Linda Karin Sundberg

Person

Los Gatos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Generating metal-oxide film
- Patent number 12,110,592
- Issue date Oct 8, 2024
- International Business Machines Corporation
- Wyatt Thornley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Protective enclosure for gas sensors
- Patent number 12,099,043
- Issue date Sep 24, 2024
- International Business Machines Corporation
- Thomas Geoffrey Pattison
- G01 - MEASURING TESTING
Information Patent Grant
Protective enclosure for gas sensors
- Patent number 11,624,740
- Issue date Apr 11, 2023
- International Business Machines Corporation
- Thomas Geoffrey Pattison
- G01 - MEASURING TESTING
Information Patent Grant
Multifunctional polymers
- Patent number 11,500,285
- Issue date Nov 15, 2022
- International Business Machines Corporation
- Luisa D. Bozano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Nitrogen heterocycle-containing monolayers on metal oxides for bind...
- Patent number 10,915,023
- Issue date Feb 9, 2021
- International Business Machines Corporation
- Shu-Jen Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative-tone resist compositions and multifunctional polymers therein
- Patent number 10,345,700
- Issue date Jul 9, 2019
- International Business Machines Corporation
- Luisa D. Bozano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Porous tin oxide films
- Patent number 10,236,184
- Issue date Mar 19, 2019
- International Business Machines Corporation
- Amy N. Bowers
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Adhesive resins for wafer bonding
- Patent number 10,174,229
- Issue date Jan 8, 2019
- International Business Machines Corporation
- Robert D. Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Porous tin oxide films
- Patent number 10,020,199
- Issue date Jul 10, 2018
- International Business Machines Corporation
- Amy N. Bowers
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Adhesive resins for wafer bonding
- Patent number 9,850,406
- Issue date Dec 26, 2017
- International Business Machines Corporation
- Robert D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist performance for the negative tone develop organic developmen...
- Patent number 9,389,516
- Issue date Jul 12, 2016
- International Business Machines Corporation
- Luisa D. Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and methods of use in high index immersion...
- Patent number 9,250,529
- Issue date Feb 2, 2016
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling orientation of domains in block copolymer films
- Patent number 9,181,426
- Issue date Nov 10, 2015
- GLOBALFOUNDRIES Inc.
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Resist performance for the negative tone develop organic developmen...
- Patent number 9,057,960
- Issue date Jun 16, 2015
- International Business Machines Corporation
- Luisa D. Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-topcoating resist for photolithography
- Patent number 8,945,808
- Issue date Feb 3, 2015
- International Business Machines Corporation
- Robert Allen David
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive tone organic solvent developed chemically amplified resist
- Patent number 8,900,802
- Issue date Dec 2, 2014
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of directed self-assembly and layered structures formed the...
- Patent number 8,821,978
- Issue date Sep 2, 2014
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method for using a topcoat composition
- Patent number 8,802,357
- Issue date Aug 12, 2014
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Water-dispersible electrically conductive fluorine-containing polya...
- Patent number 8,802,351
- Issue date Aug 12, 2014
- International Business Machines Corporation
- Luisa Dominica Bozano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Metal peroxo compounds with organic co-ligands for electron beam, d...
- Patent number 8,703,386
- Issue date Apr 22, 2014
- International Business Machines Corporation
- John David Bass
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluoroalcohol containing molecular photoresist materials and proces...
- Patent number 8,530,136
- Issue date Sep 10, 2013
- International Business Machines Corporation
- Luisa D. Bozano
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of controlling orientation of domains in block copolymer films
- Patent number 8,491,965
- Issue date Jul 23, 2013
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Graded topcoat materials for immersion lithography
- Patent number 8,440,387
- Issue date May 14, 2013
- International Business Machines Corporation
- Robert D. Allen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified silsesquioxane resist compositions
- Patent number 8,426,113
- Issue date Apr 23, 2013
- International Business Machines Corporation
- Luisa Dominica Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and methods of use in high index immersion...
- Patent number 8,236,482
- Issue date Aug 7, 2012
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Topcoat composition
- Patent number 8,088,873
- Issue date Jan 3, 2012
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for using a topcoat composition
- Patent number 8,053,537
- Issue date Nov 8, 2011
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High contact angle topcoat material and use thereof in lithography...
- Patent number 8,034,532
- Issue date Oct 11, 2011
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and methods of use in high index immersion...
- Patent number 8,003,309
- Issue date Aug 23, 2011
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calixarene blended molecular glass photoresists and processes of use
- Patent number 7,993,812
- Issue date Aug 9, 2011
- International Business Machines Corporation
- Luisa D. Bozano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PROTECTIVE ENCLOSURE FOR GAS SENSORS
- Publication number 20230122407
- Publication date Apr 20, 2023
- International Business Machines Corporation
- Thomas Geoffrey Pattison
- G01 - MEASURING TESTING
Information Patent Application
