Lakshmanan Karuppiah

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
In-situ metrology and process control
- Patent number 11,908,718
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Ramesh Krishnamurthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ metrology and process control
- Patent number 11,289,352
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Ramesh Krishnamurthy
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for substrate polishing end point detection usi...
- Patent number 9,862,070
- Issue date Jan 9, 2018
- Applied Materials, Inc.
- Shou-Sung Chang
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and apparatus for post-chemical mechanical planarization su...
- Patent number 9,711,381
- Issue date Jul 18, 2017
- Applied Materials, Inc.
- Sen-Hou Ko
- B24 - GRINDING POLISHING
Information Patent Grant
Disk-brush cleaner module with fluid jet
- Patent number 9,646,859
- Issue date May 9, 2017
- Applied Materials, Inc.
- Hui Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feedback control using detection of clearance and adjustment for un...
- Patent number 9,472,475
- Issue date Oct 18, 2016
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Grant
Semiconductor device processing tools and methods for patterning su...
- Patent number 9,431,267
- Issue date Aug 30, 2016
- Applied Materials, Inc.
- Mayur Trivedi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feedback control of polishing using optical detection of clearance
- Patent number 9,073,169
- Issue date Jul 7, 2015
- Applied Materials, Inc.
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Grant
Systems and methods for substrate polishing end point detection usi...
- Patent number 9,061,394
- Issue date Jun 23, 2015
- Applied Materials, Inc.
- Shou-Sung Chang
- B24 - GRINDING POLISHING
Information Patent Grant
Spectrographic monitoring of a substrate during processing using in...
- Patent number 8,874,250
- Issue date Oct 28, 2014
- Applied Materials, Inc.
- Jeffrey Drue David
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and methods for brush and pad conditioning
- Patent number 8,813,293
- Issue date Aug 26, 2014
- Applied Materials, Inc.
- Sen-Hou Ko
- B24 - GRINDING POLISHING
Information Patent Grant
In-line wafer thickness sensing
- Patent number 8,628,376
- Issue date Jan 14, 2014
- Applied Materials, Inc.
- Garrett H. Sin
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical planarization of copper wafer polishing
- Patent number 8,586,481
- Issue date Nov 19, 2013
- Applied Materials, Inc.
- You Wang
- B24 - GRINDING POLISHING
Information Patent Grant
Spectrographic monitoring of a substrate during processing using in...
- Patent number 8,554,351
- Issue date Oct 8, 2013
- Applied Materials, Inc.
- Jeffrey Drue David
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and methods for brush and pad conditioning
- Patent number 8,458,843
- Issue date Jun 11, 2013
- Applied Materials, Inc.
- Sen-Hou Ko
- B24 - GRINDING POLISHING
Information Patent Grant
Wafer edge characterization by successive radius measurements
- Patent number 8,337,278
- Issue date Dec 25, 2012
- Applied Materials, Inc.
- Ignasi Palou-Rivera
- B24 - GRINDING POLISHING
Information Patent Grant
Spectrographic monitoring of a substrate during processing using in...
- Patent number 8,260,446
- Issue date Sep 4, 2012
- Applied Materials, Inc.
- Jeffrey Drue David
- B24 - GRINDING POLISHING
Information Patent Grant
Roller assembly for a brush cleaning device in a cleaning module
- Patent number 8,250,695
- Issue date Aug 28, 2012
- Applied Materials, Inc.
- Lakshmanan Karuppiah
- B08 - CLEANING
Information Patent Grant
Dishing and defect control of chemical mechanical polishing using r...
- Patent number 8,210,900
- Issue date Jul 3, 2012
- Applied Materials, Inc.
- Wen-Chiang Tu
- B24 - GRINDING POLISHING
Information Patent Grant
Process sequence to achieve global planarity using a combination of...
- Patent number 8,211,325
