Li Diao

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Fremont, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Method for high aspect ratio photoresist removal in pure reducing p...
- Patent number 11,107,693
- Issue date Aug 31, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Li Diao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for high aspect ratio photoresist removal in pure reducing p...
- Patent number 10,431,469
- Issue date Oct 1, 2019
- Mattson Technology, Inc.
- Li Diao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask removal process strategy for vertical NAND device
- Patent number 9,396,963
- Issue date Jul 19, 2016
- Mattson Technology
- Li Diao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced processing technique and system for preserving tungsten in...
- Patent number 8,093,157
- Issue date Jan 10, 2012
- Mattson Technology, Inc.
- Li Diao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method for High Aspect Ratio Photoresist Removal in Pure Reducing P...
- Publication number 20200098576
- Publication date Mar 26, 2020
- Mattson Technology, Inc.
- Li Diao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for High Aspect Ratio Photoresist Removal in Pure Reducing P...
- Publication number 20150144155
- Publication date May 28, 2015
- Mattson Technology, Inc.
- Li Diao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Novel Mask Removal Process Strategy for Vertical NAND Device
- Publication number 20150126035
- Publication date May 7, 2015
- Mattson Technology, Inc.
- Li Diao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced Processing Technique and System for Preserving Tungsten in...
- Publication number 20090011615
- Publication date Jan 8, 2009
- Li Diao
- H01 - BASIC ELECTRIC ELEMENTS