Leonid Aizikovitch Sjmaenok

Person

Jos Francotteweg, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Metal-silicide-nitridation for stress reduction
- Patent number 11,971,654
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Pieter-Jan Van Zwol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal-silicide-nitridation for stress reduction
- Patent number 11,686,997
- Issue date Jun 27, 2023
- ASML Netherlands B.V.
- Pieter-Jan Van Zwol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal-silicide-nitridation for stress reduction
- Patent number 11,287,737
- Issue date Mar 29, 2022
- ASML Netherlands B.V.
- Pieter-Jan Van Zwol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element comprising oriented carbon nanotube sheet and litho...
- Patent number 9,897,930
- Issue date Feb 20, 2018
- ASML Netherlands B.V.
- Leonid Aizikovitch Sjmaenok
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source, lithographic apparatus, and device manufacturing...
- Patent number 9,529,283
- Issue date Dec 27, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multilayer mirror, method of producing a multilayer mirror and lith...
- Patent number 9,448,492
- Issue date Sep 20, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mirror, lithographic apparatus and device manufacturing method
- Patent number 9,285,690
- Issue date Mar 15, 2016
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV multilayer mirror with interlayer and lithographic apparatus us...
- Patent number 9,082,521
- Issue date Jul 14, 2015
- ASML Netherlands B.V.
- Denis Alexandrovich Glushkov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus, contaminant trap, and device manufacturing...
- Patent number 7,612,353
- Issue date Nov 3, 2009
- ASML Netherlands B.V.
- Leonid Aizikovitch Sjmaenok
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus, contaminant trap, and device manufacturing...
- Patent number 7,397,056
- Issue date Jul 8, 2008
- ASML Netherlands B.V.
- Leonid Aizikovitch Sjmaenok
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION
- Publication number 20240302734
- Publication date Sep 12, 2024
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION
- Publication number 20230324786
- Publication date Oct 12, 2023
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION
- Publication number 20220187701
- Publication date Jun 16, 2022
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION
- Publication number 20210181618
- Publication date Jun 17, 2021
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER MIRROR, METHOD OF PRODUCING A MULTILAYER MIRROR AND LITH...
- Publication number 20140198306
- Publication date Jul 17, 2014
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS
- Publication number 20110292366
- Publication date Dec 1, 2011
- ASML Netherlands B.V.
- Denis Alexandrovich Glushkov
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATU...
- Publication number 20110249243
- Publication date Oct 13, 2011
- ASML NETHERLANDS B.V.
- Leonid Aizikovitch Sjmaenok
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mirror, Lithographic Apparatus and Device Manufacturing Method
- Publication number 20110228243
- Publication date Sep 22, 2011
- Vadim Yevgenyevich Banine
- B82 - NANO-TECHNOLOGY
Information Patent Application
RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING...
- Publication number 20110143269
- Publication date Jun 16, 2011
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- G02 - OPTICS
Information Patent Application
MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS
- Publication number 20110080573
- Publication date Apr 7, 2011
- ASML NETHERLANDS B.V.
- Denis Alexandrovich Glushkov
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic apparatus, contaminant trap, and device manufacturing...
- Publication number 20070023706
- Publication date Feb 1, 2007
- ASML NETHERLANDS B.V.
- Leonid Aizikovitch Sjmaenok
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic apparatus, contaminant trap, and device manufacturing...
- Publication number 20070018118
- Publication date Jan 25, 2007
- ASML NETHERLANDS B.V.
- Leonid Aizikovitch Sjmaenok
- B82 - NANO-TECHNOLOGY

Leonid Aizikovitch Sjmaenok

Person

Patents Grantslast 30 patents

Metal-silicide-nitridation for stress reduction

Metal-silicide-nitridation for stress reduction

Metal-silicide-nitridation for stress reduction

Optical element comprising oriented carbon nanotube sheet and litho...

Radiation source, lithographic apparatus, and device manufacturing...

Multilayer mirror, method of producing a multilayer mirror and lith...

Mirror, lithographic apparatus and device manufacturing method

EUV multilayer mirror with interlayer and lithographic apparatus us...

Lithographic apparatus, contaminant trap, and device manufacturing...

Lithographic apparatus, contaminant trap, and device manufacturing...

Patents Applicationslast 30 patents

METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION

METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION

METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION

METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION

MULTILAYER MIRROR, METHOD OF PRODUCING A MULTILAYER MIRROR AND LITH...

MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS

OPTICAL ELEMENT FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATU...

Mirror, Lithographic Apparatus and Device Manufacturing Method

RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING...

MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS

Lithographic apparatus, contaminant trap, and device manufacturing...

Lithographic apparatus, contaminant trap, and device manufacturing...