- Issue date Jul 3, 2012
- Applied Materials, Inc.
- Jie Diao
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing system having a track
- Patent number 8,172,643
- Issue date May 8, 2012
- Applied Materials, Inc.
- Alpay Yilmaz
- B24 - GRINDING POLISHING
Information Patent Grant
Determining physical property of substrate
- Patent number 8,014,004
- Issue date Sep 6, 2011
- Applied Materials, Inc.
- Abraham Ravid
- G01 - MEASURING TESTING
Information Patent Grant
High throughput measurement system
- Patent number 7,952,708
- Issue date May 31, 2011
- Applied Materials, Inc.
- Abraham Ravid
- G01 - MEASURING TESTING
Information Patent Grant
Smart conditioner rinse station
- Patent number 7,914,363
- Issue date Mar 29, 2011
- Applied Materials, Inc.
- Alpay Yilmaz
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and apparatus for generating a library of spectra
- Patent number 7,840,375
- Issue date Nov 23, 2010
- Applied Materials, Inc.
- Abraham Ravid
- G01 - MEASURING TESTING
Information Patent Grant
Substrate thickness measuring during polishing
- Patent number 7,774,086
- Issue date Aug 10, 2010
- Applied Materials, Inc.
- Jeffrey Drue David
- B24 - GRINDING POLISHING
Information Patent Grant
Determining physical property of substrate
- Patent number 7,746,485
- Issue date Jun 29, 2010
- Applied Materials, Inc.
- Abraham Ravid
- G01 - MEASURING TESTING
Information Patent Grant
Substrate thickness measuring during polishing
- Patent number 7,657,342
- Issue date Feb 2, 2010
- Applied Materials, Inc.
- Jeffrey Drue David
Information Patent Grant
Smart conditioner rinse station
- Patent number 7,611,400
- Issue date Nov 3, 2009
- Applied Materials, Inc.
- Alpay Yilmaz
- B24 - GRINDING POLISHING
Information Patent Grant
Conductive pad design modification for better wafer-pad contact
- Patent number 7,520,968
- Issue date Apr 21, 2009
- Applied Materials, Inc.
- Rashid A. Mavliev
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
MONITORING THICKNESS IN FACE-UP POLISHING WITH ROLLER
- Publication number 20240017376
- Publication date Jan 18, 2024
- Applied Materials, Inc.
- Brian J. Brown
- B24 - GRINDING POLISHING
Information Patent Application
MONITORING THICKNESS IN FACE-UP POLISHING
- Publication number 20240017371
- Publication date Jan 18, 2024
- Applied Materials, Inc.
- Brian J. Brown
- B24 - GRINDING POLISHING
Information Patent Application
In-Situ Metrology And Process Control
- Publication number 20220181179
- Publication date Jun 9, 2022
- Applied Materials, Inc.
- Ramesh Krishnamurthy
- G05 - CONTROLLING REGULATING
Information Patent Application
In-Situ Metrology And Process Control
- Publication number 20200335369
- Publication date Oct 22, 2020
- Applied Materials, Inc.
- Ramesh Krishnamurthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR BRUSH AND PAD CONDITIONING
- Publication number 20140360976
- Publication date Dec 11, 2014
- Sen-Hou KO
- A46 - BRUSHWARE
Information Patent Application
METHODS AND APPARATUS FOR POST-CHEMICAL MECHANICAL PLANARIZATION SU...
- Publication number 20140209239
- Publication date Jul 31, 2014
- Sen-Hou Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRYOGENIC LIQUID CLEANING APPARATUS AND METHODS
- Publication number 20140196749
- Publication date Jul 17, 2014
- Jianshe Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE PROCESSING TOOLS AND METHODS FOR PATTERNING SU...
- Publication number 20140154887
- Publication date Jun 5, 2014
- Mayur Trivedi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPECTROGRAPHIC MONITORING OF A SUBSTRATE DURING PROCESSING USING IN...
- Publication number 20140039660
- Publication date Feb 6, 2014
- Applied Materials, Inc.
- Jeffrey Drue David
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR ACTIVE SUBSTRATE PRECESSION DURING CHEMIC...
- Publication number 20130288577
- Publication date Oct 31, 2013
- Applied Materials, Inc.
- Hung Chen
- B24 - GRINDING POLISHING
Information Patent Application
