Luoqi CHEN

Person

Saratoga, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Three-dimensional mask model for photolithography simulation
- Patent number 11,461,532
- Issue date Oct 4, 2022
- ASML Netherlands B.V.
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Fast freeform source and mask co-optimization method
- Patent number 11,042,687
- Issue date Jun 22, 2021
- ASML Netherlands B.V.
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Three-dimensional mask model for photolithography simulation
- Patent number 10,839,131
- Issue date Nov 17, 2020
- ASML Netherlands B.V.
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Fast freeform source and mask co-optimization method
- Patent number 10,592,633
- Issue date Mar 17, 2020
- ASML Netherlands B.V.
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Computation pipeline of single-pass multiple variant calls
- Patent number 10,424,395
- Issue date Sep 24, 2019
- Jun Ye
Information Patent Grant
Computation pipeline of location-dependent variant calls
- Patent number 10,424,396
- Issue date Sep 24, 2019
- Jun Ye
Information Patent Grant
Correction for flare effects in lithography system
- Patent number 10,423,745
- Issue date Sep 24, 2019
- ASML Netherlands B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimization flows of source, mask and projection optics
- Patent number 10,401,732
- Issue date Sep 3, 2019
- ASML Netherlands B.V.
- Duan-Fu Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Three-dimensional mask model for photolithography simulation
- Patent number 10,198,549
- Issue date Feb 5, 2019
- ASML Netherlands B.V.
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Fast freeform source and mask co-optimization method
- Patent number 9,953,127
- Issue date Apr 24, 2018
- ASML Netherlands B.V.
- Luoqi Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization flows of source, mask and projection optics
- Patent number 9,588,438
- Issue date Mar 7, 2017
- ASML Netherlands B.V.
- Duan-Fu Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Three-dimensional mask model for photolithography simulation
- Patent number 9,372,957
- Issue date Jun 21, 2016
- ASML Netherlands B.V.
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Integration of lithography apparatus and mask optimization process...
- Patent number 9,262,579
- Issue date Feb 16, 2016
- ASML Netherlands B.V.
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Source polarization optimization
- Patent number 9,110,382
- Issue date Aug 18, 2015
- ASML Netherlands B.V.
- Luoqi Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fast freeform source and mask co-optimization method
- Patent number 9,111,062
- Issue date Aug 18, 2015
- ASML Netherlands B.V.
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Harmonic resist model for use in a lithographic apparatus and a dev...
- Patent number 8,942,463
- Issue date Jan 27, 2015
- ASML Netherlands B.V.
- Yu Cao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Three-dimensional mask model for photolithography simulation
- Patent number 8,938,694
- Issue date Jan 20, 2015
- ASML Netherlands B.V.
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for lithography simulation
- Patent number 8,893,067
- Issue date Nov 18, 2014
- ASML Netherlands B.V.
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Correction for flare effects in lithography system
- Patent number 8,887,104
- Issue date Nov 11, 2014
- ASML Netherlands B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Integration of lithography apparatus and mask optimization process...
- Patent number 8,819,601
- Issue date Aug 26, 2014
- ASML Netherlands B.V.
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of pattern selection for source and mask optimization
- Patent number 8,739,082
- Issue date May 27, 2014
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Harmonic resist model for use in a lithographic apparatus and a dev...
- Patent number 8,682,059
- Issue date Mar 25, 2014
- ASML Netherlands B.V.
- Yu Cao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Three-dimensional mask model for photolithography simulation
- Patent number 8,589,829
- Issue date Nov 19, 2013
- ASML Netherlands B.V.
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Fast freeform source and mask co-optimization method
- Patent number 8,584,056
- Issue date Nov 12, 2013
- ASML Netherlands B.V.
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Selection of optimum patterns in a design layout based on diffracti...
- Patent number 8,543,947
- Issue date Sep 24, 2013
- ASML Netherlands B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for lithography simulation
- Patent number 8,516,405
- Issue date Aug 20, 2013
- ASML Netherlands B.V.
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Harmonic resist model for use in a lithographic apparatus and a dev...
- Patent number 8,447,095
- Issue date May 21, 2013
- ASML Netherlands B.V.
- Yu Cao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Three-dimensional mask model for photolithography simulation
- Patent number 8,352,885
- Issue date Jan 8, 2013
- ASML Netherlands B.V.
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for creating a focus-exposure model of a lithogra...
- Patent number 8,245,160
- Issue date Aug 14, 2012
- ASML Netherlands B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for lithography simulation
- Patent number 8,209,640
- Issue date Jun 26, 2012
- ASML Netherlands B.V.
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION
- Publication number 20210064811
- Publication date Mar 4, 2021
- ASML NETHERLANDS B.V.
- Peng LIU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD
- Publication number 20200218850
- Publication date Jul 9, 2020
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION
- Publication number 20190163866
- Publication date May 30, 2019
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD
- Publication number 20180239861
- Publication date Aug 23, 2018
- ASML NETHERLANDS B.V.
- Luoqi CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZATION FLOWS OF SOURCE, MASK AND PROJECTION OPTICS
- Publication number 20170176864
- Publication date Jun 22, 2017
- ASML NETHERLANDS B.V.
- Duan-Fu HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION
- Publication number 20160357900
- Publication date Dec 8, 2016
- ASML NETHERLANDS B.V.
- Peng LIU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPUTATION PIPELINE OF LOCATION-DEPENDENT VARIANT CALLS
- Publication number 20160283655
- Publication date Sep 29, 2016
- Sentieon Inc.
- Jun Ye
- C40 - COMBINATORIAL CHEMISTRY
Information Patent Application
COMPUTATION PIPELINE OF SINGLE-PASS MULTIPLE VARIANT CALLS
- Publication number 20160283654
- Publication date Sep 29, 2016
- Sentieon Inc.
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD
- Publication number 20150356234
- Publication date Dec 10, 2015
- ASML NETHERLANDS B.V.
- Luoqi CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION
- Publication number 20150135146
- Publication date May 14, 2015
- ASML NETHERLANDS B.V.
- Peng LIU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM
- Publication number 20150058815
- Publication date Feb 26, 2015
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INTEGRATION OF LITHOGRAPHY APPARATUS AND MASK OPTIMIZATION PROCESS...
- Publication number 20140365983
- Publication date Dec 11, 2014
- ASML NETHERLANDS B.V.
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
HARMONIC RESIST MODEL FOR USE IN A LITHOGRAPHIC APPARATUS AND A DEV...
- Publication number 20140198972
- Publication date Jul 17, 2014
- ASML NETHERLANDS B.V.
- Yu CAO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION
- Publication number 20140195993
- Publication date Jul 10, 2014
- ASML NETHERLANDS B.V.
- Peng LIU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD
- Publication number 20140068530
- Publication date Mar 6, 2014
- ASML NETHERLANDS B.V.
- Luoqi CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CONTENT-BASED TARGETED ONLINE ADVERTISEMENT
- Publication number 20140012671
- Publication date Jan 9, 2014
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CONTENT-BASED BIDDING IN ONLINE ADVERTISING
- Publication number 20140012672
- Publication date Jan 9, 2014
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
HARMONIC RESIST MODEL FOR USE IN A LITHOGRAPHIC APPARATUS AND A DEV...
- Publication number 20130251237
- Publication date Sep 26, 2013
- ASML NETHERLANDS B.V.
- Yu CAO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM
- Publication number 20130185681
- Publication date Jul 18, 2013
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION
- Publication number 20130139118
- Publication date May 30, 2013
- ASML NETHERLANDS B.V.
- Peng LIU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SENTIMENT-TARGETING FOR ONLINE ADVERTISEMENT
- Publication number 20130066716
- Publication date Mar 14, 2013
- Founton Technologies, Ltd.
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF ATTENTION-TARGETING FOR ONLINE ADVERTISEMENT
- Publication number 20130041750
- Publication date Feb 14, 2013
- Founton Technologies, Ltd.
- Jun YE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Integration of Lithography Apparatus and Mask Optimization Process...
- Publication number 20120254813
- Publication date Oct 4, 2012
- ASML NETHERLANDS B.V.
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of Pattern Selection for Source and Mask Optimization
- Publication number 20120216156
- Publication date Aug 23, 2012
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Optimization Flows of Source, Mask and Projection Optics
- Publication number 20120113404
- Publication date May 10, 2012
- ASML NETHERLANDS B.V.
- Duan-Fu Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Source Polarization Optimization
- Publication number 20120075605
- Publication date Mar 29, 2012
- ASML NETHERLANDS B.V.
- Luoqi Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Creating a Focus-Exposure Model of a Lithogra...
- Publication number 20120017183
- Publication date Jan 19, 2012
- ASML NETHERLANDS B.V.
- Jun YE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fast Freeform Source and Mask Co-Optimization Method
- Publication number 20110230999
- Publication date Sep 22, 2011
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Selection of Optimum Patterns in a Design Layout Based on Diffracti...
- Publication number 20110107280
- Publication date May 5, 2011
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and Method for Lithography Simulation
- Publication number 20110083113
- Publication date Apr 7, 2011
- ASML NETHERLANDS B.V.
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING

Person

Patents Grantslast 30 patents

Three-dimensional mask model for photolithography simulation

Fast freeform source and mask co-optimization method

Three-dimensional mask model for photolithography simulation

Fast freeform source and mask co-optimization method

Computation pipeline of single-pass multiple variant calls

Computation pipeline of location-dependent variant calls

Correction for flare effects in lithography system

Optimization flows of source, mask and projection optics

Three-dimensional mask model for photolithography simulation

Fast freeform source and mask co-optimization method

Optimization flows of source, mask and projection optics

Three-dimensional mask model for photolithography simulation

Integration of lithography apparatus and mask optimization process...

Source polarization optimization

Fast freeform source and mask co-optimization method

Harmonic resist model for use in a lithographic apparatus and a dev...

Three-dimensional mask model for photolithography simulation

System and method for lithography simulation

Correction for flare effects in lithography system

Integration of lithography apparatus and mask optimization process...

Method of pattern selection for source and mask optimization

Harmonic resist model for use in a lithographic apparatus and a dev...

Three-dimensional mask model for photolithography simulation

Fast freeform source and mask co-optimization method

Selection of optimum patterns in a design layout based on diffracti...

System and method for lithography simulation

Harmonic resist model for use in a lithographic apparatus and a dev...

Three-dimensional mask model for photolithography simulation

System and method for creating a focus-exposure model of a lithogra...

System and method for lithography simulation

Patents Applicationslast 30 patents

THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION

FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD

THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION

FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD

OPTIMIZATION FLOWS OF SOURCE, MASK AND PROJECTION OPTICS

THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION

COMPUTATION PIPELINE OF LOCATION-DEPENDENT VARIANT CALLS

COMPUTATION PIPELINE OF SINGLE-PASS MULTIPLE VARIANT CALLS

FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD

THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION

CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM

INTEGRATION OF LITHOGRAPHY APPARATUS AND MASK OPTIMIZATION PROCESS...

HARMONIC RESIST MODEL FOR USE IN A LITHOGRAPHIC APPARATUS AND A DEV...

THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION

FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD

CONTENT-BASED TARGETED ONLINE ADVERTISEMENT

CONTENT-BASED BIDDING IN ONLINE ADVERTISING

HARMONIC RESIST MODEL FOR USE IN A LITHOGRAPHIC APPARATUS AND A DEV...

CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM

THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION

SENTIMENT-TARGETING FOR ONLINE ADVERTISEMENT

METHOD OF ATTENTION-TARGETING FOR ONLINE ADVERTISEMENT

Integration of Lithography Apparatus and Mask Optimization Process...

Method of Pattern Selection for Source and Mask Optimization

Optimization Flows of Source, Mask and Projection Optics

Source Polarization Optimization

System and Method for Creating a Focus-Exposure Model of a Lithogra...

Fast Freeform Source and Mask Co-Optimization Method

Selection of Optimum Patterns in a Design Layout Based on Diffracti...

System and Method for Lithography Simulation