CHEMICAL SENSOR UTILIZING ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY
- Publication number 20220390401
- Publication date Dec 8, 2022
- International Business Machines Corporation
- Tim Erdmann
- G01 - MEASURING TESTING
Information Patent Application
GENERATING METAL-OXIDE FILM
- Publication number 20220090265
- Publication date Mar 24, 2022
- International Business Machines Corporation
- Wyatt Thornley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROTECTIVE ENCLOSURE FOR GAS SENSORS
- Publication number 20220018822
- Publication date Jan 20, 2022
- International Business Machines Corporation
- Thomas Geoffrey Pattison
- G01 - MEASURING TESTING
Information Patent Application
MULTIFUNCTIONAL POLYMERS
- Publication number 20200278607
- Publication date Sep 3, 2020
- International Business Machines Corporation
- Luisa D. Bozano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NITROGEN HETEROCYCLE-CONTAINING MONOLAYERS ON METAL OXIDES FOR BIND...
- Publication number 20190137879
- Publication date May 9, 2019
- International Business Machines Corporation
- Shu-Jen Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POROUS TIN OXIDE FILMS
- Publication number 20180330955
- Publication date Nov 15, 2018
- International Business Machines Corporation
- Amy N. Bowers
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
ADHESIVE RESINS FOR WAFER BONDING
- Publication number 20180072926
- Publication date Mar 15, 2018
- International Business Machines Corporation
- ROBERT D. ALLEN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ADHESIVE RESINS FOR WAFER BONDING
- Publication number 20160133499
- Publication date May 12, 2016
- International Business Machines Corporation
- ROBERT D. ALLEN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
NEGATIVE-TONE RESIST COMPOSITIONS AND MULTIFUNCTIONAL POLYMERS THEREIN
- Publication number 20160070169
- Publication date Mar 10, 2016
- SHIN-ETSU CHEMICAL CO., LTD.
- Luisa D. Bozano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PERFORMANCE FOR THE NEGATIVE TONE DEVELOP ORGANIC DEVELOPMEN...
- Publication number 20150309415
- Publication date Oct 29, 2015
- International Business Machines Corporation
- LUISA D. BOZANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TONE ORGANIC SOLVENT DEVELOPED CHEMICALLY AMPLIFIED RESIST
- Publication number 20140242526
- Publication date Aug 28, 2014
- JSR Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Performance for the Negative Tone Develop Organic Developmen...
- Publication number 20140220495
- Publication date Aug 7, 2014
- International Business Machines Corporation
- Luisa D. Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WATER-DISPERSIBLE ELECTRICALLY CONDUCTIVE FLUORINE-CONTAINING POLYA...
- Publication number 20140038104
- Publication date Feb 6, 2014
- Shin-Etsu Chemical Co., Ltd.
- Luisa Dominica Bozano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ORGANIC SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION
- Publication number 20130344441
- Publication date Dec 26, 2013
- International Business Machines Corporation
- RATNAM SOORIYAKUMARAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING ORIENTATION OF DOMAINS IN BLOCK COPOLYMER FILMS
- Publication number 20130274380
- Publication date Oct 17, 2013
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METAL PEROXO COMPOUNDS WITH ORGANIC CO-LIGANDS FOR ELECTRON BEAM, D...
- Publication number 20130224652
- Publication date Aug 29, 2013
- International Business Machines Corporation
- John David Bass
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF USE IN HIGH INDEX IMMERSION...
- Publication number 20120288797
- Publication date Nov 15, 2012
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluoroalcohol Containing Molecular Photoresist Materials and Proces...
- Publication number 20120156611
- Publication date Jun 21, 2012
- International Business Machines Corporation
- Luisa D. Bozano
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR USING A TOPCOAT COMPOSITION
- Publication number 20120082945
- Publication date Apr 5, 2012
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED SILSESQUIOXANE RESIST COMPOSITIONS
- Publication number 20120040289
- Publication date Feb 16, 2012
- International Business Machines Corporation
- Luisa Dominica Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THE...
- Publication number 20110147983
- Publication date Jun 23, 2011
- Joy CHENG
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Calixarene Blended Molecular Glass Photoresists and Processes of Use
- Publication number 20110020756
- Publication date Jan 27, 2011
- International Business Machines Corporation
- Luisa D. Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOW-K INTERLEVEL DIELECTRIC MATERIALS AND METHOD OF FORMING LOW-K I...
- Publication number 20100311895
- Publication date Dec 9, 2010
- International Business Machines Corporation
- Geraud Jean-Michel Dubois
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY
- Publication number 20100168337
- Publication date Jul 1, 2010
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist Compositions and Methods of Use in High Index Immersion...
- Publication number 20090181321
- Publication date Jul 16, 2009
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Controlling Orientation of Domains in Block Copolymer Films
- Publication number 20090181171
- Publication date Jul 16, 2009
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD OF USE OF EPOXY-CONTAINING CYCLOALIPHATIC ACRYLIC POLYMERS A...
- Publication number 20090179001
- Publication date Jul 16, 2009
- International Business Machines Corporation
- Joy Cheng
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method of Controlling Orientation of Domains in Block Copolymer Films
- Publication number 20090182093
- Publication date Jul 16, 2009
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Photoresist Compositions and Methods of Use in High Index Immersion...
- Publication number 20090181322
- Publication date Jul 16, 2009
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Linda Karin Sundberg

