Lutz Aschke

Person

Maintz, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Device for forming laser radiation
- Patent number 8,639,071
- Issue date Jan 28, 2014
- LIMO PatentverwaltungGmbH & Co. KG
- Lutz Aschke
- G02 - OPTICS
Information Patent Grant
Device and method for beam forming
- Patent number 8,416,500
- Issue date Apr 9, 2013
- Limo Patentverwaltung GmbH & Co. KG
- Thomas Mitra
- G02 - OPTICS
Information Patent Grant
Mask blank for use in EUV lithography and method for its production
- Patent number 7,517,617
- Issue date Apr 14, 2009
- Schott AG
- Lutz Aschke
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Substrate for the micro-lithography and process of manufacturing th...
- Patent number 7,279,252
- Issue date Oct 9, 2007
- Schott AG
- Lutz Aschke
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Substrates for in particular microlithography
- Patent number 7,129,010
- Issue date Oct 31, 2006
- Schott AG
- Jochen Alkemper
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflectometer arrangement and method for determining the reflectanc...
- Patent number 6,856,395
- Issue date Feb 15, 2005
- AIXUV GmbH
- Rainer Lebert
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
DEVICE AND METHOD FOR BEAM FORMING
- Publication number 20110157706
- Publication date Jun 30, 2011
- Limo Patentverwaltung GmbH & Co. KG
- Thomas Mitra
- G02 - OPTICS
Information Patent Application
Device for forming laser radiation
- Publication number 20110110626
- Publication date May 12, 2011
- Limo Patentverwaltung GmbH & Co. KG
- LUTZ ASCHKE
- G02 - OPTICS
Information Patent Application
Method of producing a mask blank for photolithographic applications...
- Publication number 20060115744
- Publication date Jun 1, 2006
- Lutz Aschke
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for manufacturing of a mask blank for EUV photolithography a...
- Publication number 20060008749
- Publication date Jan 12, 2006
- Frank Sobel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mask blank for use in EUV lithography and method for its production
- Publication number 20040234870
- Publication date Nov 25, 2004
- Lutz Aschke
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photo mask blank, photo mask, method and apparatus for manufacturin...
- Publication number 20040231971
- Publication date Nov 25, 2004
- Hans Becker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate for the micro-lithography and process of manufacturing th...
- Publication number 20040166420
- Publication date Aug 26, 2004
- Lutz Aschke
- B82 - NANO-TECHNOLOGY
Information Patent Application
Substrates for in particular microlithography
- Publication number 20040063004
- Publication date Apr 1, 2004
- Jochen Alkemper
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reflectometer arrangement and method for determining the reflectanc...
- Publication number 20020175690
- Publication date Nov 28, 2002
- Rainer Lebert
- G01 - MEASURING TESTING

Lutz Aschke

Person

Patents Grantslast 30 patents

Device for forming laser radiation

Device and method for beam forming

Mask blank for use in EUV lithography and method for its production

Substrate for the micro-lithography and process of manufacturing th...

Substrates for in particular microlithography

Reflectometer arrangement and method for determining the reflectanc...

Patents Applicationslast 30 patents

DEVICE AND METHOD FOR BEAM FORMING

Device for forming laser radiation

Method of producing a mask blank for photolithographic applications...

Method for manufacturing of a mask blank for EUV photolithography a...

Mask blank for use in EUV lithography and method for its production

Photo mask blank, photo mask, method and apparatus for manufacturin...

Substrate for the micro-lithography and process of manufacturing th...

Substrates for in particular microlithography

Reflectometer arrangement and method for determining the reflectanc...