Lala Zhu

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-zone semiconductor substrate supports
- Patent number 11,915,950
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chamber for multiple precursor flow
- Patent number 11,361,939
- Issue date Jun 14, 2022
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing chamber for multiple precursor flow
- Patent number 11,276,559
- Issue date Mar 15, 2022
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone semiconductor substrate supports
- Patent number 11,276,590
- Issue date Mar 15, 2022
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process window widening using coated parts in plasma etch processes
- Patent number 11,101,136
- Issue date Aug 24, 2021
- Applied Materials, Inc.
- Dongqing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process window widening using coated parts in plasma etch processes
- Patent number 10,297,458
- Issue date May 21, 2019
- Applied Materials, Inc.
- Dongqing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Saving ion-damaged spacers
- Patent number 9,721,789
- Issue date Aug 1, 2017
- Applied Materials, Inc.
- Dongqing Yang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTI-ZONE SEMICONDUCTOR SUBSTRATE SUPPORTS
- Publication number 20220148894
- Publication date May 12, 2022
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH CONDUCTANCE PROCESS KIT
- Publication number 20220084845
- Publication date Mar 17, 2022
- Applied Materials, Inc.
- Samartha Subramanya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Selective Deposition of Dielectric Films
- Publication number 20210043448
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER FOR MULTIPLE PRECURSOR FLOW
- Publication number 20190311883
- Publication date Oct 10, 2019
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS WINDOW WIDENING USING COATED PARTS IN PLASMA ETCH PROCESSES
- Publication number 20190272998
- Publication date Sep 5, 2019
- Applied Materials, Inc.
- Dongqing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS WINDOW WIDENING USING COATED PARTS IN PLASMA ETCH PROCESSES
- Publication number 20190043726
- Publication date Feb 7, 2019
- Applied Materials, Inc.
- Dongqing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE SEMICONDUCTOR SUBSTRATE SUPPORTS
- Publication number 20180337074
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER FOR MULTIPLE PRECURSOR FLOW
- Publication number 20180337057
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method And Apparatus For Selective Deposition Of Dielectric Films
- Publication number 20180211833
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Multi-zone semiconductor substrate supports

Semiconductor processing chamber for multiple precursor flow

Semiconductor processing chamber for multiple precursor flow

Multi-zone semiconductor substrate supports

Process window widening using coated parts in plasma etch processes

Process window widening using coated parts in plasma etch processes

Saving ion-damaged spacers

Patents Applicationslast 30 patents

MULTI-ZONE SEMICONDUCTOR SUBSTRATE SUPPORTS

HIGH CONDUCTANCE PROCESS KIT

Method and Apparatus for Selective Deposition of Dielectric Films

SEMICONDUCTOR PROCESSING CHAMBER FOR MULTIPLE PRECURSOR FLOW

PROCESS WINDOW WIDENING USING COATED PARTS IN PLASMA ETCH PROCESSES

PROCESS WINDOW WIDENING USING COATED PARTS IN PLASMA ETCH PROCESSES

MULTI-ZONE SEMICONDUCTOR SUBSTRATE SUPPORTS

SEMICONDUCTOR PROCESSING CHAMBER FOR MULTIPLE PRECURSOR FLOW

Method And Apparatus For Selective Deposition Of Dielectric Films