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Lawrence Bourget
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Winchester, MA, US
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last 30 patents
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Patent Grant
Use of pulsed-DC wafer bias for filling vias/trenches with metal in...
Patent number
6,051,114
Issue date
Apr 18, 2000
Applied Materials, Inc.
Tse-Yong Yao
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
High density plasma physical vapor deposition
Patent number
5,792,522
Issue date
Aug 11, 1998
Intel Corporation
Shu Jin
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Microwave plasma deposition source and method of filling high aspec...
Patent number
5,688,382
Issue date
Nov 18, 1997
Applied Science & Technology, Inc.
Matthew M. Besen
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
High growth rate plasma diamond deposition process and method of co...
Patent number
5,518,759
Issue date
May 21, 1996
Applied Science & Technology, Inc.
Evelio Sevillano
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
High growth rate plasma diamond deposition process and method of co...
Patent number
5,405,645
Issue date
Apr 11, 1995
Applied Science and Technology Inc.
Evelio Sevillano
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Process for depositing wear-resistant coatings
Patent number
5,279,866
Issue date
Jan 18, 1994
Applied Science and Technology Inc.
Lawrence Bourget
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...