Leonard TEDESCHI

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Capacitive sensor housing for chamber condition monitoring
- Patent number 12,163,911
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Yaoling Pan
- G01 - MEASURING TESTING
Information Patent Grant
Differential capacitive sensor for in-situ film thickness and diele...
- Patent number 12,123,090
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Patrick Tae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chambers and coatings for reducing backside damage
- Patent number 12,094,716
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Leonard M. Tedeschi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sensors and system for in-situ edge ring erosion monitor
- Patent number 12,009,236
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Differential capacitive sensors for in-situ film thickness and diel...
- Patent number 11,781,214
- Issue date Oct 10, 2023
- Applied Materials, Inc.
- Patrick Tae
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process monitor device having a plurality of sensors arranged in co...
- Patent number 11,735,486
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Leonard Tedeschi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Autonomous substrate processing system
- Patent number 11,709,477
- Issue date Jul 25, 2023
- Applied Materials, Inc.
- Priyadarshi Panda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Capacitive sensor for chamber condition monitoring
- Patent number 11,581,206
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resonant process monitor
- Patent number 11,551,905
- Issue date Jan 10, 2023
- Intel Corporation
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive sensing data integration for plasma chamber condition mo...
- Patent number 11,545,346
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive sensor housing for chamber condition monitoring
- Patent number 11,415,538
- Issue date Aug 16, 2022
- Applied Materials, Inc.
- Yaoling Pan
- G01 - MEASURING TESTING
Information Patent Grant
Wafer processing tool having a micro sensor
- Patent number 11,348,846
- Issue date May 31, 2022
- Applied Materials, Inc.
- Leonard Tedeschi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer based corrosion and time dependent chemical effects
- Patent number 11,088,000
- Issue date Aug 10, 2021
- Applied Materials, Inc.
- Leonard Tedeschi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing equipment having capacitive micro sensors
- Patent number 10,923,405
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Leonard Tedeschi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing tool having a micro sensor
- Patent number 10,818,564
- Issue date Oct 27, 2020
- Applied Materials, Inc.
- Leonard Tedeschi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process monitor device having a plurality of sensors arranged in co...
- Patent number 10,818,561
- Issue date Oct 27, 2020
- Applied Materials, Inc.
- Leonard Tedeschi
- G01 - MEASURING TESTING
Information Patent Grant
Particle monitoring device
- Patent number 10,718,719
- Issue date Jul 21, 2020
- Applied Materials, Inc.
- Leonard Tedeschi
- G01 - MEASURING TESTING
Information Patent Grant
Wafer based corrosion and time dependent chemical effects
- Patent number 10,515,862
- Issue date Dec 24, 2019
- Applied Materials, Inc.
- Leonard Tedeschi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing equipment having capacitive micro sensors
- Patent number 10,083,883
- Issue date Sep 25, 2018
- Applied Materials, Inc.
- Leonard Tedeschi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle monitoring device
- Patent number 10,067,070
- Issue date Sep 4, 2018
- Applied Materials, Inc.
- Leonard Tedeschi
- G01 - MEASURING TESTING
Information Patent Grant
Wafer processing equipment having exposable sensing layers
- Patent number 9,975,758
- Issue date May 22, 2018
- Applied Materials, Inc.
- Leonard Tedeschi
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Wafer processing equipment having exposable sensing layers
- Patent number 9,725,302
- Issue date Aug 8, 2017
- Applied Materials, Inc.
- Leonard Tedeschi
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR
- Publication number 20240321610
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Yaoling PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENTIAL CAPACITIVE SENSOR FOR IN-SITU FILM THICKNESS AND DIELE...
- Publication number 20240002999
- Publication date Jan 4, 2024
- Applied Materials, Inc.
- PATRICK TAE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CAPACITIVE SENSING DATA INTEGRATION FOR PLASMA CHAMBER CONDITION MO...
- Publication number 20230343568
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Yaoling Pan
- G01 - MEASURING TESTING
Information Patent Application
AUTONOMOUS SUBSTRATE PROCESSING SYSTEM
- Publication number 20230305531
- Publication date Sep 28, 2023
- Applied Materials, Inc.
