Linan Ji

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Shanghai-shi, CN

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Patents Grantslast 30 patents

Information Patent Grant
Supercritical drying method for semiconductor substrate
- Patent number 9,570,286
- Issue date Feb 14, 2017
- Kabushiki Kaisha Toshiba
- Yohei Sato
- F26 - DRYING
Information Patent Grant
Method and device for cleaning semiconductor substrate
- Patent number 8,961,696
- Issue date Feb 24, 2015
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Supercritical drying method for semiconductor substrate
- Patent number 8,950,082
- Issue date Feb 10, 2015
- Kabushiki Kaisha Toshiba
- Yohei Sato
- F26 - DRYING
Information Patent Grant
Supercritical drying method for semiconductor substrate and supercr...
- Patent number 8,771,429
- Issue date Jul 8, 2014
- Kabushiki Kaisha Toshiba
- Linan Ji
- F26 - DRYING

Patents Applicationslast 30 patents

Information Patent Application
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20150135549
- Publication date May 21, 2015
- Kabushiki Kaisha Toshiba
- Yohei Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR CLEANING SEMICONDUCTOR SUBSTRATE
- Publication number 20130068257
- Publication date Mar 21, 2013
- Hiroshi TOMITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD AND SUPERCRITICAL DRYING APPARATUS FOR...
- Publication number 20130061492
- Publication date Mar 14, 2013
- Hisashi OKUCHI
- F26 - DRYING
Information Patent Application
SUPERCRlTICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20130055584
- Publication date Mar 7, 2013
- Yohei Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE AND SUPERCR...
- Publication number 20130019905
- Publication date Jan 24, 2013
- Linan JI
- H01 - BASIC ELECTRIC ELEMENTS