Larry D. Hartsough

Person

Berkley, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Control of erosion profile and process characteristics in magnetron...
- Patent number 6,500,321
- Issue date Dec 31, 2002
- Novellus Systems, Inc.
- Kaihan A. Ashtiani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for controlling plasma uniformity across a sub...
- Patent number 6,497,796
- Issue date Dec 24, 2002
- Novellus Systems, Inc.
- Kaihan A. Ashtiani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition reactor including magnet to control flow...
- Patent number 6,444,105
- Issue date Sep 3, 2002
- Novellus Systems, Inc.
- Kwok F. Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlling erosion profile in hollow cath...
- Patent number 6,193,854
- Issue date Feb 27, 2001
- Novellus Systems, Inc.
- Kwok Fai Lai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for controlling plasma uniformity across a sub...
- Patent number 6,179,973
- Issue date Jan 30, 2001
- Novellus Systems, Inc.
- Kwok F. Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internally cooled target assembly for magnetron sputtering
- Patent number 5,985,115
- Issue date Nov 16, 1999
- Novellus Systems, Inc.
- Larry D. Hartsough
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for magnetron in-situ cleaning of plasma react...
- Patent number 5,503,676
- Issue date Apr 2, 1996
- Lam Research Corporation
- Paul K. Shufflebotham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus having a rotating magnet array and fixed elect...
- Patent number 5,417,833
- Issue date May 23, 1995
- Varian Associates, Inc.
- David J. Harra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and process for sputter deposition of reacted thin films
- Patent number 4,420,385
- Issue date Dec 13, 1983
- Gryphon Products
- Larry D. Hartsough
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Laser induced dissociative chemical gas phase processing of workpieces
- Patent number 4,260,649
- Issue date Apr 7, 1981
- The Perkin-Elmer Corporation
- Dean R. Dension
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for attaching a target to the cathode of a spu...
- Patent number 4,204,936
- Issue date May 27, 1980
- The Perkin-Elmer Corporation
- Larry D. Hartsough
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlled reflectance of sputtered aluminum layers
- Patent number 4,125,446
- Issue date Nov 14, 1978
- Airco, Inc.
- Larry D. Hartsough
- F24 - HEATING RANGES VENTILATING

Patents Applicationslast 30 patents

Information Patent Application
SPUTTER CATHODE APPARATUS ALLOWING THICK MAGNETIC TARGETS
- Publication number 20100018857
- Publication date Jan 28, 2010
- Seagate Technology LLC
- Paul Stephen McLeod
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Larry D. Hartsough

Person

Patents Grantslast 30 patents

Control of erosion profile and process characteristics in magnetron...

Apparatus and method for controlling plasma uniformity across a sub...

Physical vapor deposition reactor including magnet to control flow...

Apparatus and method for controlling erosion profile in hollow cath...

Apparatus and method for controlling plasma uniformity across a sub...

Internally cooled target assembly for magnetron sputtering

Apparatus and method for magnetron in-situ cleaning of plasma react...

Sputtering apparatus having a rotating magnet array and fixed elect...

Apparatus and process for sputter deposition of reacted thin films

Laser induced dissociative chemical gas phase processing of workpieces

Method and apparatus for attaching a target to the cathode of a spu...

Controlled reflectance of sputtered aluminum layers

Patents Applicationslast 30 patents

SPUTTER CATHODE APPARATUS ALLOWING THICK MAGNETIC TARGETS