- Priyadarshi Panda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CAPACITIVE SENSING DATA INTEGRATION FOR PLASMA CHAMBER CONDITION MO...
- Publication number 20230103165
- Publication date Mar 30, 2023
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBERS AND COATINGS FOR REDUCING BACKSIDE DAMAGE
- Publication number 20230077578
- Publication date Mar 16, 2023
- Applied Materials, Inc.
- Leonard M. Tedeschi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVE SENSOR HOUSING FOR CHAMBER CONDITION MONITORING
- Publication number 20220341867
- Publication date Oct 27, 2022
- Applied Materials, Inc.
- Yaoling Pan
- G01 - MEASURING TESTING
Information Patent Application
AUTONOMOUS SUBSTRATE PROCESSING SYSTEM
- Publication number 20220214662
- Publication date Jul 7, 2022
- Applied Materials, Inc.
- Priyadarshi Panda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ETCH FEEDBACK FOR CONTROL OF UPSTREAM PROCESS
- Publication number 20220165541
- Publication date May 26, 2022
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FEEDFORWARD CONTROL OF MULTI-LAYER STACKS DURING DEVICE FABRICATION
- Publication number 20220165593
- Publication date May 26, 2022
- Applied Materials, Inc.
- Priyadarshi Panda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CAPACITIVE SENSING DATA INTEGRATION FOR PLASMA CHAMBER CONDITION MO...
- Publication number 20210280400
- Publication date Sep 9, 2021
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVE SENSOR HOUSING FOR CHAMBER CONDITION MONITORING
- Publication number 20210278360
- Publication date Sep 9, 2021
- Applied Materials, Inc.
- Yaoling Pan
- G01 - MEASURING TESTING
Information Patent Application
CAPACITIVE SENSOR FOR CHAMBER CONDITION MONITORING
- Publication number 20210280443
- Publication date Sep 9, 2021
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVE SENSORS AND CAPACITIVE SENSING LOCATIONS FOR PLASMA CHAM...
- Publication number 20210280399
- Publication date Sep 9, 2021
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENTIAL CAPACITIVE SENSORS FOR IN-SITU FILM THICKNESS AND DIEL...
- Publication number 20210033557
- Publication date Feb 4, 2021
- Applied Materials, Inc.
- PATRICK TAE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER PROCESSING TOOL HAVING A MICRO SENSOR
- Publication number 20210005521
- Publication date Jan 7, 2021
- Applied Materials, Inc.
- Leonard Tedeschi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS MONITOR DEVICE HAVING A PLURALITY OF SENSORS ARRANGED IN CO...
- Publication number 20210005518
- Publication date Jan 7, 2021
- Applied Materials, Inc.
- Leonard TEDESCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR
- Publication number 20200335368
- Publication date Oct 22, 2020
- Applied Materials, Inc.
- Yaoling PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER BASED CORROSION & TIME DEPENDENT CHEMICAL EFFECTS
- Publication number 20200118896
- Publication date Apr 16, 2020
- Applied Materials, Inc.
- Leonard Tedeschi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESONANT PROCESS MONITOR
- Publication number 20190287758
- Publication date Sep 19, 2019
- Yaoling PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING EQUIPMENT HAVING CAPACITIVE MICRO SENSORS
- Publication number 20180374764
- Publication date Dec 27, 2018
- Applied Materials, Inc.
- Leonard Tedeschi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE MONITORING DEVICE
- Publication number 20180335393
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- Leonard TEDESCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER BASED CORROSION & TIME DEPENDENT CHEMICAL EFFECTS
- Publication number 20180294200
- Publication date Oct 11, 2018
- Applied Materials, Inc.
- Leonard TEDESCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING EQUIPMENT HAVING EXPOSABLE SENSING LAYERS
- Publication number 20180057356
- Publication date Mar 1, 2018
- Applied Materials, Inc.
- Leonard Tedeschi
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
WAFER PROCESSING EQUIPMENT HAVING CAPACITIVE MICRO SENSORS
- Publication number 20170365531
- Publication date Dec 21, 2017
- Applied Materials, Inc.
- Leonard Tedeschi
- G01 - MEASURING TESTING
Information Patent Application
WAFER PROCESSING TOOL HAVING A MICRO SENSOR
- Publication number 20170263511
- Publication date Sep 14, 2017
- Leonard TEDESCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL TIME PROCESS CHARACTERIZATION
- Publication number 20170221775
- Publication date Aug 3, 2017
- Leonard Tedeschi
- G01 - MEASURING TESTING
Information Patent Application
SELF-AWARE PRODUCTION WAFERS
- Publication number 20170221783
- Publication date Aug 3, 2017
- Leonard TEDESCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE MONITORING DEVICE
- Publication number 20170131217
- Publication date May 11, 2017
- Leonard TEDESCHI
- G01 - MEASURING TESTING
Information Patent Application
PATTERN FORMATION AND TRANSFER DIRECTLY ON SILICON BASED FILMS
- Publication number 20150132959
- Publication date May 14, 2015
- Leonard TEDESCHI
- H01 - BASIC ELECTRIC ELEMENTS

