Lily L. Pang

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multiple complementary gas distribution assemblies
- Patent number 9,303,318
- Issue date Apr 5, 2016
- Applied Materials, Inc.
- Tuoh-Bin Ng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
HVPE chamber hardware
- Patent number 8,568,529
- Issue date Oct 29, 2013
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
HVPE precursor source hardware
- Patent number 8,491,720
- Issue date Jul 23, 2013
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ceiling electrode with process gas dispersers housing plural induct...
- Patent number 8,317,970
- Issue date Nov 27, 2012
- Applied Materials, Inc.
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dome assembly for a deposition chamber
- Patent number D664172
- Issue date Jul 24, 2012
- Applied Materials, Inc.
- Tetsuya Ishikawa
- D15 - Machines not elsewhere specified
Information Patent Grant
Methods for fabricating group III nitride structures with a cluster...
- Patent number 8,183,132
- Issue date May 22, 2012
- Applied Materials, Inc.
- Sandeep Nijhawan
- C30 - CRYSTAL GROWTH
Information Patent Grant
Plasma immersion ion implantation with highly uniform chamber seaso...
- Patent number 7,691,755
- Issue date Apr 6, 2010
- Applied Materials, Inc.
- Shijian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated bevel clean chamber
- Patent number 7,520,939
- Issue date Apr 21, 2009
- Applied Materials, Inc.
- Henry Ho
- B08 - CLEANING
Information Patent Grant
Method and system for detection of wafer centering in a track litho...
- Patent number 7,497,026
- Issue date Mar 3, 2009
- Sokudo Co., Ltd.
- Harald Herchen
- G01 - MEASURING TESTING
Information Patent Grant
Electric field reducing thrust plate
- Patent number 7,285,195
- Issue date Oct 23, 2007
- Applied Materials, Inc.
- Harald Herchen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-chemistry plating system
- Patent number 7,223,323
- Issue date May 29, 2007
- Applied Materials, Inc.
- Michael X. Yang
- A23 - FOODS OR FOODSTUFFS THEIR TREATMENT, NOT COVERED BY OTHER CLASSES
Information Patent Grant
Semiconductor wafer support lift-pin assembly
- Patent number 6,958,098
- Issue date Oct 25, 2005
- Applied Materials, Inc.
- Rudolf Gujer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor wafer support lift-pin assembly
- Patent number 6,572,708
- Issue date Jun 3, 2003
- Applied Materials Inc.
- Rudolf Gujer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition chamber lid assembly
- Patent number 6,517,634
- Issue date Feb 11, 2003
- Applied Materials, Inc.
- Lily L. Pang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution system for a CVD processing chamber
- Patent number 6,486,081
- Issue date Nov 26, 2002
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Directing a flow of gas in a substrate processing chamber
- Patent number 6,450,117
- Issue date Sep 17, 2002
- Applied Materials, Inc.
- Laxman Murugesh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for cleaning a semiconductor process chamber
- Patent number 6,363,624
- Issue date Apr 2, 2002
- Applied Materials, Inc.
- Lily L. Pang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma assisted semiconductor substrate processing chamber having a...
- Patent number 6,364,958
- Issue date Apr 2, 2002
- Applied Materials, Inc.
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution system for a CVD processing chamber
- Patent number 6,143,078
- Issue date Nov 7, 2000
- Applied Materials, Inc.
- Tetsuya Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTIPLE COMPLEMENTARY GAS DISTRIBUTION ASSEMBLIES
- Publication number 20130098455
- Publication date Apr 25, 2013
- Tuoh-Bin Ng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TRANSFER MECHANISM WITH PREHEATING FEATURES
- Publication number 20110064545
- Publication date Mar 17, 2011
- Applied Materials, Inc.
- TETSUYA ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLUSTER TOOL FOR LEDS
- Publication number 20100261340
- Publication date Oct 14, 2010
- Applied Materials, Inc.
- SANDEEP NIJHAWAN
- C30 - CRYSTAL GROWTH
Information Patent Application
HVPE PRECURSOR SOURCE HARDWARE
- Publication number 20100258052
- Publication date Oct 14, 2010
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C30 - CRYSTAL GROWTH
Information Patent Application
HVPE CHAMBER HARDWARE
- Publication number 20100258049
- Publication date Oct 14, 2010
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C30 - CRYSTAL GROWTH
Information Patent Application
CEILING ELECTRODE WITH PROCESS GAS DISPERSERS HOUSING PLURAL INDUCT...
- Publication number 20090294065
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- CANFENG LAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA IMMERSION ION IMPLANTATION WITH HIGHLY UNIFORM CHAMBER SEASO...
- Publication number 20080286982
- Publication date Nov 20, 2008
- Shijian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETECTION OF WAFER CENTERING IN A TRACK LITHO...
- Publication number 20080168673
- Publication date Jul 17, 2008
- SOKUDO CO., LTD.
- Harald Herchen
- G01 - MEASURING TESTING
Information Patent Application
Current collimation for thin seed and direct plating
- Publication number 20060102467
- Publication date May 18, 2006
- Harald Herchen
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Electric field reducing thrust plate
- Publication number 20050284754
- Publication date Dec 29, 2005
- Harald Herchen
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Spin rinse dry cell
- Publication number 20040206373
- Publication date Oct 21, 2004
- APPLIED MATERIALS, INC.
- Bernardo Donoso
- B08 - CLEANING
Information Patent Application
Integrated bevel clean chamber
- Publication number 20040206375
- Publication date Oct 21, 2004
- APPLIED MATERIALS, INC.
- Henry Ho
- B08 - CLEANING
Information Patent Application
Multi-chemistry plating system
- Publication number 20040016637
- Publication date Jan 29, 2004
- APPLIED MATERIALS, INC.
- Michael X. Yang
- A23 - FOODS OR FOODSTUFFS THEIR TREATMENT, NOT COVERED BY OTHER CLASSES
Information Patent Application
Semiconductor wafer support lift-pin assembly
- Publication number 20030205329
- Publication date Nov 6, 2003
- Rudolf Gujer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Spin coater
- Publication number 20030079679
- Publication date May 1, 2003
- Toru Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical vapor deposition chamber lid assembly
- Publication number 20020117262
- Publication date Aug 29, 2002
- APPLIED MATERIALS, INC.
- Lily L. Pang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor wafer support lift-pin assembly
- Publication number 20020011204
- Publication date Jan 31, 2002
- APPLIED MATERIALS, INC.
- Rudolf Gujer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Lily L. Pang

