Liqing Wen

Person

Mesa, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing compositions and methods of using the same
- Patent number 12,024,650
- Issue date Jul 2, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Qingmin Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bulk ruthenium chemical mechanical polishing composition
- Patent number 11,999,876
- Issue date Jun 4, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- David (Tawei) Lin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing compositions and methods of use thereof
- Patent number 11,851,585
- Issue date Dec 26, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Ting-Kai Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing compositions and methods of use thereof
- Patent number 11,732,157
- Issue date Aug 22, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Yannan Liang
- B24 - GRINDING POLISHING
Information Patent Grant
Barrier ruthenium chemical mechanical polishing slurry
- Patent number 11,505,718
- Issue date Nov 22, 2022
- FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
- David (Tawei) Lin
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing compositions and methods of use thereof
- Patent number 11,414,568
- Issue date Aug 16, 2022
- Fujifilm Electronic Materials U.S.A., Inc.
- Ting-Kai Huang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Bulk ruthenium chemical mechanical polishing composition
- Patent number 11,279,850
- Issue date Mar 22, 2022
- Fujifilm Electronic Materials U.S.A., Inc.
- David (Tawei) Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Barrier ruthenium chemical mechanical polishing slurry
- Patent number 11,034,859
- Issue date Jun 15, 2021
- Fujifilm Electronic Materials U.S.A., Inc.
- David (Tawei) Lin
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing slurry for cobalt applications
- Patent number 10,676,646
- Issue date Jun 9, 2020
- FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
- Yannan Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrapure colloidal silica for use in chemical mechanical polishing...
- Patent number 8,779,011
- Issue date Jul 15, 2014
- Fujifilm Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultrapure colloidal silica for use in chemical mechanical polishing...
- Patent number 8,211,193
- Issue date Jul 3, 2012
- Fujifilm Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
POLISHING COMPOSITIONS AND METHODS OF USING THE SAME
- Publication number 20240309241
- Publication date Sep 19, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Qingmin Cheng
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20230203343
- Publication date Jun 29, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Ting-Kai Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20220195241
- Publication date Jun 23, 2022
- FUJIFILM ELECTRIC MATERIALS U.S.A., INC.
- Yannan Liang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
BARRIER RUTHENIUM CHEMICAL MECHANICAL POLISHING COMPOSITION
- Publication number 20220162478
- Publication date May 26, 2022
- Fujifilm Electronic Materials U.S.A., Inc.
- David (Tawei) Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLISHING COMPOSITIONS AND METHODS OF USING THE SAME
- Publication number 20220135840
- Publication date May 5, 2022
- Fujifilm Electronic Materials U.S.A., Inc.
- Qingmin Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20210301177
- Publication date Sep 30, 2021
- Fujifilm Electronic Materials U.S.A., Inc.
- James McDonough
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
BARRIER RUTHENIUM CHEMICAL MECHANICAL POLISHING SLURRY
- Publication number 20210261822
- Publication date Aug 26, 2021
- FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
- David (Tawei) Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20210253903
- Publication date Aug 19, 2021
- Fujifilm Electronic Materials U.S.A., Inc.
- Ting-Kai Huang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20210253904
- Publication date Aug 19, 2021
- Fujifilm Electronic Materials U.S.A., Inc.
- Ting-Kai Huang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20210108106
- Publication date Apr 15, 2021
- Fujifilm Electronic Materials U.S.A., Inc.
- Yannan Liang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20210087431
- Publication date Mar 25, 2021
- Fujifilm Electronic Materials U.S.A., Inc.
- Yannan Liang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
BARRIER RUTHENIUM CHEMICAL MECHANICAL POLISHING SLURRY
- Publication number 20190300749
- Publication date Oct 3, 2019
- Fujifilm Electronic Materials U.S.A., Inc.
- David (Tawei) Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BULK RUTHENIUM CHEMICAL MECHANICAL POLISHING COMPOSITION
- Publication number 20190300750
- Publication date Oct 3, 2019
- Fujifilm Electronic Materials U.S.A., Inc.
- David (Tawei) Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY FOR COBALT APPLICATIONS
- Publication number 20180340094
- Publication date Nov 29, 2018
- Fujifilm Planar Solutions, LLC
- Yannan Liang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ULTRAPURE COLLOIDAL SILICA FOR USE IN CHEMICAL MECHANICAL POLISHING...
- Publication number 20120145950
- Publication date Jun 14, 2012
- Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ultrapure colloidal silica for use in chemical mechanical polishing...
- Publication number 20070254964
- Publication date Nov 1, 2007
- Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ultrapure colloidal silica for use in chemical mechanical polishing...
- Publication number 20070075292
- Publication date Apr 5, 2007
- Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Polishing compositions and methods of using the same

Bulk ruthenium chemical mechanical polishing composition

Polishing compositions and methods of use thereof

Polishing compositions and methods of use thereof

Barrier ruthenium chemical mechanical polishing slurry

Polishing compositions and methods of use thereof

Bulk ruthenium chemical mechanical polishing composition

Barrier ruthenium chemical mechanical polishing slurry

Chemical mechanical polishing slurry for cobalt applications

Ultrapure colloidal silica for use in chemical mechanical polishing...

Ultrapure colloidal silica for use in chemical mechanical polishing...

Patents Applicationslast 30 patents

POLISHING COMPOSITIONS AND METHODS OF USING THE SAME

POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

BARRIER RUTHENIUM CHEMICAL MECHANICAL POLISHING COMPOSITION

POLISHING COMPOSITIONS AND METHODS OF USING THE SAME

POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

BARRIER RUTHENIUM CHEMICAL MECHANICAL POLISHING SLURRY

POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

BARRIER RUTHENIUM CHEMICAL MECHANICAL POLISHING SLURRY

BULK RUTHENIUM CHEMICAL MECHANICAL POLISHING COMPOSITION

CHEMICAL MECHANICAL POLISHING SLURRY FOR COBALT APPLICATIONS

ULTRAPURE COLLOIDAL SILICA FOR USE IN CHEMICAL MECHANICAL POLISHING...

Ultrapure colloidal silica for use in chemical mechanical polishing...

Ultrapure colloidal silica for use in chemical mechanical polishing...