Li Wu

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Integrated semiconductor part cleaning system
- Patent number 12,327,738
- Issue date Jun 10, 2025
- Applied Materials, Inc.
- Jenn C. Chow
- B08 - CLEANING
Information Patent Grant
Semiconductor chamber component cleaning systems
- Patent number 11,848,218
- Issue date Dec 19, 2023
- Applied Materials, Inc.
- Katty Guyomard
- B08 - CLEANING
Information Patent Grant
System and method for chemical mechanical planarization
- Patent number 7,048,607
- Issue date May 23, 2006
- Applied Materials
- Li Wu
- B24 - GRINDING POLISHING
Information Patent Grant
Computer readable medium for controlling a method of cleaning a pro...
- Patent number 6,482,746
- Issue date Nov 19, 2002
- Applied Materials, Inc.
- Anand Vasudev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tungsten CMP with improved alignment mark integrity, reduced edge r...
- Patent number 6,468,136
- Issue date Oct 22, 2002
- Applied Materials, Inc.
- Robert T. Lum
- B24 - GRINDING POLISHING
Information Patent Grant
Method for in-situ, post deposition surface passivation of a chemic...
- Patent number 6,432,479
- Issue date Aug 13, 2002
- Applied Materials, Inc.
- Mei Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for cleaning a process chamber
- Patent number 6,242,347
- Issue date Jun 5, 2001
- Applied Materials, Inc.
- Anand Vasudev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of performing titanium/titanium nitride integration
- Patent number 6,221,174
- Issue date Apr 24, 2001
- Applied Materials, Inc.
- Fufa Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR CHAMBER COMPONENT CLEANING SYSTEMS
- Publication number 20220130692
- Publication date Apr 28, 2022
- Applied Materials, Inc.
- Katty Guyomard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED SEMICONDUCTOR PART CLEANING SYSTEM
- Publication number 20190341276
- Publication date Nov 7, 2019
- Applied Materials, Inc.
- Jenn C. CHOW
- B08 - CLEANING
Information Patent Application
Method for cleaning a process chamber
- Publication number 20010027030
- Publication date Oct 4, 2001
- APPLIED MATERIALS, INC.
- Anand Vasudev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IN-SITU, POST DEPOSITION SURFACE PASSIVATION OF A CHEMIC...
- Publication number 20010003015
- Publication date Jun 7, 2001
- MEI CHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Integrated semiconductor part cleaning system

Semiconductor chamber component cleaning systems

System and method for chemical mechanical planarization

Computer readable medium for controlling a method of cleaning a pro...

Tungsten CMP with improved alignment mark integrity, reduced edge r...

Method for in-situ, post deposition surface passivation of a chemic...

Method for cleaning a process chamber

Method of performing titanium/titanium nitride integration

Patents Applicationslast 30 patents

SEMICONDUCTOR CHAMBER COMPONENT CLEANING SYSTEMS

INTEGRATED SEMICONDUCTOR PART CLEANING SYSTEM

Method for cleaning a process chamber

METHOD FOR IN-SITU, POST DEPOSITION SURFACE PASSIVATION OF A CHEMIC...