Leo Hsu

Person

Hsinchu City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Forming a protective layer to prevent formation of leakage paths
- Patent number 12,057,350
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Leo Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shared contact structure and methods for forming the same
- Patent number 11,476,159
- Issue date Oct 18, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Leo Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming a protective layer to prevent formation of leakage paths
- Patent number 11,081,397
- Issue date Aug 3, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Leo Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shared contact structure and methods for forming the same
- Patent number 10,755,978
- Issue date Aug 25, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Leo Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shared contact structure and methods for forming the same
- Patent number 10,510,600
- Issue date Dec 17, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Leo Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming a protective layer to prevent formation of leakage paths
- Patent number 10,446,449
- Issue date Oct 15, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Leo Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming a protective layer to prevent formation of leakage paths
- Patent number 10,008,416
- Issue date Jun 26, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Leo Hsu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Shared Contact Structure and Methods for Forming the Same
- Publication number 20230069302
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Leo Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Forming a Protective Layer to Prevent Formation of Leakage Paths
- Publication number 20210358813
- Publication date Nov 18, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Leo Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shared Contact Structure and Methods for Forming the Same
- Publication number 20200381298
- Publication date Dec 3, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Leo Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shared Contact Structure and Methods for Forming the Same
- Publication number 20200090999
- Publication date Mar 19, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Leo Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Forming a Protective Layer to Prevent Formation of Leakage Paths
- Publication number 20200043800
- Publication date Feb 6, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Leo Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Forming a Protective Layer to Prevent Formation of Leakage Paths
- Publication number 20180308760
- Publication date Oct 25, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Leo Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING A PROTECTIVE LAYER TO PREVENT FORMATION OF LEAKAGE PATHS
- Publication number 20180151445
- Publication date May 31, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Leo Hsu
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Forming a protective layer to prevent formation of leakage paths

Shared contact structure and methods for forming the same

Forming a protective layer to prevent formation of leakage paths

Shared contact structure and methods for forming the same

Shared contact structure and methods for forming the same

Forming a protective layer to prevent formation of leakage paths

Forming a protective layer to prevent formation of leakage paths

Patents Applicationslast 30 patents

Shared Contact Structure and Methods for Forming the Same

Forming a Protective Layer to Prevent Formation of Leakage Paths

Shared Contact Structure and Methods for Forming the Same

Shared Contact Structure and Methods for Forming the Same

Forming a Protective Layer to Prevent Formation of Leakage Paths

Forming a Protective Layer to Prevent Formation of Leakage Paths

FORMING A PROTECTIVE LAYER TO PREVENT FORMATION OF LEAKAGE PATHS