Lei ZHOU

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for particle removal from wafers through plasma modification...
- Patent number 11,932,934
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Corrosion resistant film on a chamber component and methods of depo...
- Patent number 11,932,938
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Lisa J. Enman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,898,236
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Zhiyong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer treatment for achieving defect-free self-assembled monolayers
- Patent number 11,735,420
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Chang Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatuses and methods of protecting nickel and nickel containing...
- Patent number 11,658,014
- Issue date May 23, 2023
- Applied Materials, Inc.
- Pingyan Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for enhancing selectivity in SAM-based selective deposition
- Patent number 11,515,155
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Chang Ke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support with edge seal
- Patent number 11,508,610
- Issue date Nov 22, 2022
- Applied Materials, Inc.
- Chang Ke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for particle removal from wafers through plasma modification...
- Patent number 11,473,189
- Issue date Oct 18, 2022
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition (PVD) chamber with in situ chamber cleani...
- Patent number 11,289,312
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Adolph M. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for cryogenic gas stream assisted SAM-based s...
- Patent number 11,033,930
- Issue date Jun 15, 2021
- Applied Materials, Inc.
- Chang Ke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for enhancing selectivity in SAM-based selective deposition
- Patent number 10,950,433
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Chang Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced selective deposition process
- Patent number 10,892,161
- Issue date Jan 12, 2021
- Applied Materials, Inc.
- Biao Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Wafer treatment for achieving defect-free self-assembled monolayers
- Patent number 10,770,292
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Chang Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition defects removal by chemical etch
- Patent number 10,643,840
- Issue date May 5, 2020
- Applied Materials, Inc.
- Jeffrey W. Anthis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-low-power injection locked oscillator for IQ clock generation
- Patent number 10,536,151
- Issue date Jan 14, 2020
- Xilinx, Inc.
- Lei Zhou
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Oxidized showerhead and process kit parts and methods of using same
- Patent number 9,914,999
- Issue date Mar 13, 2018
- Applied Materials, Inc.
- Muhammad M. Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Asynchronous clock generation for time-interleaved successive appro...
- Patent number 9,584,144
- Issue date Feb 28, 2017
- Xilinx, Inc.
- Lei Zhou
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Analog-to-digital converter circuit and method of implementing an a...
- Patent number 9,490,832
- Issue date Nov 8, 2016
- Xilinx, Inc.
- Lei Zhou
- H03 - BASIC ELECTRONIC CIRCUITRY

Patents Applicationslast 30 patents

Information Patent Application
CORROSION RESISTANT FILM ON A CHAMBER COMPONENT AND METHODS OF DEPO...
- Publication number 20240003003
- Publication date Jan 4, 2024
- Applied Materials, Inc.
- Lisa J. Enman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20230377892
- Publication date Nov 23, 2023
- Yiyang WAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF PREVENTING METAL CONTAMINATION BY CERAMIC HEATER
- Publication number 20230313378
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Yongjing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20230122956
- Publication date Apr 20, 2023
- Zhiyong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHUTTER DISK FOR PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER
- Publication number 20230073011
- Publication date Mar 9, 2023
- Zhiyong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PARTICLE REMOVAL FROM WAFERS THROUGH PLASMA MODIFICATION...
- Publication number 20230002885
- Publication date Jan 5, 2023
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUSES AND METHODS OF PROTECTING NICKEL AND NICKEL CONTAINING...
- Publication number 20210319983
- Publication date Oct 14, 2021
- Applied Materials, Inc.
- Pingyan LEI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and Apparatus for Cryogenic Gas Stream Assisted SAM-based S...
- Publication number 20210283650
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Chang Ke
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Methods For Enhancing Selectivity In Sam-Based Selective Deposition
- Publication number 20210217615
- Publication date Jul 15, 2021
- Applied Materials, Inc.
- Chang Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CORROSION RESISTANT FILM ON A CHAMBER COMPONENT AND METHODS OF DEPO...
- Publication number 20210032745
- Publication date Feb 4, 2021
- Applied Materials, Inc.
- Lisa J. Enman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER TREATMENT FOR ACHIEVING DEFECT-FREE SELF-ASSEMBLED MONOLAYERS
- Publication number 20200402792
- Publication date Dec 24, 2020
- Applied Materials, Inc.
- Chang Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER WITH IN SITU CHAMBER CLEANI...
- Publication number 20200395198
- Publication date Dec 17, 2020
- Applied Materials, Inc.
- ADOLPH M. ALLEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method For Particle Removal From Wafers Through Plasma Modification...
- Publication number 20200255938
- Publication date Aug 13, 2020
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ARCING TEST VEHICLE AND METHOD OF USE THEREOF
- Publication number 20200105626
- Publication date Apr 2, 2020
- Applied Materials, Inc.
- MINGDONG LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH EDGE SEAL
- Publication number 20190326152
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- CHANG KE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods And Apparatus For Cryogenic Gas Stream Assisted SAM-Based S...
- Publication number 20190210061
- Publication date Jul 11, 2019
- Applied Materials, Inc.
- Chang Ke
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Methods for Enhancing Selectivity in SAM-Based Selective Deposition
- Publication number 20190157079
- Publication date May 23, 2019
- Applied Materials, Inc.
- Chang Ke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED SELECTIVE DEPOSITION PROCESS
- Publication number 20190148144
- Publication date May 16, 2019
- Applied Materials, Inc.
- Biao LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Deposition Defects Removal By Chemical Etch
- Publication number 20190080904
- Publication date Mar 14, 2019
- Applied Materials, Inc.
- Jeffrey W. Anthis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Treatment For Achieving Defect-Free Self-Assembled Monolayers
- Publication number 20180366317
- Publication date Dec 20, 2018
- Applied Materials, Inc.
- Chang Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDIZED SHOWERHEAD AND PROCESS KIT PARTS AND METHODS OF USING SAME
- Publication number 20160319428
- Publication date Nov 3, 2016
- Applied Materials, Inc.
- Muhammad M. RASHEED
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Method for particle removal from wafers through plasma modification...