Leonard TEDESCHI

Person

Patents Grantslast 30 patents

Capacitive sensor housing for chamber condition monitoring

Differential capacitive sensor for in-situ film thickness and diele...

Chambers and coatings for reducing backside damage

Sensors and system for in-situ edge ring erosion monitor

Differential capacitive sensors for in-situ film thickness and diel...

Process monitor device having a plurality of sensors arranged in co...

Autonomous substrate processing system

Capacitive sensor for chamber condition monitoring

Resonant process monitor

Capacitive sensing data integration for plasma chamber condition mo...

Capacitive sensor housing for chamber condition monitoring

Wafer processing tool having a micro sensor

Wafer based corrosion and time dependent chemical effects

Wafer processing equipment having capacitive micro sensors

Wafer processing tool having a micro sensor

Process monitor device having a plurality of sensors arranged in co...

Particle monitoring device

Wafer based corrosion and time dependent chemical effects

Wafer processing equipment having capacitive micro sensors

Particle monitoring device

Wafer processing equipment having exposable sensing layers

Wafer processing equipment having exposable sensing layers

Patents Applicationslast 30 patents

SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR

DIFFERENTIAL CAPACITIVE SENSOR FOR IN-SITU FILM THICKNESS AND DIELE...

CAPACITIVE SENSING DATA INTEGRATION FOR PLASMA CHAMBER CONDITION MO...

AUTONOMOUS SUBSTRATE PROCESSING SYSTEM

CAPACITIVE SENSING DATA INTEGRATION FOR PLASMA CHAMBER CONDITION MO...

CHAMBERS AND COATINGS FOR REDUCING BACKSIDE DAMAGE

CAPACITIVE SENSOR HOUSING FOR CHAMBER CONDITION MONITORING

AUTONOMOUS SUBSTRATE PROCESSING SYSTEM

ETCH FEEDBACK FOR CONTROL OF UPSTREAM PROCESS

FEEDFORWARD CONTROL OF MULTI-LAYER STACKS DURING DEVICE FABRICATION

CAPACITIVE SENSING DATA INTEGRATION FOR PLASMA CHAMBER CONDITION MO...

CAPACITIVE SENSOR HOUSING FOR CHAMBER CONDITION MONITORING

CAPACITIVE SENSOR FOR CHAMBER CONDITION MONITORING

CAPACITIVE SENSORS AND CAPACITIVE SENSING LOCATIONS FOR PLASMA CHAM...

DIFFERENTIAL CAPACITIVE SENSORS FOR IN-SITU FILM THICKNESS AND DIEL...

WAFER PROCESSING TOOL HAVING A MICRO SENSOR

PROCESS MONITOR DEVICE HAVING A PLURALITY OF SENSORS ARRANGED IN CO...

SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR

WAFER BASED CORROSION & TIME DEPENDENT CHEMICAL EFFECTS

RESONANT PROCESS MONITOR

WAFER PROCESSING EQUIPMENT HAVING CAPACITIVE MICRO SENSORS

PARTICLE MONITORING DEVICE

WAFER BASED CORROSION & TIME DEPENDENT CHEMICAL EFFECTS

WAFER PROCESSING EQUIPMENT HAVING EXPOSABLE SENSING LAYERS

WAFER PROCESSING EQUIPMENT HAVING CAPACITIVE MICRO SENSORS

WAFER PROCESSING TOOL HAVING A MICRO SENSOR

REAL TIME PROCESS CHARACTERIZATION

SELF-AWARE PRODUCTION WAFERS

PARTICLE MONITORING DEVICE

PATTERN FORMATION AND TRANSFER DIRECTLY ON SILICON BASED FILMS