Luciana Meli

Person

Albany, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Alternating copolymer chain scission photoresists
- Patent number 11,906,901
- Issue date Feb 20, 2024
- International Business Machines Corporation
- Dario Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using E0 exposures for track/cluster monitoring
- Patent number 11,561,481
- Issue date Jan 24, 2023
- International Business Machines Corporation
- Cody J. Murray
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography process delay characterization and effective dose compe...
- Patent number 11,194,254
- Issue date Dec 7, 2021
- International Business Machines Corporation
- Christopher Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sequential infiltration synthesis extreme ultraviolet single expose...
- Patent number 10,998,192
- Issue date May 4, 2021
- International Business Machines Corporation
- Ekmini Anuja De Silva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical field-effect-transistors having a silicon oxide layer with...
- Patent number 10,707,326
- Issue date Jul 7, 2020
- International Business Machines Corporation
- Chi-Chun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Care area generation by detection optimized methodology
- Patent number 10,437,951
- Issue date Oct 8, 2019
- International Business Machines Corporation
- Ravi K. Bonam
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Vertical field-effect-transistors having a silicon oxide layer with...
- Patent number 10,256,320
- Issue date Apr 9, 2019
- International Business Machines Corporation
- Chi-Chun Liu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MAKING EUV MASK WITH AN ABSORBER LAYER
- Publication number 20230280644
- Publication date Sep 7, 2023
- International Business Machines Corporation
- Dario Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALTERNATING COPOLYMER CHAIN SCISSION PHOTORESISTS
- Publication number 20220390845
- Publication date Dec 8, 2022
- International Business Machines Corporation
- Dario Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Using E0 Exposures for Track/Cluster Monitoring
- Publication number 20220019139
- Publication date Jan 20, 2022
- International Business Machines Corporation
- Cody J. Murray
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Lithography Process Delay Characterization and Effective Dose Compe...
- Publication number 20210132502
- Publication date May 6, 2021
- International Business Machines Corporation
- Christopher Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEQUENTIAL INFILTRATION SYNTHESIS EXTREME ULTRAVIOLET SINGLE EXPOSE...
- Publication number 20210082697
- Publication date Mar 18, 2021
- International Business Machines Corporation
- Ekmini Anuja De Silva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICAL FIELD-EFFECT-TRANSISTORS HAVING A SILICON OXIDE LAYER WITH...
- Publication number 20190189775
- Publication date Jun 20, 2019
- International Business Machines Corporation
- Chi-Chun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICAL FIELD-EFFECT-TRANSISTORS HAVING A SILICON OXIDE LAYER WITH...
- Publication number 20190109212
- Publication date Apr 11, 2019
- International Business Machines Corporation
- Chi-Chun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Care Area Generation By Detection Optimized Methodology
- Publication number 20190065634
- Publication date Feb 28, 2019
- International Business Machines Corporation
- Ravi K. Bonam
- G06 - COMPUTING CALCULATING COUNTING

Luciana Meli

Person

Patents Grantslast 30 patents

Alternating copolymer chain scission photoresists

Using E0 exposures for track/cluster monitoring

Lithography process delay characterization and effective dose compe...

Sequential infiltration synthesis extreme ultraviolet single expose...

Vertical field-effect-transistors having a silicon oxide layer with...

Care area generation by detection optimized methodology

Vertical field-effect-transistors having a silicon oxide layer with...

Patents Applicationslast 30 patents

METHOD OF MAKING EUV MASK WITH AN ABSORBER LAYER

ALTERNATING COPOLYMER CHAIN SCISSION PHOTORESISTS

Using E0 Exposures for Track/Cluster Monitoring

Lithography Process Delay Characterization and Effective Dose Compe...

SEQUENTIAL INFILTRATION SYNTHESIS EXTREME ULTRAVIOLET SINGLE EXPOSE...

VERTICAL FIELD-EFFECT-TRANSISTORS HAVING A SILICON OXIDE LAYER WITH...

VERTICAL FIELD-EFFECT-TRANSISTORS HAVING A SILICON OXIDE LAYER WITH...

Care Area Generation By Detection Optimized Methodology