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Leung Ying Keung
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Hong Kong, HK
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last 30 patents
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Patent Grant
Method to form elevated source/drain using poly spacer
Patent number
6,566,208
Issue date
May 20, 2003
Chartered Semiconductor Manufacturing Ltd.
Yang Pan
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
Method to form elevated source/drain using poly spacer
Publication number
20030022450
Publication date
Jan 30, 2003
Chartered Semiconductor Manufacturing Ltd.
Yang Pan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method to improve latchup by forming selective sloped staircase STI...
Publication number
20030017710
Publication date
Jan 23, 2003
Chartered Semiconductor Manufacturing Ltd.
Pan Yang
H01 - BASIC ELECTRIC ELEMENTS