep 12, 2017
- Wayne State University
- Charles H. Winter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precursors for atomic layer deposition
- Patent number 9,714,464
- Issue date Jul 25, 2017
- Wayne State University
- Charles H. Winter
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Synthesis and characterization of first row transition metal comple...
- Patent number 8,907,115
- Issue date Dec 9, 2014
- Wayne State University
- Charles H. Winter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ATOMIC LAYER DEPOSITION OF SILICON-CARBON-AND-NITROGEN-CONTAINING M...
- Publication number 20240332001
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Lakmal C. Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE-METAL-CONTAINING METAL-OXO PHOTORESIST FILMS BY CVD AND AL...
- Publication number 20240271276
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- LAKMAL KALUTARAGE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION OF RUTHENIUM OXIDE COATINGS
- Publication number 20240247370
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXTREME ULTRAVIOLET PELLICLES AND METHOD OF MANUFACTURING
- Publication number 20240248391
- Publication date Jul 25, 2024
- Applied Mateials, Inc.
- Thomas Joseph Knisley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...
- Publication number 20240160100
- Publication date May 16, 2024
- Applied Materials, Inc.
- Tzu Shun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIAL
- Publication number 20240120193
- Publication date Apr 11, 2024
- Applied Materials, Inc.
- Shankar Venkataraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS
- Publication number 20240087880
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Shruba Gangopadhyay
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS
- Publication number 20240087881
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Michael Haverty
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON MOLD FOR DRAM CAPACITOR
- Publication number 20240038833
- Publication date Feb 1, 2024
- Applied Materials, Inc.
- Fredrick Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO OPTIMIZE POST DEPOSITION BAKING CONDITION OF PHOTO RESIST...
- Publication number 20240012325
- Publication date Jan 11, 2024
- Applied Materials, Inc.
- LUISA BOZANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE ETCH OF A SUBSTRATE
- Publication number 20230420259
- Publication date Dec 28, 2023
- Applied Materials, Inc.
- David Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS
- Publication number 20230386839
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF GROWING METAL-CONTAINING FILMS
- Publication number 20230295803
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Haoming Yan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING BLOCKING LAYERS ON CONDUCTIVE SURFACES
- Publication number 20230295794
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Lakmal C. Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS
- Publication number 20230290646
- Publication date Sep 14, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MOLYBDENUM-DAD PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS
- Publication number 20230235451
- Publication date Jul 27, 2023
- Applied Materials, Inc.
- Thomas Joseph Knisley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS
- Publication number 20230215736
- Publication date Jul 6, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS
- Publication number 20230127535
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Depositing Blocking Layers On Metal Surfaces
- Publication number 20220384176
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING BLOCKING LAYERS ON CONDUCTIVE SURFACES
- Publication number 20220372616
- Publication date Nov 24, 2022
- Applied Materials, Inc.
- Lakmal C. Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DUAL TONE PHOTORESISTS
- Publication number 20220342302
- Publication date Oct 27, 2022
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDATION TREATMENT FOR POSITIVE TONE PHOTORESIST FILMS
- Publication number 20220308453
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR SELECTIVE DRY ETCHING GALLIUM OXIDE
- Publication number 20220301883
- Publication date Sep 22, 2022
- Applied Materials, Inc.
- Feng Q. Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reducing Agents for Atomic Layer Deposition
- Publication number 20220259734
- Publication date Aug 18, 2022
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICAL VAPOR CONDENSATION DEPOSITION OF PHOTORESIST FILMS
- Publication number 20220262625
- Publication date Aug 18, 2022
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPOR DEPOSITION OF CARBON-DOPED METAL OXIDES FOR USE AS PHOTORESISTS
- Publication number 20220199406
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESISTS BY PHYSICAL VAPOR DEPOSITION
- Publication number 20220197146
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Lauren Bagby
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEPOSITION USING INDEPENDENT MULTICHANNEL SHOWERHEAD
- Publication number 20220155689
- Publication date May 19, 2022
- Applied Materials, Inc.
- Farzad Houshmand
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR SELECTIVE DRY ETCHING GALLIUM OXIDE
- Publication number 20220076960
- Publication date Mar 10, 2022
- Applied Materials, Inc.
- Feng Q. Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS
- Publication number 20220028691
- Publication date Jan 27, 2022
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS

Lakmal C. Kalutarage

Person

Patents Grantslast 30 patents

Methods for depositing blocking layers on metal surfaces

Vapor phase photoresists deposition

Vapor phase thermal etch solutions for metal oxo photoresists

Reducing agents for atomic layer deposition

Vapor phase thermal etch solutions for metal oxo photoresists

Gap-fill with aluminum-containing films

Methods for selective dry etching gallium oxide

Deposition of semiconductor integration films

Methods for depositing blocking layers on conductive surfaces

Vapor phase thermal etch solutions for metal oxo photoresists

Deposition of semiconductor integration films

Deposition of flowable silicon-containing films

Methods for depositing blocking layers on metal surfaces

Methods for selective dry etching gallium oxide

Low-k dielectric films

Methods for selective deposition of dielectric on silicon oxide

Deposition and etch processes of chromium-containing thin films for...

Sequential deposition and high frequency plasma treatment of deposi...

Methods for depositing silicon nitride

Methods to deposit flowable (gap-fill) carbon containing films usin...

Methods and apparatus for depositing yttrium-containing films

Low temperature molecular layer deposition of SiCON

Low temperature molecular layer deposition of SiCON

Synthesis and characterization of first row transition metal comple...

Precursors for atomic layer deposition

Synthesis and characterization of first row transition metal comple...

Patents Applicationslast 30 patents

ATOMIC LAYER DEPOSITION OF SILICON-CARBON-AND-NITROGEN-CONTAINING M...

MULTIPLE-METAL-CONTAINING METAL-OXO PHOTORESIST FILMS BY CVD AND AL...

ATOMIC LAYER DEPOSITION OF RUTHENIUM OXIDE COATINGS

EXTREME ULTRAVIOLET PELLICLES AND METHOD OF MANUFACTURING

INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...

CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIAL

SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS

SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS

CARBON MOLD FOR DRAM CAPACITOR

METHOD TO OPTIMIZE POST DEPOSITION BAKING CONDITION OF PHOTO RESIST...

SELECTIVE ETCH OF A SUBSTRATE

DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS

METHODS OF GROWING METAL-CONTAINING FILMS

METHODS FOR DEPOSITING BLOCKING LAYERS ON CONDUCTIVE SURFACES

VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS

MOLYBDENUM-DAD PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS

VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS

DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS

Methods For Depositing Blocking Layers On Metal Surfaces

METHODS FOR DEPOSITING BLOCKING LAYERS ON CONDUCTIVE SURFACES

DUAL TONE PHOTORESISTS

OXIDATION TREATMENT FOR POSITIVE TONE PHOTORESIST FILMS

METHODS FOR SELECTIVE DRY ETCHING GALLIUM OXIDE

Reducing Agents for Atomic Layer Deposition

CHEMICAL VAPOR CONDENSATION DEPOSITION OF PHOTORESIST FILMS

VAPOR DEPOSITION OF CARBON-DOPED METAL OXIDES FOR USE AS PHOTORESISTS

PHOTORESISTS BY PHYSICAL VAPOR DEPOSITION

PHOTORESIST DEPOSITION USING INDEPENDENT MULTICHANNEL SHOWERHEAD

METHODS FOR SELECTIVE DRY ETCHING GALLIUM OXIDE

DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS