Lawrence Scipioni

Person

Danvers, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma source for a focused ion beam system
- Patent number 9,640,367
- Issue date May 2, 2017
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing particle implantation
- Patent number 8,907,277
- Issue date Dec 9, 2014
- Carl Zeiss Microscopy, LLC
- Rainer Knippelmeyer
- G01 - MEASURING TESTING
Information Patent Grant
Magnetically enhanced, inductively coupled plasma source for a focu...
- Patent number 8,829,468
- Issue date Sep 9, 2014
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas field ion microscopes having multiple operation modes
- Patent number 8,455,840
- Issue date Jun 4, 2013
- Carl Zeiss Microscopy, LLC
- Lawrence Scipioni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual beam system
- Patent number 8,399,864
- Issue date Mar 19, 2013
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross-section systems and methods
- Patent number 8,384,029
- Issue date Feb 26, 2013
- Carl Zeiss NTS, LLC
- Rainer Knippelmeyer
- G01 - MEASURING TESTING
Information Patent Grant
Repairing defects
- Patent number 8,334,701
- Issue date Dec 18, 2012
- Carl Zeiss NTS, LLC
- Rainer Knippelmeyer
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Magnetically enhanced, inductively coupled plasma source for a focu...
- Patent number 8,168,957
- Issue date May 1, 2012
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample decontamination
- Patent number 8,013,300
- Issue date Sep 6, 2011
- Carl Zeiss NTS, LLC
- Lewis A. Stern
- G01 - MEASURING TESTING
Information Patent Grant
Dual beam system
- Patent number 8,013,311
- Issue date Sep 6, 2011
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically enhanced, inductively coupled plasma source for a focu...
- Patent number 7,670,455
- Issue date Mar 2, 2010
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual beam system
- Patent number 7,601,976
- Issue date Oct 13, 2009
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating nanodevices
- Patent number 7,544,523
- Issue date Jun 9, 2009
- FEI Company
- Gregory Schwind
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically enhanced, inductively coupled plasma source for a focu...
- Patent number 7,241,361
- Issue date Jul 10, 2007
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual beam system
- Patent number 7,161,159
- Issue date Jan 9, 2007
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of three dimensional structures
- Patent number 7,160,475
- Issue date Jan 9, 2007
- FEI Company
- Lawrence Scipioni
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
System for imaging a cross-section of a substrate
- Patent number 6,838,668
- Issue date Jan 4, 2005
- FEI Company
- Steve Berger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for imaging a cross-section of a substrate
- Patent number 6,727,500
- Issue date Apr 27, 2004
- FEI Company
- Steve Berger
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Magnetically Enhanced, Inductively coupled Plasma Source For a Focu...
- Publication number 20150130348
- Publication date May 14, 2015
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETICALLY ENHANCED, INDUCTIVELY COUPLED PLASMA SOURCE FOR A FOCU...
- Publication number 20120319000
- Publication date Dec 20, 2012
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSS-SECTION SYSTEMS AND METHODS
- Publication number 20120085906
- Publication date Apr 12, 2012
- CARL ZEISS NTS, LLC.
- Rainer Knippelmeyer
- G01 - MEASURING TESTING
Information Patent Application
GAS FIELD ION MICROSCOPES HAVING MULTIPLE OPERATION MODES
- Publication number 20120068067
- Publication date Mar 22, 2012
- CARL ZEISS NTS, LLC.
- Lawrence Scipioni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Beam System
- Publication number 20110309263
- Publication date Dec 22, 2011
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multibeam System
- Publication number 20110163068
- Publication date Jul 7, 2011
- Mark Utlaut
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCING PARTICLE IMPLANTATION
- Publication number 20110049364
- Publication date Mar 3, 2011
- Carl Zeiss SMT Inc.
- Rainer Knippelmeyer
- G01 - MEASURING TESTING
Information Patent Application
Magnetically Enhanced, Inductively Coupled Plasma Source for a Focu...
- Publication number 20100294648
- Publication date Nov 25, 2010
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ICE LAYERS IN CHARGED PARTICLE SYSTEMS AND METHODS
- Publication number 20100136255
- Publication date Jun 3, 2010
- Carl Zeiss SMT Inc.
- John A. Notte, IV
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REPAIRING DEFECTS
- Publication number 20100052697
- Publication date Mar 4, 2010
- Carl Zeiss SMT Inc.
- Rainer Knippelmeyer
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Dual Beam System
- Publication number 20100025578
- Publication date Feb 4, 2010
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE DECONTAMINATION
- Publication number 20090314939
- Publication date Dec 24, 2009
- Carl Zeiss SMT Inc.
- Lewis A. Stern
- G01 - MEASURING TESTING
Information Patent Application
Dual beam system
- Publication number 20080035860
- Publication date Feb 14, 2008
- FEI Company
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Magnetically enhanced, inductively coupled plasma source for a focu...
- Publication number 20080017319
- Publication date Jan 24, 2008
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating nanodevices
- Publication number 20070148991
- Publication date Jun 28, 2007
- FEI Company
- Gregory Schwind
- B82 - NANO-TECHNOLOGY
Information Patent Application
Magnetically enhanced, inductively coupled plasma source for a focu...
- Publication number 20050183667
- Publication date Aug 25, 2005
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual beam system
- Publication number 20050035291
- Publication date Feb 17, 2005
- Raymond Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication of three dimensional structures
- Publication number 20040099636
- Publication date May 27, 2004
- Lawrence Scipioni
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
System for imaging a cross-section of a substrate
- Publication number 20040065826
- Publication date Apr 8, 2004
- Steve Berger
- H01 - BASIC ELECTRIC ELEMENTS

Lawrence Scipioni

Person

Patents Grantslast 30 patents

Plasma source for a focused ion beam system

Reducing particle implantation

Magnetically enhanced, inductively coupled plasma source for a focu...

Gas field ion microscopes having multiple operation modes

Dual beam system

Cross-section systems and methods

Repairing defects

Magnetically enhanced, inductively coupled plasma source for a focu...

Sample decontamination

Dual beam system

Magnetically enhanced, inductively coupled plasma source for a focu...

Dual beam system

Method of fabricating nanodevices

Magnetically enhanced, inductively coupled plasma source for a focu...

Dual beam system

Fabrication of three dimensional structures

System for imaging a cross-section of a substrate

System for imaging a cross-section of a substrate

Patents Applicationslast 30 patents

Magnetically Enhanced, Inductively coupled Plasma Source For a Focu...

MAGNETICALLY ENHANCED, INDUCTIVELY COUPLED PLASMA SOURCE FOR A FOCU...

CROSS-SECTION SYSTEMS AND METHODS

GAS FIELD ION MICROSCOPES HAVING MULTIPLE OPERATION MODES

Dual Beam System

Multibeam System

REDUCING PARTICLE IMPLANTATION

Magnetically Enhanced, Inductively Coupled Plasma Source for a Focu...

ICE LAYERS IN CHARGED PARTICLE SYSTEMS AND METHODS

REPAIRING DEFECTS

Dual Beam System

SAMPLE DECONTAMINATION

Dual beam system

Magnetically enhanced, inductively coupled plasma source for a focu...

Method of fabricating nanodevices

Magnetically enhanced, inductively coupled plasma source for a focu...

Dual beam system

Fabrication of three dimensional structures

System for imaging a cross-section of a substrate