LIJUAN DU

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Patents Grantslast 30 patents

Information Patent Grant
Technique of reducing shallow trench isolation loss during fin form...
- Patent number 9,646,888
- Issue date May 9, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- Lijuan Du
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TECHNIQUE OF REDUCING SHALLOW TRENCH ISOLATION LOSS DURING FIN FORM...
- Publication number 20160218041
- Publication date Jul 28, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- LIJUAN DU
- H01 - BASIC ELECTRIC ELEMENTS