APPARATUS AND METHODS FOR BRUSH AND PAD CONDITIONING
- Publication number 20130247314
- Publication date Sep 26, 2013
- Sen-Hou KO
- A46 - BRUSHWARE
Information Patent Application
Feedback Control Using Detection Of Clearance And Adjustment For Un...
- Publication number 20130224890
- Publication date Aug 29, 2013
- Kun Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING MODULE AND PROCESS FOR PARTICLE REDUCTION
- Publication number 20130185884
- Publication date Jul 25, 2013
- Sen-Hou Ko
- B08 - CLEANING
Information Patent Application
SLURRY FOR PLANARIZING PHOTORESIST
- Publication number 20130189843
- Publication date Jul 25, 2013
- You Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY FOR COBALT APPLICATIONS
- Publication number 20130186850
- Publication date Jul 25, 2013
- APPLIED MATERIALS, INC.
- You Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SYSTEMS AND METHODS FOR SUBSTRATE POLISHING END POINT DETECTION USI...
- Publication number 20130122788
- Publication date May 16, 2013
- Applied Materials, Inc.
- Shou-Sung Chang
- B24 - GRINDING POLISHING
Information Patent Application
SYSTEMS AND METHODS FOR SUBSTRATE POLISHING END POINT DETECTION USI...
- Publication number 20130122782
- Publication date May 16, 2013
- Applied Materials, Inc.
- Shou-Sung Chang
- B24 - GRINDING POLISHING
Information Patent Application
BRUSH BOX MODULE FOR CHEMICAL MECHANICAL POLISHING CLEANER
- Publication number 20130111678
- Publication date May 9, 2013
- Applied Materials, Inc.
- Hui Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPECTROGRAPHIC MONITORING OF A SUBSTRATE DURING PROCESSING USING IN...
- Publication number 20120323355
- Publication date Dec 20, 2012
- Jeffrey Drue David
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING SYSTEM HAVING A TRACK
- Publication number 20120208438
- Publication date Aug 16, 2012
- Applied Materials, Inc.
- Alpay Yilmaz
- B24 - GRINDING POLISHING
Information Patent Application
Feedback Control of Polishing Using Optical Detection of Clearance
- Publication number 20120064801
- Publication date Mar 15, 2012
- Kun Xu
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL PLANARIZATION OF COPPER WAFER POLISHING
- Publication number 20110294293
- Publication date Dec 1, 2011
- Applied Materials, Inc.
- You Wang
- B24 - GRINDING POLISHING
Information Patent Application
Determining Physical Property of Substrate
- Publication number 20110294400
- Publication date Dec 1, 2011
- Abraham Ravid
- G01 - MEASURING TESTING
Information Patent Application
DISK-BRUSH CLEANER MODULE WITH FLUID JET
- Publication number 20110265816
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- Hui Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR BRUSH AND PAD CONDITIONING
- Publication number 20110094537
- Publication date Apr 28, 2011
- APPLIED MATERIALS, INC.
- Sen-Hou Ko
- B08 - CLEANING
Information Patent Application
ROLLER ASSEMBLY FOR A BRUSH CLEANING DEVICE IN A CLEANING MODULE
- Publication number 20110079245
- Publication date Apr 7, 2011
- Applied Materials, Inc.
- Lakshmanan Karuppiah
- B08 - CLEANING
Information Patent Application
METHODS AND APPARATUS FOR GENERATING A LIBRARY OF SPECTRA
- Publication number 20110046918
- Publication date Feb 24, 2011
- Abraham Ravid
- G01 - MEASURING TESTING
Information Patent Application
PROCESS SEQUENCE TO ACHIEVE GLOBAL PLANARITY USING A COMBINATION OF...
- Publication number 20100285666
- Publication date Nov 11, 2010
- Applied Materials, Inc.
- JIE DIAO
- B24 - GRINDING POLISHING
Information Patent Application
Determining Physical Property of Substrate
- Publication number 20100261413
- Publication date Oct 14, 2010
- Applied Materials, Inc.
- Abraham Ravid
- G01 - MEASURING TESTING
Information Patent Application
SPECTROGRAPHIC MONITORING OF A SUBSTRATE DURING PROCESSING USING IN...
- Publication number 20100217430
- Publication date Aug 26, 2010
- Applied Materials, Inc.
- Jeffrey Drue David
- G05 - CONTROLLING REGULATING

