Lev Ryzhikov

Person

Norwalk, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Invariable magnification multilevel optical device with telecentric...
- Patent number 11,960,216
- Issue date Apr 16, 2024
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic patterning device multichannel position and level gauge
- Patent number 11,754,935
- Issue date Sep 12, 2023
- ASML Holding N.V.
- Yuli Vladimirsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High numerical aperture objective lens system
- Patent number 9,671,337
- Issue date Jun 6, 2017
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High numerical aperture objective lens system
- Patent number 9,513,559
- Issue date Dec 6, 2016
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system, inspection system and manufacturing method
- Patent number 9,411,244
- Issue date Aug 9, 2016
- ASML Holding N.V.
- Lev Ryzhikov
- G01 - MEASURING TESTING
Information Patent Grant
Inspection apparatus, lithographic apparatus, and device manufactur...
- Patent number 9,285,687
- Issue date Mar 15, 2016
- ASML Holding N.V.
- Stanislav Y Smirnov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system, inspection system and manufacturing method
- Patent number 8,692,977
- Issue date Apr 8, 2014
- ASML Holding N.V.
- Lev Ryzhikov
- G01 - MEASURING TESTING
Information Patent Grant
Thin film continuous spatially modulated grey attenuators and filters
- Patent number 8,558,988
- Issue date Oct 15, 2013
- ASML Holding N.V.
- Yuli Vladimirsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system coherence remover with two sets of stepped mirrors
- Patent number 8,164,740
- Issue date Apr 24, 2012
- ASML Holding N.V.
- Huibert Visser
- G02 - OPTICS
Information Patent Grant
Illumination system coherence remover with a series of partially re...
- Patent number 8,159,651
- Issue date Apr 17, 2012
- ASML Holding N.V.
- Huibert Visser
- G02 - OPTICS
Information Patent Grant
Illumination system with low telecentricity error and dynamic telec...
- Patent number 8,013,979
- Issue date Sep 6, 2011
- ASML Holding N.V.
- Lev Ryzhikov
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,859,647
- Issue date Dec 28, 2010
- ASML Holding N.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system for transforming numerical aperture
- Patent number 7,859,756
- Issue date Dec 28, 2010
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical integrators for lithography systems and methods
- Patent number 7,630,136
- Issue date Dec 8, 2009
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system for transforming numerical aperture
- Patent number 7,532,403
- Issue date May 12, 2009
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method using visible and infrared light to align and mea...
- Patent number 7,365,848
- Issue date Apr 29, 2008
- ASML Holding N.V.
- Pankaj Raval
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Relay lens used in an illumination system of a lithography system
- Patent number 7,289,277
- Issue date Oct 30, 2007
- ASML Holding N.V.
- Lev Ryzhikov
- G02 - OPTICS
Information Patent Grant
System and method utilizing a lithography tool having modular illum...
- Patent number 7,242,456
- Issue date Jul 10, 2007
- ASML Holdings N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus having double telecentric illumination
- Patent number 7,227,613
- Issue date Jun 5, 2007
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Advanced illumination system for use in microlithography
- Patent number 7,187,430
- Issue date Mar 6, 2007
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging apparatus
- Patent number 7,023,525
- Issue date Apr 4, 2006
- ASML Netherlands B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Advanced illumination system for use in microlithography
- Patent number 6,813,003
- Issue date Nov 2, 2004
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging apparatus
- Patent number 6,778,257
- Issue date Aug 17, 2004
- ASML Netherlands B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Advanced illumination system for use in microlithography
- Patent number 6,775,069
- Issue date Aug 10, 2004
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Zoom illumination system for use in photolithography
- Patent number 6,307,682
- Issue date Oct 23, 2001
- Silicon Valley Group, Inc.
- Jeffrey M. Hoffman
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
INVARIABLE MAGNIFICATION MULTILEVEL OPTICAL DEVICE WITH TELECENTRIC...
- Publication number 20240053688
- Publication date Feb 15, 2024
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PRE-ALIGNMENT IMAGING SENSOR WITH BUILD-IN COAXIAL ILL...
- Publication number 20230236519
- Publication date Jul 27, 2023
- ASML Holding N.V.
- Yuli Vladimirsky
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC PATTERNING DEVICE MULTICHANNEL POSITION AND LEVEL GAUGE
- Publication number 20220299893
- Publication date Sep 22, 2022
- ASML Holding N.V.
- Yuli Vladimirsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High Numerical Aperture Objective Lens System
