Leon Paul VAN DIJK

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method for adjusting a target feature in a model of a patterning pr...
- Patent number 12,189,308
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adjusting a target feature in a model of a patterning pr...
- Patent number 11,619,884
- Issue date Apr 4, 2023
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining an optimal operational parameter setting of a metrology...
- Patent number 11,320,750
- Issue date May 3, 2022
- ASML Netherlands B.V.
- Leon Paul Van Dijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to change an etch parameter
- Patent number 11,300,887
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining stress in a substrate, control system for co...
- Patent number 11,300,888
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus
- Patent number 11,300,889
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Leon Paul Van Dijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark positioning in a lithographic process
- Patent number 11,294,294
- Issue date Apr 5, 2022
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for use in a device manufacturing method
- Patent number 11,226,567
- Issue date Jan 18, 2022
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus and overlay improvement by modifying a patterning device
- Patent number 11,126,093
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining an optimal operational parameter setting of a metrology...
- Patent number 10,788,761
- Issue date Sep 29, 2020
- ASML Netherlands B.V.
- Leon Paul Van Dijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and associated...
- Patent number 10,545,410
- Issue date Jan 28, 2020
- ASML Netherlands B.V.
- Hakki Ergun Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,474,045
- Issue date Nov 12, 2019
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND COMPUTER PROGRAMS FOR DATA MAPPING FOR LOW DIMENSIONAL...
- Publication number 20240369943
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Kedir Mohammed ADAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...
- Publication number 20230244151
- Publication date Aug 3, 2023
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR PROPERTY JOINT INTERPOLATION AND PREDICTION
- Publication number 20220083834
- Publication date Mar 17, 2022
- ASML NETHERLANDS B.V.
- Faegheh HASIBI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...
- Publication number 20220050387
- Publication date Feb 17, 2022
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY APPARATUS
- Publication number 20210165335
- Publication date Jun 3, 2021
- ASML NETHERLANDS B.V.
- Leon Paul VAN DIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT MARK POSITIONING IN A LITHOGRAPHIC PROCESS
- Publication number 20210048758
- Publication date Feb 18, 2021
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING AN OPTIMAL OPERATIONAL PARAMETER SETTING OF A METROLOGY...
- Publication number 20210018852
- Publication date Jan 21, 2021
- ASML NETHERLANDS B.V.
- Leon Paul VAN DIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FOCUS AND OVERLAY IMPROVEMENT BY MODIFYING A PATTERNING DEVICE
- Publication number 20200310242
- Publication date Oct 1, 2020
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR USE IN A DEVICE MANUFACTURING METHOD
- Publication number 20200218169
- Publication date Jul 9, 2020
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING STRESS IN A SUBSTRATE, CONTROL SYSTEM FOR CO...
- Publication number 20200050117
- Publication date Feb 13, 2020
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING PELLICLE COMPENSATION CORRECTIONS FOR A LITHO...
- Publication number 20190294059
- Publication date Sep 26, 2019
- ASML NETHERLANDS B.V.
- Leon Paul VAN DIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD TO CHANGE AN ETCH PARAMETER
- Publication number 20190285992
- Publication date Sep 19, 2019
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING AN OPTIMAL OPERATIONAL PARAMETER SETTING OF A METROLOGY...
- Publication number 20190250523
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Leon Paul VAN DIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED...
- Publication number 20190079411
- Publication date Mar 14, 2019
- ASML NETHERLANDS B.V.
- Hakki Ergun CEKLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...
- Publication number 20190041758
- Publication date Feb 7, 2019
- ASML NETHERLANDS B.V.
- Leon Paul VAN DIJK
- G01 - MEASURING TESTING

Leon Paul VAN DIJK

Person

Patents Grantslast 30 patents

Method for adjusting a target feature in a model of a patterning pr...

Method for adjusting a target feature in a model of a patterning pr...

Determining an optimal operational parameter setting of a metrology...

Method to change an etch parameter

Methods of determining stress in a substrate, control system for co...

Metrology apparatus

Alignment mark positioning in a lithographic process

Methods and apparatus for use in a device manufacturing method

Focus and overlay improvement by modifying a patterning device

Determining an optimal operational parameter setting of a metrology...

Lithographic apparatus, device manufacturing method and associated...

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

METHODS AND COMPUTER PROGRAMS FOR DATA MAPPING FOR LOW DIMENSIONAL...

METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...

APPARATUS AND METHOD FOR PROPERTY JOINT INTERPOLATION AND PREDICTION

METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...

METROLOGY APPARATUS

ALIGNMENT MARK POSITIONING IN A LITHOGRAPHIC PROCESS

DETERMINING AN OPTIMAL OPERATIONAL PARAMETER SETTING OF A METROLOGY...

FOCUS AND OVERLAY IMPROVEMENT BY MODIFYING A PATTERNING DEVICE

METHODS AND APPARATUS FOR USE IN A DEVICE MANUFACTURING METHOD

METHODS OF DETERMINING STRESS IN A SUBSTRATE, CONTROL SYSTEM FOR CO...

METHOD OF DETERMINING PELLICLE COMPENSATION CORRECTIONS FOR A LITHO...

A METHOD TO CHANGE AN ETCH PARAMETER

DETERMINING AN OPTIMAL OPERATIONAL PARAMETER SETTING OF A METROLOGY...

LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED...

METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...