Person

Patents Grantslast 30 patents

Generating metal-oxide film

Protective enclosure for gas sensors

Protective enclosure for gas sensors

Multifunctional polymers

Nitrogen heterocycle-containing monolayers on metal oxides for bind...

Negative-tone resist compositions and multifunctional polymers therein

Porous tin oxide films

Adhesive resins for wafer bonding

Porous tin oxide films

Adhesive resins for wafer bonding

Resist performance for the negative tone develop organic developmen...

Photoresist compositions and methods of use in high index immersion...

Method of controlling orientation of domains in block copolymer films

Resist performance for the negative tone develop organic developmen...

Self-topcoating resist for photolithography

Positive tone organic solvent developed chemically amplified resist

Methods of directed self-assembly and layered structures formed the...

Method for using a topcoat composition

Water-dispersible electrically conductive fluorine-containing polya...

Metal peroxo compounds with organic co-ligands for electron beam, d...

Fluoroalcohol containing molecular photoresist materials and proces...

Method of controlling orientation of domains in block copolymer films

Graded topcoat materials for immersion lithography

Chemically amplified silsesquioxane resist compositions

Photoresist compositions and methods of use in high index immersion...

Topcoat composition

Method for using a topcoat composition

High contact angle topcoat material and use thereof in lithography...

Photoresist compositions and methods of use in high index immersion...

Calixarene blended molecular glass photoresists and processes of use

Patents Applicationslast 30 patents

PROTECTIVE ENCLOSURE FOR GAS SENSORS

CHEMICAL SENSOR UTILIZING ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY

GENERATING METAL-OXIDE FILM

PROTECTIVE ENCLOSURE FOR GAS SENSORS

MULTIFUNCTIONAL POLYMERS

NITROGEN HETEROCYCLE-CONTAINING MONOLAYERS ON METAL OXIDES FOR BIND...

POROUS TIN OXIDE FILMS

ADHESIVE RESINS FOR WAFER BONDING

ADHESIVE RESINS FOR WAFER BONDING

NEGATIVE-TONE RESIST COMPOSITIONS AND MULTIFUNCTIONAL POLYMERS THEREIN

RESIST PERFORMANCE FOR THE NEGATIVE TONE DEVELOP ORGANIC DEVELOPMEN...

POSITIVE TONE ORGANIC SOLVENT DEVELOPED CHEMICALLY AMPLIFIED RESIST

Resist Performance for the Negative Tone Develop Organic Developmen...

WATER-DISPERSIBLE ELECTRICALLY CONDUCTIVE FLUORINE-CONTAINING POLYA...

ORGANIC SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION

METHOD OF CONTROLLING ORIENTATION OF DOMAINS IN BLOCK COPOLYMER FILMS

METAL PEROXO COMPOUNDS WITH ORGANIC CO-LIGANDS FOR ELECTRON BEAM, D...

PHOTORESIST COMPOSITIONS AND METHODS OF USE IN HIGH INDEX IMMERSION...

Fluoroalcohol Containing Molecular Photoresist Materials and Proces...

METHOD FOR USING A TOPCOAT COMPOSITION

CHEMICALLY AMPLIFIED SILSESQUIOXANE RESIST COMPOSITIONS

METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THE...

Calixarene Blended Molecular Glass Photoresists and Processes of Use

LOW-K INTERLEVEL DIELECTRIC MATERIALS AND METHOD OF FORMING LOW-K I...

GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY

Photoresist Compositions and Methods of Use in High Index Immersion...

Method of Controlling Orientation of Domains in Block Copolymer Films

METHOD OF USE OF EPOXY-CONTAINING CYCLOALIPHATIC ACRYLIC POLYMERS A...

Method of Controlling Orientation of Domains in Block Copolymer Films

Photoresist Compositions and Methods of Use in High Index Immersion...