Louis John Markoya

Person

Sandy Hook, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus and method
- Patent number 10,908,518
- Issue date Feb 2, 2021
- ASML Holding N.V.
- Santiago E. Delpuerto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus, a dryer and a method of removing liquid fro...
- Patent number 10,649,349
- Issue date May 12, 2020
- ASML Holding N.V.
- Martinus Hendrikus Antonius Leenders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, a dryer and a method of removing liquid fro...
- Patent number 10,185,231
- Issue date Jan 22, 2019
- ASML Holding N.V.
- Martinus Hendrikus Antonius Leenders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 10,001,713
- Issue date Jun 19, 2018
- ASML Holding N.V.
- Santiago E. Del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, a dryer and a method of removing liquid fro...
- Patent number 9,632,425
- Issue date Apr 25, 2017
- ASML Holding N.V.
- Martinus Hendrikus Antonius Leenders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, fluid combining unit and device manufacturi...
- Patent number 9,330,912
- Issue date May 3, 2016
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for insitu lens cleaning using ozone in immersi...
- Patent number 8,817,226
- Issue date Aug 26, 2014
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for thermally-induced aberration correction in...
- Patent number 8,736,807
- Issue date May 27, 2014
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for insitu lens cleaning in immersion lithography
- Patent number 8,654,305
- Issue date Feb 18, 2014
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion lithographic apparatus with immersion fluid re-circulatin...
- Patent number 8,629,970
- Issue date Jan 14, 2014
- ASML Netherlands B.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Re-flow and buffer system for immersion lithography
- Patent number 8,451,422
- Issue date May 28, 2013
- ASML Netherlands B.V.
- Harry Sewell
- G01 - MEASURING TESTING
Information Patent Grant
Liquid immersion lithography system comprising a tilted showerhead...
- Patent number 8,203,693
- Issue date Jun 19, 2012
- ASML Netherlands B.V.
- Aleksandr Khmelichek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus with a fluid combining unit and related devi...
- Patent number 8,045,135
- Issue date Oct 25, 2011
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for thermally-induced aberration correction in...
- Patent number 7,995,185
- Issue date Aug 9, 2011
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tunable alignment geometry
- Patent number 7,838,310
- Issue date Nov 23, 2010
- ASML Holding N.V.
- Louis J Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interferometric lithographic projection apparatus
- Patent number 7,751,030
- Issue date Jul 6, 2010
- ASML Holding N.V.
- Louis Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,684,014
- Issue date Mar 23, 2010
- ASML Holding B.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tunable alignment geometry
- Patent number 7,534,637
- Issue date May 19, 2009
- ASML Holding N.V.
- Louis J Markoya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus and device manufacturing method, an integrat...
- Patent number 7,499,146
- Issue date Mar 3, 2009
- ASML Netherlands B.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adjustable resolution interferometric lithography system
- Patent number 7,492,442
- Issue date Feb 17, 2009
- ASML Holding N.V.
- Louis Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adjustable resolution interferometric lithography system
- Patent number 7,474,385
- Issue date Jan 6, 2009
- ASML Holding N.V.
- Louis Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid immersion lithography system having a tilted showerhead rela...
- Patent number 7,256,864
- Issue date Aug 14, 2007
- ASML Holding N.V.
- Nicolaas Ten Kate
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid immersion lithography system with tilted liquid flow
- Patent number 7,253,879
- Issue date Aug 7, 2007
- ASML Holding N.V.
- Aleksandr Khmelichek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tunable alignment geometry
- Patent number 7,112,890
- Issue date Sep 26, 2006
- ASML Holding N.V.
- Louis J Markoya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of multiple reticles in lithographic printing tools
- Patent number 6,967,713
- Issue date Nov 22, 2005
- ASML Holding N.V.
- Andrew W. McCullough
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of multiple reticles in lithographic printing tools
- Patent number 6,628,372
- Issue date Sep 30, 2003
- Andrew W. McCullough
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20180267414
- Publication date Sep 20, 2018
- ASML Holding N.V.
- Santiago E. DELPUERTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC APPARATUS, A DRYER AND A METHOD OF REMOVING LIQUID FRO...
- Publication number 20170227856
- Publication date Aug 10, 2017
- ASML NETHERLANDS B.V.
- Martinus Hendrikus Antonius LEENDERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Method
- Publication number 20150370180
