Luc Albarede

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for determining process rate
- Patent number 11,056,322
- Issue date Jul 6, 2021
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus with optical cavity for determining process rate
- Patent number 10,930,478
- Issue date Feb 23, 2021
- Lam Research Corporation
- Jagadeeshwari Manne
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Endpoint sensor based control including adjustment of an edge ring...
- Patent number 10,903,050
- Issue date Jan 26, 2021
- Lam Research Corporation
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining etch process parameters
- Patent number 10,784,174
- Issue date Sep 22, 2020
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching systems and methods using empirical mode decomposition
- Patent number 10,504,704
- Issue date Dec 10, 2019
- Lam Research Corporation
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas exhaust by-product measurement system
- Patent number 10,302,553
- Issue date May 28, 2019
- Lam Research Corporation
- Cristian Siladie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of impedance of RF return path
- Patent number 10,249,476
- Issue date Apr 2, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of impedance of RF delivery path
- Patent number 10,157,730
- Issue date Dec 18, 2018
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for real-time monitoring of plasma chamber wal...
- Patent number 10,134,569
- Issue date Nov 20, 2018
- Lam Research Corporation
- Luc Albarede
- G02 - OPTICS
Information Patent Grant
Method and apparatus for determining process rate
- Patent number 9,735,069
- Issue date Aug 15, 2017
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching systems and methods using empirical mode decomposition
- Patent number 9,548,189
- Issue date Jan 17, 2017
- Lam Research Corporation
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of impedance of RF delivery path
- Patent number 9,401,264
- Issue date Jul 26, 2016
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of impedance of RF return path
- Patent number 9,337,000
- Issue date May 10, 2016
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber matching for power control mode
- Patent number 9,119,283
- Issue date Aug 25, 2015
- Lam Research Corporation
- Luc Albarede
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Chamber matching using voltage control mode
- Patent number 9,107,284
- Issue date Aug 11, 2015
- Lam Research Corporation
- Luc Albarede
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma unconfinement sensor and methods thereof
- Patent number 8,894,804
- Issue date Nov 25, 2014
- Lam Research Corporation
- Jean-Paul Booth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arrangement for identifying uncontrolled events at the process modu...
- Patent number 8,618,807
- Issue date Dec 31, 2013
- Lam Research Corporation
- Luc Albarede
- G05 - CONTROLLING REGULATING
Information Patent Grant
Methods and apparatus for predictive preventive maintenance of proc...
- Patent number 8,473,089
- Issue date Jun 25, 2013
- Lam Research Corporation
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF-biased capacitively-coupled electrostatic (RFB-CCE) probe arrang...
- Patent number 8,164,353
- Issue date Apr 24, 2012
- Lam Research Corporation
- Jean-Paul Booth
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Reference Box for Direct-Drive Radiofrequency Power Supply
- Publication number 20240404804
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION OF RF PULSING SCHEMES AND OF SENSOR DATA COLLECTION
- Publication number 20230230805
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- John Stephen Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS WITH OPTICAL CAVITY FOR DETERMINING PROCESS RATE
- Publication number 20210142991
- Publication date May 13, 2021
- LAM RESEARCH CORPORATION
- Jagadeeshwari MANNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINT SENSOR BASED CONTROL INCLUDING ADJUSTMENT OF AN EDGE RING...
- Publication number 20200185194
- Publication date Jun 11, 2020
- LAM RESEARCH CORPORATION
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS WITH OPTICAL CAVITY FOR DETERMINING PROCESS RATE
- Publication number 20190362950
- Publication date Nov 28, 2019
- LAM RESEARCH CORPORATION
- Jagadeeshwari MANNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING PROCESS PARAMETERS
- Publication number 20190115267
- Publication date Apr 18, 2019
- LAM RESEARCH CORPORATION
- Yassine KABOUZI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS EXHAUST BY-PRODUCT MEASUREMENT SYSTEM
- Publication number 20190064057
- Publication date Feb 28, 2019
- LAM RESEARCH CORPORATION
- Cristian SILADIE
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING PROCESS RATE
- Publication number 20170338160
- Publication date Nov 23, 2017
- LAM RESEARCH CORPORATION
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR DETERMINING PROCESS RATE
- Publication number 20170084426
- Publication date Mar 23, 2017
- LAM RESEARCH CORPORATION
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING PROCESS RATE
- Publication number 20170084503
- Publication date Mar 23, 2017
- LAM RESEARCH CORPORATION
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEMS AND METHODS USING EMPIRICAL MODE DECOMPOSITION
- Publication number 20170084433
- Publication date Mar 23, 2017
- LAM RESEARCH CORPORATION
- LUC ALBAREDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEMS AND METHODS USING EMPIRICAL MODE DECOMPOSITION
- Publication number 20160314943
- Publication date Oct 27, 2016
- LAM RESEARCH CORPORATION
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF IMPEDANCE OF RF DELIVERY PATH
- Publication number 20160307738
- Publication date Oct 20, 2016
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control of Impedance of RF Return Path
- Publication number 20160233058
- Publication date Aug 11, 2016
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control of Impedance of RF Delivery Path
- Publication number 20150091441
- Publication date Apr 2, 2015
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control of Impedance of RF Return Path
- Publication number 20150091440
- Publication date Apr 2, 2015
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chamber Matching Using Voltage Control Mode
- Publication number 20140265833
- Publication date Sep 18, 2014
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chamber Matching For Power Control Mode
- Publication number 20140265851
- Publication date Sep 18, 2014
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNCONFINEMENT SENSOR AND METHODS THEREOF
- Publication number 20110128017
- Publication date Jun 2, 2011
- Jean-Paul Booth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARRANGEMENT FOR IDENTIFYING UNCONTROLLED EVENTS AT THE PROCESS MODU...
- Publication number 20100332014
- Publication date Dec 30, 2010
- Luc Albarede
- G05 - CONTROLLING REGULATING
Information Patent Application
METHODS AND APPARATUS FOR PREDICTIVE PREVENTIVE MAINTENANCE OF PROC...
- Publication number 20100332201
- Publication date Dec 30, 2010
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF-BIASED CAPACITIVELY-COUPLED ELECTROSTATIC (RFB-CCE) PROBE ARRANG...
- Publication number 20100007362
- Publication date Jan 14, 2010
- Jean-Paul Booth
- H01 - BASIC ELECTRIC ELEMENTS

