Lynne M. Michaelson

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Capping layer formation onto a dual damescene interconnect
- Patent number 8,263,430
- Issue date Sep 11, 2012
- NXP B.V.
- Janos Farkas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device having a diffusion barrier...
- Patent number 7,422,979
- Issue date Sep 9, 2008
- FREESCALE SEMICONDUCTOR, INC.
- Lynne M. Michaelson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Barrier for use in 3-D integration of circuits
- Patent number 7,378,339
- Issue date May 27, 2008
- FREESCALE SEMICONDUCTOR, INC.
- Scott K. Pozder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a gate electrode having a metal
- Patent number 7,030,001
- Issue date Apr 18, 2006
- FREESCALE SEMICONDUCTOR, INC.
- Olubunmi O. Adetutu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Capping Layer Formation Onto a Dual Damescene Interconnect
- Publication number 20080242110
- Publication date Oct 2, 2008
- NXP B.V.
- Janos Farkas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BARRIER FOR USE IN 3-D INTEGRATION OF CIRCUITS
- Publication number 20080197497
- Publication date Aug 21, 2008
- FREESCALE SEMICONDUCTOR, INC.
- SCOTT K. POZDER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BARRIER FOR USE IN 3-D INTEGRATION OF CIRCUITS
- Publication number 20070231950
- Publication date Oct 4, 2007
- Scott K. Pozder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Magnetic alignment of integrated circuits to each other
- Publication number 20070181653
- Publication date Aug 9, 2007
- Lynne M. Michaelson
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method and composition for preparing a semiconductor surface for de...
- Publication number 20060270234
- Publication date Nov 30, 2006
- Varughese Mathew
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a semiconductor device having a diffusion barrier...
- Publication number 20060202339
- Publication date Sep 14, 2006
- Lynne M. Michaelson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming a gate electrode having a metal
- Publication number 20050233562
- Publication date Oct 20, 2005
- Olubunmi O. Adetutu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Lynne M. Michaelson

Person

Patents Grantslast 30 patents

Capping layer formation onto a dual damescene interconnect

Method of forming a semiconductor device having a diffusion barrier...

Barrier for use in 3-D integration of circuits

Method for forming a gate electrode having a metal

Patents Applicationslast 30 patents

Capping Layer Formation Onto a Dual Damescene Interconnect

BARRIER FOR USE IN 3-D INTEGRATION OF CIRCUITS

BARRIER FOR USE IN 3-D INTEGRATION OF CIRCUITS

Magnetic alignment of integrated circuits to each other

Method and composition for preparing a semiconductor surface for de...

Method of forming a semiconductor device having a diffusion barrier...

Method for forming a gate electrode having a metal