Lara Hawrylchak

Person

Gilroy, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Processing system and method of delivering a reactant gas
- Patent number 12,139,790
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated epitaxy and preclean system
- Patent number 12,125,698
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Fast response pedestal assembly for selective preclean
- Patent number 11,990,321
- Issue date May 21, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Asymmetric injection for better wafer uniformity
- Patent number 11,959,169
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Eric Kihara Shono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Remote plasma oxidation chamber
- Patent number 11,615,944
- Issue date Mar 28, 2023
- Applied Materials, Inc.
- Christopher S. Olsen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for selective nitridation process
- Patent number 11,581,408
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Matthew Scott Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas injector with baffle
- Patent number 11,529,592
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fast response pedestal assembly for selective preclean
- Patent number 11,515,130
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Asymmetric injection for better wafer uniformity
- Patent number 11,486,038
- Issue date Nov 1, 2022
- Applied Materials, Inc.
- Eric Kihara Shono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-enhanced anneal chamber for wafer outgassing
- Patent number 11,348,769
- Issue date May 31, 2022
- Applied Materials, Inc.
- Lara Hawrylchak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas injection apparatus with heating channels
- Patent number 11,268,193
- Issue date Mar 8, 2022
- Applied Materials, Inc.
- Lara Hawrylchak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated epitaxy and preclean system
- Patent number 11,164,737
- Issue date Nov 2, 2021
- Applied Materials, Inc.
- Lara Hawrylchak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Non-disappearing anode for use with dielectric deposition
- Patent number 11,114,289
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Michael S. Cox
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injector with baffle
- Patent number 11,077,410
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Argon addition to remote plasma oxidation
- Patent number 11,081,340
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Hansel Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxy system integrated with high selectivity oxide removal and h...
- Patent number 11,049,719
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Finned rotor cover
- Patent number 11,004,704
- Issue date May 11, 2021
- Applied Materials, Inc.
- Lara Hawrylchak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film treatment process
- Patent number 10,971,357
- Issue date Apr 6, 2021
- Applied Materials, Inc.
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal processing chamber with low temperature control
- Patent number 10,948,353
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Lara Hawrylchak
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for selective nitridation process
- Patent number 10,950,698
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Matthew Scott Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for precleaning a substrate surface prior to e...
- Patent number 10,837,122
- Issue date Nov 17, 2020
- Applied Materials, Inc.
- Christopher S. Olsen
- C30 - CRYSTAL GROWTH
Information Patent Grant
Plasma-enhanced anneal chamber for wafer outgassing
- Patent number 10,770,272
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Lara Hawrylchak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High pressure RF-DC sputtering and methods to improve film uniformi...
- Patent number 10,763,090
- Issue date Sep 1, 2020
- Applied Materials, Inc.
- Adolph Miller Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-contact temperature calibration tool for a substrate support an...
- Patent number 10,763,141
- Issue date Sep 1, 2020
- Applied Materials, Inc.
- Niraj Merchant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chamber
- Patent number 10,741,428
- Issue date Aug 11, 2020
- Applied Materials, Inc.
- Aaron Muir Hunter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injection apparatus with heating channels
- Patent number 10,689,757
- Issue date Jun 23, 2020
- Applied Materials, Inc.
- Lara Hawrylchak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Argon addition to remote plasma oxidation
- Patent number 10,636,650
- Issue date Apr 28, 2020
- Applied Materials, Inc.
- Hansel Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Showerhead design
- Patent number 10,626,500
- Issue date Apr 21, 2020
- Applied Materials, Inc.
- Kartik Shah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal cooling member with low temperature control
- Patent number 10,571,337
- Issue date Feb 25, 2020
- Applied Materials, Inc.
- Lara Hawrylchak
- G05 - CONTROLLING REGULATING
Information Patent Grant
Apparatus and methods for backside passivation
- Patent number 10,535,513
- Issue date Jan 14, 2020
- Applied Materials, Inc.
- Lara Hawrylchak
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR PRECLEANING A SUBSTRATE SURFACE PRIOR TO E...
- Publication number 20240301584
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Christopher S. OLSEN
- C30 - CRYSTAL GROWTH
Information Patent Application
FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN
- Publication number 20240282556
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- B08 - CLEANING
Information Patent Application
PROCESS CHAMBER PROCESS KIT WITH PROTECTIVE COATING
- Publication number 20230245863
- Publication date Aug 3, 2023
- Applied Materials, Inc.
- Jian WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DUAL PRESSURE OXIDATION METHOD FOR FORMING AN OXIDE LAYER IN A FEATURE
- Publication number 20230207291
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Christopher S. OLSEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN
- Publication number 20230086640
- Publication date Mar 23, 2023
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASYMMETRIC INJECTION FOR BETTER WAFER UNIFORMITY
- Publication number 20230028054
- Publication date Jan 26, 2023
- Applied Materials, Inc.
- Eric Kihara Shono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE OXIDATION ON RAPID THERMAL PROCESSING (RTP) CHAMBER WITH...
- Publication number 20220415676
- Publication date Dec 29, 2022
- Chaitanya Anjaneyalu PRASAD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEM AND METHOD OF DELIVERING A REACTANT GAS
- Publication number 20220411927
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Vishwas Kumar PANDEY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS SYSTEM WITH VARIABLE FLOW VALVE
- Publication number 20220223383
- Publication date Jul 14, 2022
- Applied Materials, Inc.
- Eric Kihara SHONO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOVEL AND EFFECTIVE HOMOGENIZE FLOW MIXING DESIGN
- Publication number 20220165547
- Publication date May 26, 2022
- Applied Materials, Inc.
- Vishwas Kumar PANDEY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND SYSTEM FOR DELIVERING GAS TO A PROCESS CHAMBER
- Publication number 20220154338
- Publication date May 19, 2022
- Applied Materials, Inc.
- Christopher S. OLSEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20220059342
- Publication date Feb 24, 2022
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS KIT WITH PROTECTIVE CERAMIC COATINGS FOR HYDROGEN AND NH3 P...
- Publication number 20220013336
- Publication date Jan 13, 2022
- Applied Materials, Inc.
- Jian WU
- B08 - CLEANING
Information Patent Application
GAS INJECTOR WITH BAFFLE
- Publication number 20210322934
- Publication date Oct 21, 2021
- Applied Materials, Inc.
- Vishwas Kumar PANDEY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR IMPROVING FLOW UNIFORMITY IN A PROCESS CH...
- Publication number 20210249239
- Publication date Aug 12, 2021
- Applied Materials, Inc.
- Naman APURVA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SELECTIVE NITRIDATION PROCESS
- Publication number 20210202702
- Publication date Jul 1, 2021
- Applied Materials, Inc.
- Matthew Scott ROGERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS INJECTION APPARATUS WITH HEATING CHANNELS
- Publication number 20210040612
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PRECLEANING A SUBSTRATE SURFACE PRIOR TO E...
- Publication number 20210010160
- Publication date Jan 14, 2021
- Applied Materials, Inc.
- Christopher S. OLSEN
- C30 - CRYSTAL GROWTH
Information Patent Application
PLASMA-ENHANCED ANNEAL CHAMBER FOR WAFER OUTGASSING
- Publication number 20200402780
- Publication date Dec 24, 2020
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMI...
- Publication number 20200357616
- Publication date Nov 12, 2020
- Applied Materials, Inc.
- Adolph Miller ALLEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ARGON ADDITION TO REMOTE PLASMA OXIDATION
- Publication number 20200251331
- Publication date Aug 6, 2020
- Applied Materials, Inc.
- Hansel LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASYMMETRIC INJECTION FOR BETTER WAFER UNIFORMITY
- Publication number 20200240014
- Publication date Jul 30, 2020
- Applied Materials, Inc.
- Eric Kihara Shono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMAL PROCESSING CHAMBER WITH LOW TEMPERATURE CONTROL
- Publication number 20200149968
- Publication date May 14, 2020
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
THIN FILM TREATMENT PROCESS
- Publication number 20200111659
- Publication date Apr 9, 2020
- Applied Materials, Inc.
- Wei LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER PROCESS KIT WITH PROTECTIVE COATING
- Publication number 20190385825
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Jian WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PRECLEANING A SUBSTRATE SURFACE PRIOR TO E...
- Publication number 20190382917
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Christopher S. OLSEN
- C30 - CRYSTAL GROWTH
Information Patent Application
FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN
- Publication number 20190272982
- Publication date Sep 5, 2019
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- B08 - CLEANING
Information Patent Application
ARGON ADDITION TO REMOTE PLASMA OXIDATION
- Publication number 20190221427
- Publication date Jul 18, 2019
- Applied Materials, Inc.
- Hansel LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD DESIGN
- Publication number 20190194810
- Publication date Jun 27, 2019
- Applied Materials, Inc.
- Kartik SHAH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS INJECTOR WITH BAFFLE
- Publication number 20190105614
- Publication date Apr 11, 2019
- Applied Materials, Inc.
- Vishwas Kumar PANDEY
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Lara Hawrylchak