Luc Albarede

Person

Patents Grantslast 30 patents

Method and apparatus for determining process rate

Apparatus with optical cavity for determining process rate

Endpoint sensor based control including adjustment of an edge ring...

Method and apparatus for determining etch process parameters

Plasma etching systems and methods using empirical mode decomposition

Gas exhaust by-product measurement system

Control of impedance of RF return path

Control of impedance of RF delivery path

Method and apparatus for real-time monitoring of plasma chamber wal...

Method and apparatus for determining process rate

Plasma etching systems and methods using empirical mode decomposition

Control of impedance of RF delivery path

Control of impedance of RF return path

Chamber matching for power control mode

Chamber matching using voltage control mode

Plasma unconfinement sensor and methods thereof

Arrangement for identifying uncontrolled events at the process modu...

Methods and apparatus for predictive preventive maintenance of proc...

RF-biased capacitively-coupled electrostatic (RFB-CCE) probe arrang...

Patents Applicationslast 30 patents

Reference Box for Direct-Drive Radiofrequency Power Supply

SYNCHRONIZATION OF RF PULSING SCHEMES AND OF SENSOR DATA COLLECTION

APPARATUS WITH OPTICAL CAVITY FOR DETERMINING PROCESS RATE

ENDPOINT SENSOR BASED CONTROL INCLUDING ADJUSTMENT OF AN EDGE RING...

APPARATUS WITH OPTICAL CAVITY FOR DETERMINING PROCESS RATE

METHOD AND APPARATUS FOR DETERMINING PROCESS PARAMETERS

GAS EXHAUST BY-PRODUCT MEASUREMENT SYSTEM

METHOD AND APPARATUS FOR DETERMINING PROCESS RATE

APPARATUS FOR DETERMINING PROCESS RATE

METHOD AND APPARATUS FOR DETERMINING PROCESS RATE

PLASMA ETCHING SYSTEMS AND METHODS USING EMPIRICAL MODE DECOMPOSITION

PLASMA ETCHING SYSTEMS AND METHODS USING EMPIRICAL MODE DECOMPOSITION

CONTROL OF IMPEDANCE OF RF DELIVERY PATH

Control of Impedance of RF Return Path

Control of Impedance of RF Delivery Path

Control of Impedance of RF Return Path

Chamber Matching Using Voltage Control Mode

Chamber Matching For Power Control Mode

PLASMA UNCONFINEMENT SENSOR AND METHODS THEREOF

ARRANGEMENT FOR IDENTIFYING UNCONTROLLED EVENTS AT THE PROCESS MODU...

METHODS AND APPARATUS FOR PREDICTIVE PREVENTIVE MAINTENANCE OF PROC...

RF-BIASED CAPACITIVELY-COUPLED ELECTROSTATIC (RFB-CCE) PROBE ARRANG...