Lily JIANG

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Method for processing structure in manufacturing semiconductor device
- Patent number 9,252,010
- Issue date Feb 2, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- Lily Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surrounding stacked gate multi-gate FET structure nonvolatile memor...
- Patent number 8,889,510
- Issue date Nov 18, 2014
- Semiconductor Manufacturing International (Shanghai) Corporation
- De Yuan Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming metal gate
- Patent number 8,679,923
- Issue date Mar 25, 2014
- Semiconductor Manufacturing International Corp
- Junzhu Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surrounding stacked gate multi-gate FET structure nonvolatile memor...
- Patent number 8,513,727
- Issue date Aug 20, 2013
- Semiconductor Manufacturing International (Shanghai) Corporation
- Deyuan Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for performing a chemical mechanical polishing...
- Patent number 8,105,898
- Issue date Jan 31, 2012
- Semiconductor Manufacturing International (Shanghai) Corporation
- Lily Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for performing a chemical mechanical polishing...
- Patent number 8,105,897
- Issue date Jan 31, 2012
- Semiconductor Manufacturing International (Shanghai) Corporation
- Lily Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for performing a chemical mechanical polishing...
- Patent number 8,105,899
- Issue date Jan 31, 2012
- Semiconductor Manufacturing International (Shanghai) Corporation
- Lily Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for performing a chemical mechanical polishing...
- Patent number 8,097,508
- Issue date Jan 17, 2012
- Semiconductor Manufacturing International (Shanghai) Corporation
- Lily Jiang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PROCESSING STRUCTURE IN MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20150132954
- Publication date May 14, 2015
- Semiconductor Manufacturing International (Shanghai) Corporation
- Lily JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURROUNDING STACKED GATE MULTI-GATE FET STRUCTURE NONVOLATILE MEMOR...
- Publication number 20130302951
- Publication date Nov 14, 2013
- De Yuan Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING METAL GATE
- Publication number 20130157449
- Publication date Jun 20, 2013
- Semiconductor Manufacturing International Corp.
- JUNZHU CAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURROUNDING STACKED GATE MULTI-GATE FET STRUCTURE NONVOLATILE MEMOR...
- Publication number 20110163369
- Publication date Jul 7, 2011
- Semiconductor Manufacturing International (Shanghai) Corporation
- Deyuan Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR PERFORMING A CHEMICAL MECHANICAL POLISHING...
- Publication number 20100248468
- Publication date Sep 30, 2010
- Semiconductor Manufacturing International (Shanghai) Corporation
- Lily Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOIR PERFORMING A CHEMICAL MECHANICAL POLISHIN...
- Publication number 20100227464
- Publication date Sep 9, 2010
- Semiconductor Manufacturing International (Shanghai) Corporation
- LILY JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR PERFORMING A CHEMICAL MECHANICAL POLISHING...
- Publication number 20100227465
- Publication date Sep 9, 2010
- Semiconductor Manufacturing International (Shanghai) Corporation
- LILY JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR PERFORMING A CHEMICAL MECHANICAL POLISHING...
- Publication number 20100190329
- Publication date Jul 29, 2010
- Semiconductor Manufacturing International (Shanghai) Corporation
- LILY JIANG
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method for processing structure in manufacturing semiconductor device

Surrounding stacked gate multi-gate FET structure nonvolatile memor...

Method for forming metal gate

Surrounding stacked gate multi-gate FET structure nonvolatile memor...

Method and structure for performing a chemical mechanical polishing...

Method and structure for performing a chemical mechanical polishing...

Method and structure for performing a chemical mechanical polishing...

Method and structure for performing a chemical mechanical polishing...

Patents Applicationslast 30 patents

METHOD FOR PROCESSING STRUCTURE IN MANUFACTURING SEMICONDUCTOR DEVICE

SURROUNDING STACKED GATE MULTI-GATE FET STRUCTURE NONVOLATILE MEMOR...

METHOD FOR FORMING METAL GATE

SURROUNDING STACKED GATE MULTI-GATE FET STRUCTURE NONVOLATILE MEMOR...

METHOD AND STRUCTURE FOR PERFORMING A CHEMICAL MECHANICAL POLISHING...

METHOD AND STRUCTURE FOIR PERFORMING A CHEMICAL MECHANICAL POLISHIN...

METHOD AND STRUCTURE FOR PERFORMING A CHEMICAL MECHANICAL POLISHING...

METHOD AND STRUCTURE FOR PERFORMING A CHEMICAL MECHANICAL POLISHING...