Lifu LI

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 12,217,942
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,148,598
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and control method of substrate proc...
- Patent number 11,676,800
- Issue date Jun 13, 2023
- Tokyo Electron Limited
- Ikko Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and substrate processing apparatus
- Patent number 11,264,248
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Yoshimitsu Kon
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240222090
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SHUTTER
- Publication number 20240128058
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND GAS SUPPLY METHOD
- Publication number 20230207276
- Publication date Jun 29, 2023
- TOKYO ELECTRON LIMITED
- Kota SHIHOMMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UPPER ELECTRODE ASSEMBLY
- Publication number 20220319815
- Publication date Oct 6, 2022
- TOKYO ELECTRON LIMITED
- Lifu LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220301832
- Publication date Sep 22, 2022
- TOKYO ELECTRON LIMITED
- Takashi Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220301830
- Publication date Sep 22, 2022
- TOKYO ELECTRON LIMITED
- Lifu LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220254611
- Publication date Aug 11, 2022
- TOKYO ELECTRON LIMITED
- Lifu LI
- G05 - CONTROLLING REGULATING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220157567
- Publication date May 19, 2022
- TOKYO ELECTRON LIMITED
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD OF SUBSTRATE PROC...
- Publication number 20210335577
- Publication date Oct 28, 2021
- TOKYO ELECTRON LIMITED
- Ikko TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING, SUBSTRATE SUPPORT, PLASMA PROCESSING SYSTEM AND METHOD O...
- Publication number 20210305022
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Hiroshi TSUJIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200273712
- Publication date Aug 27, 2020
- TOKYO ELECTRON LIMITED
- Atsushi UTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200185229
- Publication date Jun 11, 2020
- TOKYO ELECTRON LIMITED
- Yoshimitsu KON
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma processing apparatus

Substrate processing apparatus and control method of substrate proc...

Etching method and substrate processing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SHUTTER

PLASMA PROCESSING APPARATUS AND GAS SUPPLY METHOD

UPPER ELECTRODE ASSEMBLY

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD OF SUBSTRATE PROC...

EDGE RING, SUBSTRATE SUPPORT, PLASMA PROCESSING SYSTEM AND METHOD O...

DEPOSITION PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS