Luisa BOZANO

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Protective enclosure for gas sensors
- Patent number 12,099,043
- Issue date Sep 24, 2024
- International Business Machines Corporation
- Thomas Geoffrey Pattison
- G01 - MEASURING TESTING
Information Patent Grant
Volatile organic compound detection and classification
- Patent number 11,694,770
- Issue date Jul 4, 2023
- International Business Machines Corporation
- Vito Paolo Pastore
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Protective enclosure for gas sensors
- Patent number 11,624,740
- Issue date Apr 11, 2023
- International Business Machines Corporation
- Thomas Geoffrey Pattison
- G01 - MEASURING TESTING
Information Patent Grant
Sensor tuning—sensor specific selection for IoT—electronic nose app...
- Patent number 11,619,618
- Issue date Apr 4, 2023
- International Business Machines Corporation
- Mohammed Abdi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multifunctional polymers
- Patent number 11,500,285
- Issue date Nov 15, 2022
- International Business Machines Corporation
- Luisa D. Bozano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Feature tuning—application dependent feature type selection for imp...
- Patent number 11,499,953
- Issue date Nov 15, 2022
- International Business Machines Corporation
- Aminat Adebiyi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Adsorption/desorption-based sensor for volatile organic compounds (...
- Patent number 11,221,318
- Issue date Jan 11, 2022
- International Business Machines Corporation
- Siddhartha Das
- G01 - MEASURING TESTING
Information Patent Grant
Negative-tone resist compositions and multifunctional polymers therein
- Patent number 10,345,700
- Issue date Jul 9, 2019
- International Business Machines Corporation
- Luisa D. Bozano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Porous tin oxide films
- Patent number 10,236,184
- Issue date Mar 19, 2019
- International Business Machines Corporation
- Amy N. Bowers
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Porous tin oxide films
- Patent number 10,020,199
- Issue date Jul 10, 2018
- International Business Machines Corporation
- Amy N. Bowers
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Resist performance for the negative tone develop organic developmen...
- Patent number 9,389,516
- Issue date Jul 12, 2016
- International Business Machines Corporation
- Luisa D. Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified negative resist composition and pattern formin...
- Patent number 9,244,348
- Issue date Jan 26, 2016
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist performance for the negative tone develop organic developmen...
- Patent number 9,057,960
- Issue date Jun 16, 2015
- International Business Machines Corporation
- Luisa D. Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive tone organic solvent developed chemically amplified resist
- Patent number 8,900,802
- Issue date Dec 2, 2014
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Water-dispersible electrically conductive fluorine-containing polya...
- Patent number 8,802,351
- Issue date Aug 12, 2014
- International Business Machines Corporation
- Luisa Dominica Bozano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluoroalcohol containing molecular photoresist materials and proces...
- Patent number 8,530,136
- Issue date Sep 10, 2013
- International Business Machines Corporation
- Luisa D. Bozano
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming a relief pattern by e-beam lithography using chem...
- Patent number 8,470,516
- Issue date Jun 25, 2013
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified silsesquioxane resist compositions
- Patent number 8,426,113
- Issue date Apr 23, 2013
- International Business Machines Corporation
- Luisa Dominica Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calixarene blended molecular glass photoresists and processes of use
- Patent number 7,993,812
- Issue date Aug 9, 2011
- International Business Machines Corporation
- Luisa D. Bozano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Memory device and method of making the same
- Patent number 7,151,029
- Issue date Dec 19, 2006
- International Business Machines Corporation
- Luisa Dominica Bozano
- G11 - INFORMATION STORAGE
Information Patent Grant
Non-volatile multi-stable memory device and methods of making and u...
- Patent number 6,987,689
- Issue date Jan 17, 2006
- International Business Machines Corporation
- Luisa Dominica Bozano
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
DESIGN, CONTROL, AND OPTIMIZATION OF PHOTOSENSITIVITY MODULATION AL...
- Publication number 20240194484
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- RUIYING HAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINGERPRINTING AND PROCESS CONTROL OF PHOTOSENSITIVE FILM DEPOSITIO...
- Publication number 20240027916
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- RUIYING HAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO OPTIMIZE POST DEPOSITION BAKING CONDITION OF PHOTO RESIST...
- Publication number 20240012325
- Publication date Jan 11, 2024
- Applied Materials, Inc.
- LUISA BOZANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARACTERIZATION OF PHOTOSENSITIVE MATERIALS
- Publication number 20230259035
- Publication date Aug 17, 2023
- Applied Materials, Inc.
- Paola DE CECCO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROTECTIVE ENCLOSURE FOR GAS SENSORS
- Publication number 20230122407
- Publication date Apr 20, 2023
- International Business Machines Corporation
- Thomas Geoffrey Pattison
- G01 - MEASURING TESTING
Information Patent Application
CHEMICAL SENSOR UTILIZING ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY
- Publication number 20220390401
- Publication date Dec 8, 2022
- International Business Machines Corporation
- Tim Erdmann
- G01 - MEASURING TESTING
Information Patent Application
DUAL TONE PHOTORESISTS
- Publication number 20220342302
- Publication date Oct 27, 2022
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VOLATILE ORGANIC COMPOUND DETECTION AND CLASSIFICATION
- Publication number 20220130491
- Publication date Apr 28, 2022
- International Business Machines Corporation
- Vito Paolo Pastore
Information Patent Application
PROTECTIVE ENCLOSURE FOR GAS SENSORS
- Publication number 20220018822
- Publication date Jan 20, 2022
- International Business Machines Corporation
- Thomas Geoffrey Pattison
- G01 - MEASURING TESTING
Information Patent Application
SENSOR TUNING - SENSOR SPECIFIC SELECTION FOR IoT-ELECTRONIC NOSE A...
- Publication number 20210172918
- Publication date Jun 10, 2021
- International Business Machines Corporation
- Mohammed Abdi
- G01 - MEASURING TESTING
Information Patent Application
FEATURE TUNING - APPLICATION DEPENDENT FEATURE TYPE SELECTION FOR I...
- Publication number 20210172919
- Publication date Jun 10, 2021
- International Business Machines Corporation
- Aminat Adebiyi
- G01 - MEASURING TESTING
Information Patent Application
ADSORPTION/DESORPTION-BASED SENSOR FOR VOLATILE ORGANIC COMPOUNDS (...
- Publication number 20210025861
- Publication date Jan 28, 2021
- International Business Machines Corporation
- Siddhartha Das
- G01 - MEASURING TESTING
Information Patent Application
MULTIFUNCTIONAL POLYMERS
- Publication number 20200278607
- Publication date Sep 3, 2020
- International Business Machines Corporation
- Luisa D. Bozano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POROUS TIN OXIDE FILMS
- Publication number 20180330955
- Publication date Nov 15, 2018
- International Business Machines Corporation
- Amy N. Bowers
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
NEGATIVE-TONE RESIST COMPOSITIONS AND MULTIFUNCTIONAL POLYMERS THEREIN
- Publication number 20160070169
- Publication date Mar 10, 2016
- SHIN-ETSU CHEMICAL CO., LTD.
- Luisa D. Bozano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PERFORMANCE FOR THE NEGATIVE TONE DEVELOP ORGANIC DEVELOPMEN...
- Publication number 20150309415
- Publication date Oct 29, 2015
- International Business Machines Corporation
- LUISA D. BOZANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TONE ORGANIC SOLVENT DEVELOPED CHEMICALLY AMPLIFIED RESIST
- Publication number 20140242526
- Publication date Aug 28, 2014
- JSR Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Performance for the Negative Tone Develop Organic Developmen...
- Publication number 20140220495
- Publication date Aug 7, 2014
- International Business Machines Corporation
- Luisa D. Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WATER-DISPERSIBLE ELECTRICALLY CONDUCTIVE FLUORINE-CONTAINING POLYA...
- Publication number 20140038104
- Publication date Feb 6, 2014
- Shin-Etsu Chemical Co., Ltd.
- Luisa Dominica Bozano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERN FORMIN...
- Publication number 20130209922
- Publication date Aug 15, 2013
- Keiichi MASUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluoroalcohol Containing Molecular Photoresist Materials and Proces...
- Publication number 20120156611
- Publication date Jun 21, 2012
- International Business Machines Corporation
- Luisa D. Bozano
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED SILSESQUIOXANE RESIST COMPOSITIONS
- Publication number 20120040289
- Publication date Feb 16, 2012
- International Business Machines Corporation
- Luisa Dominica Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Forming a Relief Pattern by E-Beam Lithography Using Chem...
- Publication number 20110045387
- Publication date Feb 24, 2011
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calixarene Blended Molecular Glass Photoresists and Processes of Use
- Publication number 20110020756
- Publication date Jan 27, 2011
- International Business Machines Corporation
- Luisa D. Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Memory device and method of making the same
- Publication number 20050237834
- Publication date Oct 27, 2005
- Luisa Dominica Bozano
- G11 - INFORMATION STORAGE
Information Patent Application
Non-volatile multi-stable memory device and methods of making and u...
- Publication number 20050040455
- Publication date Feb 24, 2005
- International Business Machines Corporation
- Luisa Dominica Bozano
- G11 - INFORMATION STORAGE