- Publication number 20160356710
- Publication date Dec 8, 2016
- ASML Holding N.V.
- Lev RYZHIKOV
- G02 - OPTICS
Information Patent Application
High Numerical Aperture Objective Lens System
- Publication number 20160091797
- Publication date Mar 31, 2016
- Lev RYZHIKOV
- G02 - OPTICS
Information Patent Application
Compact Self-Contained Holographic and Interferometric Apparatus
- Publication number 20150085291
- Publication date Mar 26, 2015
- ASML Holding N.V.
- Yuli Vladimirsky
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL SYSTEM, INSPECTION SYSTEM AND MANUFACTURING METHOD
- Publication number 20140098356
- Publication date Apr 10, 2014
- ASML Holding N.V.
- Lev RYZHIKOV
- G02 - OPTICS
Information Patent Application
Inspection Apparatus, Lithographic Apparatus, and Device Manufactur...
- Publication number 20130083306
- Publication date Apr 4, 2013
- ASML Holding N.V.
- Stanislav Y. Smirnov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Surface Inspection System with Advanced Illumination
- Publication number 20120086800
- Publication date Apr 12, 2012
- ASML Holding N.V.
- Yuli VLADIMIRSKY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Inspection Apparatus Employing Wide Angle Objective Lens With Optic...
- Publication number 20110317136
- Publication date Dec 29, 2011
- ASML NETHERLANDS B.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, INSPECTION SYSTEM AND MANUFACTURING METHOD
- Publication number 20110279805
- Publication date Nov 17, 2011
- ASML Holding N.V.
- Lev Ryzhikov
- G02 - OPTICS
Information Patent Application
Inspection Apparatus, Lithographic Apparatus and Method for Sphero-...
- Publication number 20100079748
- Publication date Apr 1, 2010
- ASML Holding N.V.
- Lev RYZHIKOV
- G02 - OPTICS
Information Patent Application
Optical System for Transforming Numerical Aperture
- Publication number 20090251786
- Publication date Oct 8, 2009
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination System
- Publication number 20090168072
- Publication date Jul 2, 2009
- ASML Netherlands B.V. and ASML Holding N.V.
- Huibert VISSER
- G02 - OPTICS
Information Patent Application
Thin Film Continuous Spatially Modulated Grey Attenuators and Filters
- Publication number 20090122289
- Publication date May 14, 2009
- ASML Holding N.V.
- Yuli VLADIMIRSKY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination System
- Publication number 20090091734
- Publication date Apr 9, 2009
- ASML Netherlands B.V. and ASML Holding N.V.
- Huibert VISSER
- G02 - OPTICS
Information Patent Application
Illumination System with Low Telecentricity Error and Dynamic Telec...
- Publication number 20090046373
- Publication date Feb 19, 2009
- ASML Holding N.V.
- Lev Ryzhikov
- G02 - OPTICS
Information Patent Application
System and Method to Align and Measure Alignment Patterns on Multip...
- Publication number 20080198363
- Publication date Aug 21, 2008
- ASML Holding N.V.
- Pankaj Raval
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Device Manufacturing Method
- Publication number 20080137053
- Publication date Jun 12, 2008
- ASML NETHERLANDS B.V.
- Arno Jan BLEEKER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical integrators for lithography systems and methods
- Publication number 20080019008
- Publication date Jan 24, 2008
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination system
- Publication number 20070247606
- Publication date Oct 25, 2007
- ASML Holding N.V.
- Huibert Visser
- G02 - OPTICS
Information Patent Application
Optical system for transforming numerical aperture
- Publication number 20070183054
- Publication date Aug 9, 2007
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Reducing Disturbances Caused by Movement in a...
- Publication number 20070165200
- Publication date Jul 19, 2007
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Reducing Disturbances Caused by Movement in a...
- Publication number 20070165201
- Publication date Jul 19, 2007
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Advanced Illumination System for Use in Microlithography
- Publication number 20070146674
- Publication date Jun 28, 2007
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination system
- Publication number 20070127005
- Publication date Jun 7, 2007
- ASML Holding N.V.
- Huibert Visser
- G02 - OPTICS
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060138349
- Publication date Jun 29, 2006
- ASML NETHERLANDS B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for reducing disturbances caused by movement in a...
- Publication number 20060044533
- Publication date Mar 2, 2006
- ASMLHolding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method utilizing a lithography tool having modular illum...
- Publication number 20050264782
- Publication date Dec 1, 2005
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Advanced illumination system for use in microlithography
- Publication number 20040263821
- Publication date Dec 30, 2004
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Lev Ryzhikov