- Publication date Dec 24, 2015
- ASML Holding N.V.
- Santiago E. DEL PUERTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, FLUID COMBINING UNIT AND DEVICE MANUFACTURI...
- Publication number 20120013866
- Publication date Jan 19, 2012
- ASML Holding N.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR THERMALLY-INDUCED ABERRATION CORRECTION IN...
- Publication number 20110261335
- Publication date Oct 27, 2011
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID HANDLING DEVICE, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DE...
- Publication number 20100214544
- Publication date Aug 26, 2010
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid Immersion Lithography System Comprising a Tilted Showerhead...
- Publication number 20100053574
- Publication date Mar 4, 2010
- ASML Holding N.V.
- Aleksandr Khmelichek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RE-FLOW AND BUFFER SYSTEM FOR IMMERSION LITHOGRAPHY
- Publication number 20090213343
- Publication date Aug 27, 2009
- ASML NETHERLANDS B.V.
- Harry Sewell
- G01 - MEASURING TESTING
Information Patent Application
Tunable Alignment Geometry
- Publication number 20090201505
- Publication date Aug 13, 2009
- ASML Holding N.V.
- Louis J. MARKOYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION LITHOGRAPHY APPARATUS
- Publication number 20090190106
- Publication date Jul 30, 2009
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION LITHOGRAPHIC APPARATUS WITH IMMERSION FLUID RE-CIRCULATIN...
- Publication number 20090185149
- Publication date Jul 23, 2009
- ASML Holding N.V.
- Harry SEWELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems and Methods for Insitu Lens Cleaning Using Ozone in Immersi...
- Publication number 20090109411
- Publication date Apr 30, 2009
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems and methods for insitu lens cleaning in immersion lithography
- Publication number 20080198343
- Publication date Aug 21, 2008
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, a dryer and a method of removing liquid fro...
- Publication number 20080192214
- Publication date Aug 14, 2008
- ASML NETHERLANDS B.V.
- Martinus Hendrikus Antonius Leenders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems and methods for thermally-induced aberration correction in...
- Publication number 20080137044
- Publication date Jun 12, 2008
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20080129973
- Publication date Jun 5, 2008
- ASML Holding N.V.
- Diane McCafferty
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20080117392
- Publication date May 22, 2008
- ASML NETHERLANDS B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Adjustable Resolution Interferometric Lithography System
- Publication number 20070070321
- Publication date Mar 29, 2007
- ASML Holding N.V.
- Louis Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid immersion lithography system with tilted liquid flow
- Publication number 20070041002
- Publication date Feb 22, 2007
- ASML Holding N.V.
- Aleksandr Khmelichek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Tunable alignment geometry
- Publication number 20070004053
- Publication date Jan 4, 2007
- ASML Holding N.V.
- Louis J. Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid immersion lithography system having a tilted showerhead rela...
- Publication number 20060238721
- Publication date Oct 26, 2006
- ASML Holding N.V.
- Nicolaas Ten Kate
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid immersion lithography system with tilted liquid flow
- Publication number 20060232753
- Publication date Oct 19, 2006
- ASML Holding N.V.
- Aleksandr Khmelichek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method, an integrat...
- Publication number 20060203220
- Publication date Sep 14, 2006
- ASML NETHERLANDS B.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Interferometric lithographic projection apparatus
- Publication number 20060170896
- Publication date Aug 3, 2006
- ASML Holding, N.V.
- Louis J. Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Adjustable resolution interferometric lithography system
- Publication number 20060044539
- Publication date Mar 2, 2006
- ASML Holding N.V.
- Louis Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Tunable alignment geometry
- Publication number 20050096779
- Publication date May 5, 2005
- ASML Holding N.V.
- Louis J. Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Use of multiple reticles in lithographic printing tools
- Publication number 20050030514
- Publication date Feb 10, 2005
- ASML Holding N.V.
- Andrew W. McCullough
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Use of multiple reticles in lithographic printing tools
- Publication number 20040043311
- Publication date Mar 4, 2004
- ASML Holding N.V.
- Andrew W. McCullough
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Use of multiple reticles in lithographic printing tools
- Publication number 20020115004
- Publication date Aug 22, 2002
- Andrew W. McCullough
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Louis John Markoya

