Le Ma

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Beijing, CN

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Patents Grantslast 30 patents

Information Patent Grant
Method and device for optimizing mask parameters
- Patent number 12,222,641
- Issue date Feb 11, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Jianfang He
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 12,198,930
- Issue date Jan 14, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Libin Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND DEVICE FOR OPTIMIZING MASK PARAMETERS
- Publication number 20240176228
- Publication date May 30, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Jianfang HE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CORRECTING LITHOGRAPHY PATTERN OF SURFACE PLASMA
- Publication number 20240077799
- Publication date Mar 7, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Le Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240055254
- Publication date Feb 15, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Libin Zhang
- H01 - BASIC ELECTRIC ELEMENTS