Lothar Doni

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Fishkill, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Methods of fabricating integrated circuit devices using anti-reflec...
- Patent number 7,585,763
- Issue date Sep 8, 2009
- Samsung Electronics Co., Ltd.
- Sang Jine Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration scheme for fully silicided gate
- Patent number 7,544,553
- Issue date Jun 9, 2009
- Infineon Technologies AG
- Marcus Culmsee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Methods of fabricating integrated circuit devices using anti-reflec...
- Publication number 20070105293
- Publication date May 10, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Sang Jine Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integration scheme for fully silicided gate
- Publication number 20060228844
- Publication date Oct 12, 2006
- Marcus Culmsee
- H01 - BASIC ELECTRIC ELEMENTS