Person

Patents Grantslast 30 patents

Invariable magnification multilevel optical device with telecentric...

Lithographic patterning device multichannel position and level gauge

High numerical aperture objective lens system

High numerical aperture objective lens system

Optical system, inspection system and manufacturing method

Inspection apparatus, lithographic apparatus, and device manufactur...

Optical system, inspection system and manufacturing method

Thin film continuous spatially modulated grey attenuators and filters

Illumination system coherence remover with two sets of stepped mirrors

Illumination system coherence remover with a series of partially re...

Illumination system with low telecentricity error and dynamic telec...

Lithographic apparatus and device manufacturing method

Optical system for transforming numerical aperture

Optical integrators for lithography systems and methods

Optical system for transforming numerical aperture

System and method using visible and infrared light to align and mea...

Relay lens used in an illumination system of a lithography system

System and method utilizing a lithography tool having modular illum...

Lithographic apparatus having double telecentric illumination

Advanced illumination system for use in microlithography

Imaging apparatus

Advanced illumination system for use in microlithography

Imaging apparatus

Advanced illumination system for use in microlithography

Zoom illumination system for use in photolithography

Patents Applicationslast 30 patents

INVARIABLE MAGNIFICATION MULTILEVEL OPTICAL DEVICE WITH TELECENTRIC...

LITHOGRAPHIC PRE-ALIGNMENT IMAGING SENSOR WITH BUILD-IN COAXIAL ILL...

LITHOGRAPHIC PATTERNING DEVICE MULTICHANNEL POSITION AND LEVEL GAUGE

High Numerical Aperture Objective Lens System

High Numerical Aperture Objective Lens System

Compact Self-Contained Holographic and Interferometric Apparatus

OPTICAL SYSTEM, INSPECTION SYSTEM AND MANUFACTURING METHOD

Inspection Apparatus, Lithographic Apparatus, and Device Manufactur...

Surface Inspection System with Advanced Illumination

Inspection Apparatus Employing Wide Angle Objective Lens With Optic...

OPTICAL SYSTEM, INSPECTION SYSTEM AND MANUFACTURING METHOD

Inspection Apparatus, Lithographic Apparatus and Method for Sphero-...

Optical System for Transforming Numerical Aperture

Illumination System

Thin Film Continuous Spatially Modulated Grey Attenuators and Filters

Illumination System

Illumination System with Low Telecentricity Error and Dynamic Telec...

System and Method to Align and Measure Alignment Patterns on Multip...

Lithographic Apparatus and Device Manufacturing Method

Optical integrators for lithography systems and methods

Illumination system

Optical system for transforming numerical aperture

System and Method for Reducing Disturbances Caused by Movement in a...

System and Method for Reducing Disturbances Caused by Movement in a...

Advanced Illumination System for Use in Microlithography

Illumination system

Lithographic apparatus and device manufacturing method

System and method for reducing disturbances caused by movement in a...

System and method utilizing a lithography tool having modular illum...

Advanced illumination system for use in microlithography