Person

Patents Grantslast 30 patents

Processing system and method of delivering a reactant gas

Integrated epitaxy and preclean system

Fast response pedestal assembly for selective preclean

Asymmetric injection for better wafer uniformity

Remote plasma oxidation chamber

Method and apparatus for selective nitridation process

Gas injector with baffle

Fast response pedestal assembly for selective preclean

Asymmetric injection for better wafer uniformity

Plasma-enhanced anneal chamber for wafer outgassing

Gas injection apparatus with heating channels

Integrated epitaxy and preclean system

Non-disappearing anode for use with dielectric deposition

Gas injector with baffle

Argon addition to remote plasma oxidation

Epitaxy system integrated with high selectivity oxide removal and h...

Finned rotor cover

Thin film treatment process

Thermal processing chamber with low temperature control

Method and apparatus for selective nitridation process

Method and apparatus for precleaning a substrate surface prior to e...

Plasma-enhanced anneal chamber for wafer outgassing

High pressure RF-DC sputtering and methods to improve film uniformi...

Non-contact temperature calibration tool for a substrate support an...

Semiconductor processing chamber

Gas injection apparatus with heating channels

Argon addition to remote plasma oxidation

Showerhead design

Thermal cooling member with low temperature control

Apparatus and methods for backside passivation

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR PRECLEANING A SUBSTRATE SURFACE PRIOR TO E...

FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN

PROCESS CHAMBER PROCESS KIT WITH PROTECTIVE COATING

DUAL PRESSURE OXIDATION METHOD FOR FORMING AN OXIDE LAYER IN A FEATURE

FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN

ASYMMETRIC INJECTION FOR BETTER WAFER UNIFORMITY

SELECTIVE OXIDATION ON RAPID THERMAL PROCESSING (RTP) CHAMBER WITH...

PROCESSING SYSTEM AND METHOD OF DELIVERING A REACTANT GAS

PROCESS SYSTEM WITH VARIABLE FLOW VALVE

NOVEL AND EFFECTIVE HOMOGENIZE FLOW MIXING DESIGN

APPARATUS AND SYSTEM FOR DELIVERING GAS TO A PROCESS CHAMBER

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

PROCESS KIT WITH PROTECTIVE CERAMIC COATINGS FOR HYDROGEN AND NH3 P...

GAS INJECTOR WITH BAFFLE

METHODS AND APPARATUS FOR IMPROVING FLOW UNIFORMITY IN A PROCESS CH...

METHOD AND APPARATUS FOR SELECTIVE NITRIDATION PROCESS

GAS INJECTION APPARATUS WITH HEATING CHANNELS

METHOD AND APPARATUS FOR PRECLEANING A SUBSTRATE SURFACE PRIOR TO E...

PLASMA-ENHANCED ANNEAL CHAMBER FOR WAFER OUTGASSING

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMI...

ARGON ADDITION TO REMOTE PLASMA OXIDATION

ASYMMETRIC INJECTION FOR BETTER WAFER UNIFORMITY

THERMAL PROCESSING CHAMBER WITH LOW TEMPERATURE CONTROL

THIN FILM TREATMENT PROCESS

PROCESS CHAMBER PROCESS KIT WITH PROTECTIVE COATING

METHOD AND APPARATUS FOR PRECLEANING A SUBSTRATE SURFACE PRIOR TO E...

FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN

ARGON ADDITION TO REMOTE PLASMA OXIDATION

SHOWERHEAD DESIGN

GAS INJECTOR WITH BAFFLE