Lakshminarayana Nittala

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Sunnyvale, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
CVD flowable gap fill
- Patent number 9,257,302
- Issue date Feb 9, 2016
- Novellus Systems, Inc.
- Feng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flowable oxide deposition using rapid delivery of process gases
- Patent number 9,064,684
- Issue date Jun 23, 2015
- Novellus Systems, Inc.
- Collin K. L. Mui
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Gap fill integration
- Patent number 8,728,958
- Issue date May 20, 2014
- Novellus Systems, Inc.
- Kaihan Ashtiani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Premetal dielectric integration process
- Patent number 8,685,867
- Issue date Apr 1, 2014
- Novellus Systems, Inc.
- Michal Danek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flowable oxide deposition using rapid delivery of process gases
- Patent number 8,278,224
- Issue date Oct 2, 2012
- Novellus Systems, Inc.
- Collin K. L. Mui
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND APPARATUS FOR DIELECTRIC DEPOSITION
- Publication number 20140302689
- Publication date Oct 9, 2014
- Novellus Systems, Inc.
- Kaihan Ashtiani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM UP FILL IN HIGH ASPECT RATIO TRENCHES
- Publication number 20120149213
- Publication date Jun 14, 2012
- Lakshminarayana Nittala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOVEL GAP FILL INTEGRATION
- Publication number 20110151678
- Publication date Jun 23, 2011
- Kaihan Ashtiani
- H01 - BASIC ELECTRIC ELEMENTS