Person

Patents Grantslast 30 patents

Lithographic apparatus and method

Lithographic apparatus, a dryer and a method of removing liquid fro...

Lithographic apparatus, a dryer and a method of removing liquid fro...

Lithographic apparatus and method

Lithographic apparatus, a dryer and a method of removing liquid fro...

Lithographic apparatus, fluid combining unit and device manufacturi...

Systems and methods for insitu lens cleaning using ozone in immersi...

Systems and methods for thermally-induced aberration correction in...

Systems and methods for insitu lens cleaning in immersion lithography

Immersion lithographic apparatus with immersion fluid re-circulatin...

Re-flow and buffer system for immersion lithography

Liquid immersion lithography system comprising a tilted showerhead...

Lithographic apparatus with a fluid combining unit and related devi...

Systems and methods for thermally-induced aberration correction in...

Tunable alignment geometry

Interferometric lithographic projection apparatus

Lithographic apparatus and device manufacturing method

Tunable alignment geometry

Lithographic apparatus and device manufacturing method, an integrat...

Adjustable resolution interferometric lithography system

Adjustable resolution interferometric lithography system

Liquid immersion lithography system having a tilted showerhead rela...

Liquid immersion lithography system with tilted liquid flow

Tunable alignment geometry

Use of multiple reticles in lithographic printing tools

Use of multiple reticles in lithographic printing tools

Patents Applicationslast 30 patents

LITHOGRAPHIC APPARATUS AND METHOD

LITHOGRAPHIC APPARATUS, A DRYER AND A METHOD OF REMOVING LIQUID FRO...

Lithographic Apparatus and Method

LITHOGRAPHIC APPARATUS, FLUID COMBINING UNIT AND DEVICE MANUFACTURI...

SYSTEMS AND METHODS FOR THERMALLY-INDUCED ABERRATION CORRECTION IN...

FLUID HANDLING DEVICE, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DE...

Liquid Immersion Lithography System Comprising a Tilted Showerhead...

RE-FLOW AND BUFFER SYSTEM FOR IMMERSION LITHOGRAPHY

Tunable Alignment Geometry

IMMERSION LITHOGRAPHY APPARATUS

IMMERSION LITHOGRAPHIC APPARATUS WITH IMMERSION FLUID RE-CIRCULATIN...

Systems and Methods for Insitu Lens Cleaning Using Ozone in Immersi...

Systems and methods for insitu lens cleaning in immersion lithography

Lithographic apparatus, a dryer and a method of removing liquid fro...

Systems and methods for thermally-induced aberration correction in...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Adjustable Resolution Interferometric Lithography System

Liquid immersion lithography system with tilted liquid flow

Tunable alignment geometry

Liquid immersion lithography system having a tilted showerhead rela...

Liquid immersion lithography system with tilted liquid flow

Lithographic apparatus and device manufacturing method, an integrat...

Interferometric lithographic projection apparatus

Adjustable resolution interferometric lithography system

Tunable alignment geometry

Use of multiple reticles in lithographic printing tools

Use of multiple reticles in lithographic printing tools

Use of multiple reticles in lithographic printing tools