Laurentius Catrinus Jorritsma

Person

Helmond, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus and a method of operating the apparatus
- Patent number 10,429,741
- Issue date Oct 1, 2019
- ASML Netherlands B.V.
- Jeroen Peter Johannes Bruijstens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and a method of operating the apparatus
- Patent number 10,151,984
- Issue date Dec 11, 2018
- ASML Netherlands B.V.
- Jeroen Peter Johannes Bruijstens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion lithographic apparatus with a barrier between a projectio...
- Patent number 9,176,371
- Issue date Nov 3, 2015
- ASML Netherlands B.V.
- Jeroen Peter Johannes Bruijstens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage apparatus, lithographic apparatus and device manufacturing me...
- Patent number 7,924,406
- Issue date Apr 12, 2011
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and computer pr...
- Patent number 7,903,234
- Issue date Mar 8, 2011
- ASML Netherlands B.V.
- Judocus Marie Dominicus Stoeldraijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and exchangeabl...
- Patent number 7,724,351
- Issue date May 25, 2010
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus having masking parts and device manufacturin...
- Patent number 7,671,968
- Issue date Mar 2, 2010
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of reducing a wave front aberration, and computer program pr...
- Patent number 7,580,113
- Issue date Aug 25, 2009
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, aberration correction device and device man...
- Patent number 7,538,952
- Issue date May 26, 2009
- ASML Netherlands B.V.
- Tammo Uitterdijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, aberration correction device and device man...
- Patent number 7,372,633
- Issue date May 13, 2008
- ASML Netherlands B.V.
- Tammo Uitterdijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method to correct for field curvature of multi lens array
- Patent number 7,332,733
- Issue date Feb 19, 2008
- ASML Netherlands B.V.
- Laurentius Catrinus Jorritsma
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,239,373
- Issue date Jul 3, 2007
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,221,430
- Issue date May 22, 2007
- ASML Netherlands B.V.
- Hendrikus Alphonsus Ludovicus Van Dijck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,126,672
- Issue date Oct 24, 2006
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
- Publication number 20160124319
- Publication date May 5, 2016
- ASML NETHERLANDS B.V.
- Jeroen Peter Johannes Bruijstens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
- Publication number 20100066987
- Publication date Mar 18, 2010
- ASML NETHERLANDS B.V.
- Jeroen Peter Johannes BRUIJSTENS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, aberration correction device and device man...
- Publication number 20080212183
- Publication date Sep 4, 2008
- ASML NETHERLANDS B.V.
- Tammo Uitterdijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method and computer pr...
- Publication number 20080158528
- Publication date Jul 3, 2008
- ASML NETHERLANDS B.V.
- Judocus Marie Dominicus Stoeldraijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, aberration correction device and device man...
- Publication number 20080024874
- Publication date Jan 31, 2008
- ASML NETHERLANDS B.V.
- Tammo Uitterdijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of reducing a wave front aberration, and computer program pr...
- Publication number 20070296938
- Publication date Dec 27, 2007
- ASML NETHERLANDS B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method and exchangeabl...
- Publication number 20070177122
- Publication date Aug 2, 2007
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method to correct for field curvature of multi lens array
- Publication number 20070075278
- Publication date Apr 5, 2007
- ASML NETHERLANDS B.V.
- Laurentius Catrinus Jorritsma
- G02 - OPTICS
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070030470
- Publication date Feb 8, 2007
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method and device manu...
- Publication number 20070013889
- Publication date Jan 18, 2007
- ASML NETHERLANDS B.V.
- Laurentius Catrinus Jorritsma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stage apparatus, lithographic apparatus and device manufacturing me...
- Publication number 20070013885
- Publication date Jan 18, 2007
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stage apparatus, lithographic apparatus and device manufacturing me...
- Publication number 20070013890
- Publication date Jan 18, 2007
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060139600
- Publication date Jun 29, 2006
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050254024
- Publication date Nov 17, 2005
- ASML NETHERLANDS B.V.
- Hendrikus Robertus Marie Van Greevenbroek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Laurentius Catrinus Jorritsma

Person

Patents Grantslast 30 patents

Lithographic apparatus and a method of operating the apparatus

Lithographic apparatus and a method of operating the apparatus

Immersion lithographic apparatus with a barrier between a projectio...

Stage apparatus, lithographic apparatus and device manufacturing me...

Lithographic apparatus, device manufacturing method and computer pr...

Lithographic apparatus, device manufacturing method and exchangeabl...

Lithographic apparatus having masking parts and device manufacturin...

Method of reducing a wave front aberration, and computer program pr...

Lithographic apparatus, aberration correction device and device man...

Lithographic apparatus, aberration correction device and device man...

System and method to correct for field curvature of multi lens array

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS

LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS

Lithographic apparatus, aberration correction device and device man...

Lithographic apparatus, device manufacturing method and computer pr...

Lithographic apparatus, aberration correction device and device man...

Method of reducing a wave front aberration, and computer program pr...

Lithographic apparatus, device manufacturing method and exchangeabl...

System and method to correct for field curvature of multi lens array

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method and device manu...

Stage apparatus, lithographic apparatus and device manufacturing me...

Stage apparatus, lithographic apparatus and device manufacturing me...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method