Lakshmanan Karuppiah

Person

Patents Grantslast 30 patents

In-situ metrology and process control

In-situ metrology and process control

Systems and methods for substrate polishing end point detection usi...

Methods and apparatus for post-chemical mechanical planarization su...

Disk-brush cleaner module with fluid jet

Feedback control using detection of clearance and adjustment for un...

Semiconductor device processing tools and methods for patterning su...

Feedback control of polishing using optical detection of clearance

Systems and methods for substrate polishing end point detection usi...

Spectrographic monitoring of a substrate during processing using in...

Apparatus and methods for brush and pad conditioning

In-line wafer thickness sensing

Chemical planarization of copper wafer polishing

Spectrographic monitoring of a substrate during processing using in...

Apparatus and methods for brush and pad conditioning

Wafer edge characterization by successive radius measurements

Spectrographic monitoring of a substrate during processing using in...

Roller assembly for a brush cleaning device in a cleaning module

Dishing and defect control of chemical mechanical polishing using r...

Process sequence to achieve global planarity using a combination of...

Polishing system having a track

Determining physical property of substrate

High throughput measurement system

Smart conditioner rinse station

Methods and apparatus for generating a library of spectra

Substrate thickness measuring during polishing

Determining physical property of substrate

Substrate thickness measuring during polishing

Smart conditioner rinse station

Conductive pad design modification for better wafer-pad contact

Patents Applicationslast 30 patents

MONITORING THICKNESS IN FACE-UP POLISHING WITH ROLLER

MONITORING THICKNESS IN FACE-UP POLISHING

In-Situ Metrology And Process Control

In-Situ Metrology And Process Control

APPARATUS AND METHODS FOR BRUSH AND PAD CONDITIONING

METHODS AND APPARATUS FOR POST-CHEMICAL MECHANICAL PLANARIZATION SU...

CRYOGENIC LIQUID CLEANING APPARATUS AND METHODS

SEMICONDUCTOR DEVICE PROCESSING TOOLS AND METHODS FOR PATTERNING SU...

SPECTROGRAPHIC MONITORING OF A SUBSTRATE DURING PROCESSING USING IN...

METHODS AND APPARATUS FOR ACTIVE SUBSTRATE PRECESSION DURING CHEMIC...

APPARATUS AND METHODS FOR BRUSH AND PAD CONDITIONING

Feedback Control Using Detection Of Clearance And Adjustment For Un...

CLEANING MODULE AND PROCESS FOR PARTICLE REDUCTION

SLURRY FOR PLANARIZING PHOTORESIST

SLURRY FOR COBALT APPLICATIONS

SYSTEMS AND METHODS FOR SUBSTRATE POLISHING END POINT DETECTION USI...

SYSTEMS AND METHODS FOR SUBSTRATE POLISHING END POINT DETECTION USI...

BRUSH BOX MODULE FOR CHEMICAL MECHANICAL POLISHING CLEANER

SPECTROGRAPHIC MONITORING OF A SUBSTRATE DURING PROCESSING USING IN...

POLISHING SYSTEM HAVING A TRACK

Feedback Control of Polishing Using Optical Detection of Clearance

CHEMICAL PLANARIZATION OF COPPER WAFER POLISHING

Determining Physical Property of Substrate

DISK-BRUSH CLEANER MODULE WITH FLUID JET

APPARATUS AND METHODS FOR BRUSH AND PAD CONDITIONING

ROLLER ASSEMBLY FOR A BRUSH CLEANING DEVICE IN A CLEANING MODULE

METHODS AND APPARATUS FOR GENERATING A LIBRARY OF SPECTRA

PROCESS SEQUENCE TO ACHIEVE GLOBAL PLANARITY USING A COMBINATION OF...

Determining Physical Property of Substrate

SPECTROGRAPHIC MONITORING OF A SUBSTRATE DURING PROCESSING USING IN...