Lydia Wong

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Singapore, SG

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Patents Grantslast 30 patents

Information Patent Grant
Method of fabricating a nitrogenated silicon oxide layer and MOS de...
- Patent number 7,928,020
- Issue date Apr 19, 2011
- Chartered Semiconductor Manufacturing Ltd.
- Jinping Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device with a strained channel
- Patent number 7,238,581
- Issue date Jul 3, 2007
- Chartered Semiconductor Manufacturing Ltd.
- King Jien Chui
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FABRICATING A NITROGENATED SILICON OXIDE LAYER AND MOS DE...
- Publication number 20090088002
- Publication date Apr 2, 2009
- Jinping Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing a semiconductor device with a strained channel
- Publication number 20060030094
- Publication date Feb 9, 2006
- Chartered Semiconductor Manufacturing LTD.
- King Jien Chui
- H01 - BASIC ELECTRIC ELEMENTS