Luisa BOZANO

Person

Patents Grantslast 30 patents

Protective enclosure for gas sensors

Volatile organic compound detection and classification

Protective enclosure for gas sensors

Sensor tuning—sensor specific selection for IoT—electronic nose app...

Multifunctional polymers

Feature tuning—application dependent feature type selection for imp...

Adsorption/desorption-based sensor for volatile organic compounds (...

Negative-tone resist compositions and multifunctional polymers therein

Porous tin oxide films

Porous tin oxide films

Resist performance for the negative tone develop organic developmen...

Chemically amplified negative resist composition and pattern formin...

Resist performance for the negative tone develop organic developmen...

Positive tone organic solvent developed chemically amplified resist

Water-dispersible electrically conductive fluorine-containing polya...

Fluoroalcohol containing molecular photoresist materials and proces...

Method of forming a relief pattern by e-beam lithography using chem...

Chemically amplified silsesquioxane resist compositions

Calixarene blended molecular glass photoresists and processes of use

Memory device and method of making the same

Non-volatile multi-stable memory device and methods of making and u...

Patents Applicationslast 30 patents

DESIGN, CONTROL, AND OPTIMIZATION OF PHOTOSENSITIVITY MODULATION AL...

FINGERPRINTING AND PROCESS CONTROL OF PHOTOSENSITIVE FILM DEPOSITIO...

METHOD TO OPTIMIZE POST DEPOSITION BAKING CONDITION OF PHOTO RESIST...

CHARACTERIZATION OF PHOTOSENSITIVE MATERIALS

PROTECTIVE ENCLOSURE FOR GAS SENSORS

CHEMICAL SENSOR UTILIZING ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY

DUAL TONE PHOTORESISTS

VOLATILE ORGANIC COMPOUND DETECTION AND CLASSIFICATION

PROTECTIVE ENCLOSURE FOR GAS SENSORS

SENSOR TUNING - SENSOR SPECIFIC SELECTION FOR IoT-ELECTRONIC NOSE A...

FEATURE TUNING - APPLICATION DEPENDENT FEATURE TYPE SELECTION FOR I...

ADSORPTION/DESORPTION-BASED SENSOR FOR VOLATILE ORGANIC COMPOUNDS (...

MULTIFUNCTIONAL POLYMERS

POROUS TIN OXIDE FILMS

NEGATIVE-TONE RESIST COMPOSITIONS AND MULTIFUNCTIONAL POLYMERS THEREIN

RESIST PERFORMANCE FOR THE NEGATIVE TONE DEVELOP ORGANIC DEVELOPMEN...

POSITIVE TONE ORGANIC SOLVENT DEVELOPED CHEMICALLY AMPLIFIED RESIST

Resist Performance for the Negative Tone Develop Organic Developmen...

WATER-DISPERSIBLE ELECTRICALLY CONDUCTIVE FLUORINE-CONTAINING POLYA...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERN FORMIN...

Fluoroalcohol Containing Molecular Photoresist Materials and Proces...

CHEMICALLY AMPLIFIED SILSESQUIOXANE RESIST COMPOSITIONS

Method of Forming a Relief Pattern by E-Beam Lithography Using Chem...

Calixarene Blended Molecular Glass Photoresists and Processes of Use

Memory device and method of making the same

Non-volatile multi-stable memory device and methods of making and u...