Lih-Huah Yiin

Person

Mountain View, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for database-assisted requalification reticle...
- Patent number 9,733,640
- Issue date Aug 15, 2017
- KLA-Tencor Corporation
- Lih-Huah Yiin
- G05 - CONTROLLING REGULATING
Information Patent Grant
Detection of thin lines for selective sensitivity during reticle in...
- Patent number 9,092,847
- Issue date Jul 28, 2015
- KLA-Tencor Corporation
- Zhengyu Wang
- G01 - MEASURING TESTING
Information Patent Grant
Detection of thin lines for selective sensitivity during reticle in...
- Patent number 8,855,400
- Issue date Oct 7, 2014
- KLA-Tencor Corporation
- Zhengyu Wang
- G01 - MEASURING TESTING
Information Patent Grant
Detection of thin line for selective sensitivity during reticle ins...
- Patent number 8,090,189
- Issue date Jan 3, 2012
- KLA-Tencor Corporation
- Vinayak Dattatreya Phalke
- G01 - MEASURING TESTING
Information Patent Grant
Method for detecting lithographically significant defects on reticles
- Patent number 7,873,204
- Issue date Jan 18, 2011
- KLA-Tencor Corporation
- Mark J. Wihl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Closed region defect detection system
- Patent number 7,499,156
- Issue date Mar 3, 2009
- KLA-Tencor Technologies Corporation
- George Q. Chen
- G01 - MEASURING TESTING
Information Patent Grant
Visualization of photomask databases
- Patent number 7,167,185
- Issue date Jan 23, 2007
- KLA-Tencor Technologies Corporation
- Lih-Huah Yiin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Closed region defect detection system
- Patent number 7,126,681
- Issue date Oct 24, 2006
- KLA-Tencor Technologies Corporation
- George Q. Chen
- G01 - MEASURING TESTING
Information Patent Grant
Multiple design database layer inspection
- Patent number 7,027,635
- Issue date Apr 11, 2006
- KLA-Tencor Technologies Corporation
- Mark J. Wihl
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR DATABASE-ASSISTED REQUALIFICATION RETICLE...
- Publication number 20150005917
- Publication date Jan 1, 2015
- KLA-Tencor Corporation
- Lih-Huah Yiin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETECTION OF THIN LINES FOR SELECTIVE SENSITIVITY DURING RETICLE IN...
- Publication number 20140369593
- Publication date Dec 18, 2014
- KLA-Tencor Corporation
- Zhengyu Wang
- G01 - MEASURING TESTING
Information Patent Application
DETECTION OF THIN LINES FOR SELECTIVE SENSITIVITY DURING RETICLE IN...
- Publication number 20130236083
- Publication date Sep 12, 2013
- KLA-Tencor Corporation
- Zhengyu Wang
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR DETECTING LITHOGRAPHICALLY SIGNIFICANT DEFECTS ON RETICLES
- Publication number 20080170773
- Publication date Jul 17, 2008
- KLA-Tencor Technologies Corporation
- Mark J. Wihl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Closed region defect detection system
- Publication number 20070035727
- Publication date Feb 15, 2007
- KLA-Tencor Corporation
- George Q. Chen
- G01 - MEASURING TESTING

Lih-Huah Yiin

Person

Patents Grantslast 30 patents

Method and apparatus for database-assisted requalification reticle...

Detection of thin lines for selective sensitivity during reticle in...

Detection of thin lines for selective sensitivity during reticle in...

Detection of thin line for selective sensitivity during reticle ins...

Method for detecting lithographically significant defects on reticles

Closed region defect detection system

Visualization of photomask databases

Closed region defect detection system

Multiple design database layer inspection

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR DATABASE-ASSISTED REQUALIFICATION RETICLE...

DETECTION OF THIN LINES FOR SELECTIVE SENSITIVITY DURING RETICLE IN...

DETECTION OF THIN LINES FOR SELECTIVE SENSITIVITY DURING RETICLE IN...

METHOD FOR DETECTING LITHOGRAPHICALLY SIGNIFICANT DEFECTS ON RETICLES

Closed region defect detection system