LIWAN YUE

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Integrated rotary structure and fabrication method thereof
- Patent number 10,613,307
- Issue date Apr 7, 2020
- Semiconductor Manufacturing International (Shanghai) Corporation
- Qiang Wu
- G02 - OPTICS
Information Patent Grant
Wafer alignment method and apparatus for overlay measurement
- Patent number 10,553,470
- Issue date Feb 4, 2020
- Semiconductor Manufacturing International (Shanghai) Corporation
- Liwan Yue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Calibrating apparatus and method
- Patent number 10,187,964
- Issue date Jan 22, 2019
- Semiconductor Manufacturing International (Shanghai) Corporation
- Qiang Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for overlay measurement
- Patent number 10,042,269
- Issue date Aug 7, 2018
- Semiconductor Manufacturing International (Shanghai) Corporation
- Liwan Yue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light source and photolithography apparatus containing the same, ca...
- Patent number 9,992,857
- Issue date Jun 5, 2018
- Semiconductor Manufacturing International (Shanghai) Corporation
- Qiang Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet light source, exposure apparatus, and integrate...
- Patent number 9,927,601
- Issue date Mar 27, 2018
- Semiconductor Manufacturing International (Shanghai) Corporation
- Qiang Wu
- G02 - OPTICS
Information Patent Grant
Apparatus and method for overlay measurement
- Patent number 9,835,956
- Issue date Dec 5, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- Yang Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV light source and exposure apparatus
- Patent number 9,706,632
- Issue date Jul 11, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- Qiang Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV light source and exposure apparatus
- Patent number 9,332,626
- Issue date May 3, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- Qiang Wu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
CALIBRATING APPARATUS AND METHOD
- Publication number 20180255630
- Publication date Sep 6, 2018
- Semiconductor Manufacturing International (Shanghai) Corporation
- QIANG WU
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
INTEGRATED ROTARY STRUCTURE AND FABRICATION METHOD THEREOF
- Publication number 20180172967
- Publication date Jun 21, 2018
- Semiconductor Manufacturing International (Shanghai) Corporation
- QIANG WU
- G02 - OPTICS
Information Patent Application
WAFER ALIGNMENT METHOD AND APPARATUS FOR OVERLAY MEASUREMENT
- Publication number 20180122678
- Publication date May 3, 2018
- Semiconductor Manufacturing International (Shanghai) Corporation
- LIWAN YUE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE, EXPOSURE APPARATUS, AND INTEGRATE...
- Publication number 20160377848
- Publication date Dec 29, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- QIANG WU
- G02 - OPTICS
Information Patent Application
APPARATUS AND METHOD FOR OVERLAY MEASUREMENT
- Publication number 20160313115
- Publication date Oct 27, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- YANG LIU
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR OVERLAY MEASUREMENT
- Publication number 20160313655
- Publication date Oct 27, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- LIWAN YUE
- G01 - MEASURING TESTING
Information Patent Application
LIGHT SOURCE AND PHOTOLITHOGRAPHY APPARATUS CONTAINING THE SAME, CA...
- Publication number 20160116332
- Publication date Apr 28, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- QIANG WU
- G01 - MEASURING TESTING
Information Patent Application
EUV LIGHT SOURCE AND EXPOSURE APPARATUS
- Publication number 20160113100
- Publication date Apr 21, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- QIANG WU
- G02 - OPTICS
Information Patent Application
EUV LIGHT SOURCE AND EXPOSURE APPARATUS
- Publication number 20160113101
- Publication date Apr 21, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- QIANG WU
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Integrated rotary structure and fabrication method thereof

Wafer alignment method and apparatus for overlay measurement

Calibrating apparatus and method

Apparatus and method for overlay measurement

Light source and photolithography apparatus containing the same, ca...

Extreme ultraviolet light source, exposure apparatus, and integrate...

Apparatus and method for overlay measurement

EUV light source and exposure apparatus

EUV light source and exposure apparatus

Patents Applicationslast 30 patents

CALIBRATING APPARATUS AND METHOD

INTEGRATED ROTARY STRUCTURE AND FABRICATION METHOD THEREOF

WAFER ALIGNMENT METHOD AND APPARATUS FOR OVERLAY MEASUREMENT

EXTREME ULTRAVIOLET LIGHT SOURCE, EXPOSURE APPARATUS, AND INTEGRATE...

APPARATUS AND METHOD FOR OVERLAY MEASUREMENT

APPARATUS AND METHOD FOR OVERLAY MEASUREMENT

LIGHT SOURCE AND PHOTOLITHOGRAPHY APPARATUS CONTAINING THE SAME, CA...

EUV LIGHT SOURCE AND EXPOSURE APPARATUS

EUV LIGHT SOURCE AND EXPOSURE APPARATUS