Person

Patents Grantslast 30 patents

Multiple complementary gas distribution assemblies

HVPE chamber hardware

HVPE precursor source hardware

Ceiling electrode with process gas dispersers housing plural induct...

Dome assembly for a deposition chamber

Methods for fabricating group III nitride structures with a cluster...

Plasma immersion ion implantation with highly uniform chamber seaso...

Integrated bevel clean chamber

Method and system for detection of wafer centering in a track litho...

Electric field reducing thrust plate

Multi-chemistry plating system

Semiconductor wafer support lift-pin assembly

Semiconductor wafer support lift-pin assembly

Chemical vapor deposition chamber lid assembly

Gas distribution system for a CVD processing chamber

Directing a flow of gas in a substrate processing chamber

Apparatus for cleaning a semiconductor process chamber

Plasma assisted semiconductor substrate processing chamber having a...

Gas distribution system for a CVD processing chamber

Patents Applicationslast 30 patents

MULTIPLE COMPLEMENTARY GAS DISTRIBUTION ASSEMBLIES

SUBSTRATE TRANSFER MECHANISM WITH PREHEATING FEATURES

CLUSTER TOOL FOR LEDS

HVPE PRECURSOR SOURCE HARDWARE

HVPE CHAMBER HARDWARE

CEILING ELECTRODE WITH PROCESS GAS DISPERSERS HOUSING PLURAL INDUCT...

PLASMA IMMERSION ION IMPLANTATION WITH HIGHLY UNIFORM CHAMBER SEASO...

METHOD AND SYSTEM FOR DETECTION OF WAFER CENTERING IN A TRACK LITHO...

Current collimation for thin seed and direct plating

Electric field reducing thrust plate

Spin rinse dry cell

Integrated bevel clean chamber

Multi-chemistry plating system

Semiconductor wafer support lift-pin assembly

Spin coater

Chemical vapor deposition chamber lid assembly

Semiconductor wafer support lift-pin assembly