Louis M. Kindt

Person

Essex Junction, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for sub-pellicle defect reduction on photomasks
- Patent number 8,758,962
- Issue date Jun 24, 2014
- International Business Machines Corporation
- Jay S. Burnham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for sub-pellicle defect reduction on photomasks
- Patent number 8,173,331
- Issue date May 8, 2012
- International Business Machines Corporation
- Jay S. Burnham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adjusting lithographic mask flatness using thermally ind...
- Patent number 7,826,038
- Issue date Nov 2, 2010
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for storing and transporting photomasks in fluid
- Patent number 7,537,114
- Issue date May 26, 2009
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adjusting lithographic mask flatness using thermally ind...
- Patent number 7,355,680
- Issue date Apr 8, 2008
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light scattering EUVL mask
- Patent number 7,198,872
- Issue date Apr 3, 2007
- International Business Machines Corporation
- Emily E. Gallagher
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Process and apparatus for minimizing thermal gradients across an ad...
- Patent number 7,132,206
- Issue date Nov 7, 2006
- International Business Machines Corporation
- Louis M. Kindt
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for controlling linewidth in advanced lithography masks usin...
- Patent number 7,049,035
- Issue date May 23, 2006
- International Business Machines Corporation
- Louis M. Kindt
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
EUVL mask structure and method of formation
- Patent number 6,777,137
- Issue date Aug 17, 2004
- International Business Machines Corporation
- Emily E. Fisch
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR SUB-PELLICLE DEFECT REDUCTION ON PHOTOMASKS
- Publication number 20120196212
- Publication date Aug 2, 2012
- International Business Machines Corporation
- JAY S. BURNHAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR SUB-PELLICLE DEFECT REDUCTION ON PHOTOMASKS
- Publication number 20100178598
- Publication date Jul 15, 2010
- International Business Machines Corporation
- JAY S. BURNHAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ADJUSTING LITHOGRAPHIC MASK FLATNESS USING THERMALLY IND...
- Publication number 20080131795
- Publication date Jun 5, 2008
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System And Method For Storing And Transporting Photomasks In Fluid
- Publication number 20070172743
- Publication date Jul 26, 2007
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK REPAIR
- Publication number 20060199082
- Publication date Sep 7, 2006
- International Business Machines Corporation
- Philip S. Flanigan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ADJUSTING LITHOGRAPHIC MASK FLATNESS USING THERMALLY IND...
- Publication number 20060146313
- Publication date Jul 6, 2006
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT SCATTERING EUVL MASK
- Publication number 20050266317
- Publication date Dec 1, 2005
- International Business Machines Corporation
- Emily E. Gallagher
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR CONTROLLING LINEWIDTH IN ADVANCED LITHOGRAPHY MASKS USIN...
- Publication number 20050106474
- Publication date May 19, 2005
- International Business Machines Corporation
- Louis M. Kindt
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Reflective mask structure and method of formation
- Publication number 20040131947
- Publication date Jul 8, 2004
- International Business Machines Corporation
- Emily Fisch Gallagher
- B82 - NANO-TECHNOLOGY
Information Patent Application
Process and apparatus for minimizing thermal gradients across an ad...
- Publication number 20040053169
- Publication date Mar 18, 2004
- International Business Machines Corporation
- Louis M. Kindt
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUVL mask structure and method of formation
- Publication number 20040009408
- Publication date Jan 15, 2004
- International Business Machines Corporation
- Emily E. Fisch
- B82 - NANO-TECHNOLOGY

Louis M. Kindt

Person

Patents Grantslast 30 patents

Method and apparatus for sub-pellicle defect reduction on photomasks

Method and apparatus for sub-pellicle defect reduction on photomasks

Method for adjusting lithographic mask flatness using thermally ind...

System and method for storing and transporting photomasks in fluid

Method for adjusting lithographic mask flatness using thermally ind...

Light scattering EUVL mask

Process and apparatus for minimizing thermal gradients across an ad...

Method for controlling linewidth in advanced lithography masks usin...

EUVL mask structure and method of formation

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR SUB-PELLICLE DEFECT REDUCTION ON PHOTOMASKS

METHOD AND APPARATUS FOR SUB-PELLICLE DEFECT REDUCTION ON PHOTOMASKS

METHOD FOR ADJUSTING LITHOGRAPHIC MASK FLATNESS USING THERMALLY IND...

System And Method For Storing And Transporting Photomasks In Fluid

MASK REPAIR

METHOD FOR ADJUSTING LITHOGRAPHIC MASK FLATNESS USING THERMALLY IND...

LIGHT SCATTERING EUVL MASK

METHOD FOR CONTROLLING LINEWIDTH IN ADVANCED LITHOGRAPHY MASKS USIN...

Reflective mask structure and method of formation

Process and apparatus for minimizing thermal gradients across an ad...

EUVL mask structure and method of formation