Corrosion resistant film on a chamber component and methods of depo...

Methods and apparatus for processing a substrate

Wafer treatment for achieving defect-free self-assembled monolayers

Apparatuses and methods of protecting nickel and nickel containing...

Methods for enhancing selectivity in SAM-based selective deposition

Substrate support with edge seal

Method for particle removal from wafers through plasma modification...

Physical vapor deposition (PVD) chamber with in situ chamber cleani...

Methods and apparatus for cryogenic gas stream assisted SAM-based s...

Methods for enhancing selectivity in SAM-based selective deposition

Enhanced selective deposition process

Wafer treatment for achieving defect-free self-assembled monolayers

Selective deposition defects removal by chemical etch

Ultra-low-power injection locked oscillator for IQ clock generation

Oxidized showerhead and process kit parts and methods of using same

Asynchronous clock generation for time-interleaved successive appro...

Analog-to-digital converter circuit and method of implementing an a...

Patents Applicationslast 30 patents

CORROSION RESISTANT FILM ON A CHAMBER COMPONENT AND METHODS OF DEPO...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS OF PREVENTING METAL CONTAMINATION BY CERAMIC HEATER

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

SHUTTER DISK FOR PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER

METHOD FOR PARTICLE REMOVAL FROM WAFERS THROUGH PLASMA MODIFICATION...

APPARATUSES AND METHODS OF PROTECTING NICKEL AND NICKEL CONTAINING...

Methods and Apparatus for Cryogenic Gas Stream Assisted SAM-based S...

Methods For Enhancing Selectivity In Sam-Based Selective Deposition

CORROSION RESISTANT FILM ON A CHAMBER COMPONENT AND METHODS OF DEPO...

WAFER TREATMENT FOR ACHIEVING DEFECT-FREE SELF-ASSEMBLED MONOLAYERS

PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER WITH IN SITU CHAMBER CLEANI...

Method For Particle Removal From Wafers Through Plasma Modification...

ARCING TEST VEHICLE AND METHOD OF USE THEREOF

SUBSTRATE SUPPORT WITH EDGE SEAL

Methods And Apparatus For Cryogenic Gas Stream Assisted SAM-Based S...

Methods for Enhancing Selectivity in SAM-Based Selective Deposition

ENHANCED SELECTIVE DEPOSITION PROCESS

Selective Deposition Defects Removal By Chemical Etch

Wafer Treatment For Achieving Defect-Free Self-Assembled Monolayers

OXIDIZED SHOWERHEAD AND PROCESS KIT PARTS AND METHODS OF USING SAME