Lucas Henricus Johannes Stevens

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus and a device manufacturing method
- Patent number 11,269,259
- Issue date Mar 8, 2022
- ASML Netherlands B.V.
- Thomas Poiesz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System, a lithographic apparatus, and a method for reducing oxidati...
- Patent number 11,086,238
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Lucas Henricus Johannes Stevens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus and a device manufacturing method
- Patent number 10,871,715
- Issue date Dec 22, 2020
- ASML Netherlands B.V.
- Thomas Poiesz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graphene spectral purity filter
- Patent number 10,481,510
- Issue date Nov 19, 2019
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pellicle for reticle and multilayer mirror
- Patent number 9,989,844
- Issue date Jun 5, 2018
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus, programmable patterning device and lithogra...
- Patent number 9,645,502
- Issue date May 9, 2017
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for reticle and multilayer mirror
- Patent number 9,482,960
- Issue date Nov 1, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus and method
- Patent number 9,395,630
- Issue date Jul 19, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Inspection apparatus and method
- Patent number 9,304,077
- Issue date Apr 5, 2016
- ASML Netherlands B.V.
- Lucas Henricus Johannes Stevens
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus and contamination detection method
- Patent number 8,547,551
- Issue date Oct 1, 2013
- ASML Netherlands B.V.
- Anastasius Jacobus Anicetus Bruinsma
- G01 - MEASURING TESTING
Information Patent Grant
System and method for detecting at least one contamination species...
- Patent number 8,445,873
- Issue date May 21, 2013
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
- Publication number 20210072649
- Publication date Mar 11, 2021
- ASML NETHERLANDS B.V.
- Thomas Poiesz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
- Publication number 20200183289
- Publication date Jun 11, 2020
- ASML NETHERLANDS B.V.
- Thomas POIESZ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A SYSTEM, A LITHOGRAPHIC APPARATUS, AND A METHOD FOR REDUCING OXIDA...
- Publication number 20200150549
- Publication date May 14, 2020
- ASML NETHERLANDS B.V.
- Lucas Henricus Johannes STEVENS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR RETICLE AND MULTILAYER MIRROR
- Publication number 20180259846
- Publication date Sep 13, 2018
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
PELLICLE FOR RETICLE AND MULTILAYER MIRROR
- Publication number 20170017150
- Publication date Jan 19, 2017
- ASML Netherlands B.V.
- Andrei Mikhailovich YAKUNIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...
- Publication number 20140160452
- Publication date Jun 12, 2014
- ASML NETHERLANDS B.V.
- Pieter Willem Herman De Jager
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
PELLICLE FOR RETICLE AND MULTILAYER MIRROR
- Publication number 20140160455
- Publication date Jun 12, 2014
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich YAKUNIN
- B82 - NANO-TECHNOLOGY
Information Patent Application
LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...
- Publication number 20140071421
- Publication date Mar 13, 2014
- ASML NETHERLANDS B.V.
- Pieter Willem Herman De Jager
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20130088699
- Publication date Apr 11, 2013
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic apparatus having a monitoring device for detecting con...
- Publication number 20070138414
- Publication date Jun 21, 2007
- ASML NETHERLANDS B.V.
- Lucas Henricus Johannes Stevens
- G01 - MEASURING TESTING
Information Patent Application
System and method for detecting at least one contamination species...
- Publication number 20070140910
- Publication date Jun 21, 2007
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus and radiation source comprising a debris-mit...
- Publication number 20050139785
- Publication date Jun 30, 2005
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and device for measuring contamination of a surface of a com...
- Publication number 20040227102
- Publication date Nov 18, 2004
- ASML NETHERLANDS B.V.
- Ralph Kurt
- G01 - MEASURING TESTING
Information Patent Application
Radiation source, lithographic apparatus and device manufacturing m...
- Publication number 20040105082
- Publication date Jun 3, 2004
- ASML NETHERLANDS B.V.
- Konstantin Nikolaevitch Koshelev
- F28 - HEAT EXCHANGE IN GENERAL

Lucas Henricus Johannes Stevens

Person

Patents Grantslast 30 patents

Lithographic apparatus and a device manufacturing method

System, a lithographic apparatus, and a method for reducing oxidati...

Lithographic apparatus and a device manufacturing method

Graphene spectral purity filter

Pellicle for reticle and multilayer mirror

Lithographic apparatus, programmable patterning device and lithogra...

Pellicle for reticle and multilayer mirror

Lithographic apparatus and method

Inspection apparatus and method

Lithographic apparatus and contamination detection method

System and method for detecting at least one contamination species...

Patents Applicationslast 30 patents

LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

A SYSTEM, A LITHOGRAPHIC APPARATUS, AND A METHOD FOR REDUCING OXIDA...

PELLICLE FOR RETICLE AND MULTILAYER MIRROR

PELLICLE FOR RETICLE AND MULTILAYER MIRROR

LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...

PELLICLE FOR RETICLE AND MULTILAYER MIRROR

LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...

LITHOGRAPHIC APPARATUS AND METHOD

Lithographic apparatus having a monitoring device for detecting con...

System and method for detecting at least one contamination species...

Lithographic apparatus and radiation source comprising a debris-mit...

Method and device for measuring contamination of a surface of a com...

Radiation source, lithographic apparatus and device manufacturing m...