Linda N. Marquez

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing chamber including multiple gas injection point...
- Patent number 10,825,659
- Issue date Nov 3, 2020
- Lam Research Corporation
- Jason Lee Treadwell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for achieving ultra-high selectivity while etching silicon n...
- Patent number 9,911,620
- Issue date Mar 6, 2018
- Lam Research Corporation
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact clean in high-aspect ratio structures
- Patent number 9,558,928
- Issue date Jan 31, 2017
- Lam Research Corporation
- Bayu Thedjoisworo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming microlenses
- Patent number 8,801,947
- Issue date Aug 12, 2014
- Mattson Technology, Inc.
- Tinghao Frank Wang
- G02 - OPTICS
Information Patent Grant
Method and apparatus for self-aligned MOS patterning
- Patent number 7,153,780
- Issue date Dec 26, 2006
- Intel Corporation
- Ervin T. Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio sub-micron contact etch process in an inductively...
- Patent number 6,228,774
- Issue date May 8, 2001
- Lam Research Corporation
- Linda N. Marquez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned contacts for semiconductor device
- Patent number 6,165,910
- Issue date Dec 26, 2000
- Lam Research Corporation
- Janet M. Flanner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned contacts for semiconductor device
- Patent number 6,133,153
- Issue date Oct 17, 2000
- Lam Research Corporation
- Linda N. Marquez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for etching self-aligned contacts
- Patent number 5,783,496
- Issue date Jul 21, 1998
- Lam Research Corporation
- Janet M. Flanner
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR ACHIEVING ULTRA-HIGH SELECTIVITY WHILE ETCHING SILICO...
- Publication number 20180158692
- Publication date Jun 7, 2018
- LAM RESEARCH CORPORATION
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING CHAMBER INCLUDING MULTIPLE GAS INJECTION POINT...
- Publication number 20170200586
- Publication date Jul 13, 2017
- LAM RESEARCH CORPORATION
- Jason Lee Treadwell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ACHIEVING ULTRA-HIGH SELECTIVITY WHILE ETCHING SILICON N...
- Publication number 20160247688
- Publication date Aug 25, 2016
- LAM RESEARCH CORPORATION
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE NITRIDE ETCH
- Publication number 20160181116
- Publication date Jun 23, 2016
- LAM RESEARCH CORPORATION
- Ivan L. Berry
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CONTACT CLEAN IN HIGH-ASPECT RATIO STRUCTURES
- Publication number 20160064212
- Publication date Mar 3, 2016
- LAM RESEARCH CORPORATION
- Bayu Thedjoisworo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Forming Microlenses
- Publication number 20130323933
- Publication date Dec 5, 2013
- Tinghao Frank Wang
- G02 - OPTICS
Information Patent Application
Method and apparatus for self-aligned MOS patterning
- Publication number 20050215039
- Publication date Sep 29, 2005
- Ervin T. Hill
- H01 - BASIC ELECTRIC ELEMENTS

Linda N. Marquez

Person

Patents Grantslast 30 patents

Substrate processing chamber including multiple gas injection point...

Method for achieving ultra-high selectivity while etching silicon n...

Contact clean in high-aspect ratio structures

Methods for forming microlenses

Method and apparatus for self-aligned MOS patterning

High aspect ratio sub-micron contact etch process in an inductively...

Self-aligned contacts for semiconductor device

Self-aligned contacts for semiconductor device

Methods and apparatus for etching self-aligned contacts

Patents Applicationslast 30 patents

APPARATUS FOR ACHIEVING ULTRA-HIGH SELECTIVITY WHILE ETCHING SILICO...

SUBSTRATE PROCESSING CHAMBER INCLUDING MULTIPLE GAS INJECTION POINT...

METHOD FOR ACHIEVING ULTRA-HIGH SELECTIVITY WHILE ETCHING SILICON N...

SELECTIVE NITRIDE ETCH

CONTACT CLEAN IN HIGH-ASPECT RATIO STRUCTURES

Methods for Forming Microlenses

Method and apparatus for self-aligned MOS patterning