Larry GAO

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Fremont, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 11,776,811
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Larry Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching hardmasks containing high hardness materials
- Patent number 10,867,795
- Issue date Dec 15, 2020
- Applied Materials, Inc.
- Nancy Fung
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY...
- Publication number 20230377890
- Publication date Nov 23, 2023
- Applied Materials, Inc.
- Larry GAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY...
- Publication number 20220005688
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- NANCY FUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY...
- Publication number 20210358751
- Publication date Nov 18, 2021
- Applied Materials, Inc.
- Larry GAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF ETCHING HARDMASKS CONTAINING HIGH HARDNESS MATERIALS
- Publication number 20180337047
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- Nancy FUNG
- H01 - BASIC ELECTRIC ELEMENTS