Liequan Lee

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Bandgap measurements of patterned film stacks using spectroscopic m...
- Patent number 11,796,390
- Issue date Oct 24, 2023
- KLA Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Grant
Scatterometry modeling in the presence of undesired diffraction orders
- Patent number 11,422,095
- Issue date Aug 23, 2022
- KLA Corporation
- Phillip Atkins
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bandgap measurements of patterned film stacks using spectroscopic m...
- Patent number 11,378,451
- Issue date Jul 5, 2022
- KLA Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Grant
Automatic optimization of measurement accuracy through advanced mac...
- Patent number 11,380,594
- Issue date Jul 5, 2022
- KLA-Tencor Corporation
- Tianrong Zhan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement methodology of advanced nanostructures
- Patent number 11,156,548
- Issue date Oct 26, 2021
- KLA-Tencor Corporation
- Manh Nguyen
- G05 - CONTROLLING REGULATING
Information Patent Grant
Visualization of three-dimensional semiconductor structures
- Patent number 11,099,137
- Issue date Aug 24, 2021
- KLA Corporation
- Aaron J. Rosenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Visualization of three-dimensional semiconductor structures
- Patent number 10,794,839
- Issue date Oct 6, 2020
- KLA Corporation
- Aaron J. Rosenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Detection and measurement of dimensions of asymmetric structures
- Patent number 10,732,515
- Issue date Aug 4, 2020
- KLA-Tencor Corporation
- Phillip R. Atkins
- G01 - MEASURING TESTING
Information Patent Grant
Adaptive numerical aperture control method and system
- Patent number 10,678,226
- Issue date Jun 9, 2020
- KLA-Tencor Corporation
- Qiang Wang
- G01 - MEASURING TESTING
Information Patent Grant
Library expansion system, method, and computer program product for...
- Patent number 10,648,793
- Issue date May 12, 2020
- KLA-Tencor Corporation
- Leonid Poslavsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System, method, and computer program product for automatically dete...
- Patent number 10,393,647
- Issue date Aug 27, 2019
- KLA-Tencor Corporation
- Qiang Jimmy Zhao
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system, method, and computer program product employing au...
- Patent number 10,190,868
- Issue date Jan 29, 2019
- KLA-Tencor Corporation
- Liequan Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-model metrology
- Patent number 9,412,673
- Issue date Aug 9, 2016
- KLA-Tencor Corporation
- In-Kyo Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...
- Publication number 20220349752
- Publication date Nov 3, 2022
- KLA Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Application
Visualization of Three-Dimensional Semiconductor Structures
- Publication number 20200393386
- Publication date Dec 17, 2020
- KLA Corporation
- Aaron J. Rosenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Visualization of Three-Dimensional Semiconductor Structures
- Publication number 20200271595
- Publication date Aug 27, 2020
- KLA-Tencor Corporation
- Aaron J. Rosenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Scatterometry Modeling in the Presence of Undesired Diffraction Orders
- Publication number 20200232909
- Publication date Jul 23, 2020
- KLA-Tencor Corporation
- Phillip Atkins
- G01 - MEASURING TESTING
Information Patent Application
Measurement Methodology of Advanced Nanostructures
- Publication number 20190178788
- Publication date Jun 13, 2019
- KLA-Tencor Corporation
- Manh Nguyen
- G05 - CONTROLLING REGULATING
Information Patent Application
AUTOMATIC OPTIMIZATION OF MEASUREMENT ACCURACY THROUGH ADVANCED MAC...
- Publication number 20190148246
- Publication date May 16, 2019
- KLA-Tencor Corporation
- Tianrong ZHAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Detection And Measurement Of Dimensions Of Asymmetric Structures
- Publication number 20190094711
- Publication date Mar 28, 2019
- KLA-Tencor Corporation
- Phillip R. Atkins
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...
- Publication number 20190041266
- Publication date Feb 7, 2019
- KLA-Tencor Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY SYSTEM, METHOD, AND COMPUTER PROGRAM PRODUCT EMPLOYING AU...
- Publication number 20160320315
- Publication date Nov 3, 2016
- KLA-Tencor Corporation
- Liequan Lee
- G01 - MEASURING TESTING
Information Patent Application
MULTI-MODEL METROLOGY
- Publication number 20160322267
- Publication date Nov 3, 2016
- KLA-Tencor Corporation
- In-Kyo Kim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LIBRARY EXPANSION SYSTEM, METHOD, AND COMPUTER PROGRAM PRODUCT FOR...
- Publication number 20150330770
- Publication date Nov 19, 2015
- KLA-Tencor Corporation
- Leonid Poslavsky
- G01 - MEASURING TESTING
Information Patent Application
MULTI-MODEL METROLOGY
- Publication number 20150058813
- Publication date Feb 26, 2015
- KLA-Tencor Corporation
- In-Kyo Kim
- G06 - COMPUTING CALCULATING COUNTING

Liequan Lee

Person

Patents Grantslast 30 patents

Bandgap measurements of patterned film stacks using spectroscopic m...

Scatterometry modeling in the presence of undesired diffraction orders

Bandgap measurements of patterned film stacks using spectroscopic m...

Automatic optimization of measurement accuracy through advanced mac...

Measurement methodology of advanced nanostructures

Visualization of three-dimensional semiconductor structures

Visualization of three-dimensional semiconductor structures

Detection and measurement of dimensions of asymmetric structures

Adaptive numerical aperture control method and system

Library expansion system, method, and computer program product for...

System, method, and computer program product for automatically dete...

Metrology system, method, and computer program product employing au...

Multi-model metrology

Patents Applicationslast 30 patents

Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...

Visualization of Three-Dimensional Semiconductor Structures

Visualization of Three-Dimensional Semiconductor Structures

Scatterometry Modeling in the Presence of Undesired Diffraction Orders

Measurement Methodology of Advanced Nanostructures

AUTOMATIC OPTIMIZATION OF MEASUREMENT ACCURACY THROUGH ADVANCED MAC...

Detection And Measurement Of Dimensions Of Asymmetric Structures

Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...

METROLOGY SYSTEM, METHOD, AND COMPUTER PROGRAM PRODUCT EMPLOYING AU...

MULTI-MODEL METROLOGY

LIBRARY EXPANSION SYSTEM, METHOD, AND COMPUTER PROGRAM PRODUCT FOR...

MULTI-MODEL METROLOGY